Characterization of Sputtered Barium Ferrite Thin Films on Silicon Nitride Coated Carbon Substrates

1994 ◽  
Vol 341 ◽  
Author(s):  
Jinshan Li ◽  
Robert Sinclair ◽  
Stephen S. Rosenblum ◽  
Hidetaka Hayashi
Keyword(s):  
Silicon Nitride ◽  
Barium Ferrite ◽  
Columnar Structure ◽  
Low Oxygen ◽  
Plan View ◽  
Transmission Electron ◽  
Facing Target Sputtering ◽  
Coated Carbon

AbstractUsing facing target sputtering, randomly oriented crystalline barium ferrite(BaFe12O19, BaM) has been deposited onto a Ultra Densified Amorphous Carbon® (UDAC) substrate, producing high quality films in-situ at a substrate temperature of 6400°C without any post-deposition annealing. Cross section transmission electron microscopy (TEM) reveals that the films have columnar structure. A ˜100Å thick interdiffusion layer between BaM and silicon nitride underlayer was observed. Films grown at low oxygen partial pressure have lower saturation magnetization (Ms), that may be caused by the formation of some amorphous phase at the grain boundaries as noticed by plan-view TEM. The existence of the Fe2O3 phase in the BaM was also revealed by electron diffraction.

Techniques for Studying Nanoparticle Sintering by Plan-View In Situ Transmission Electron Microscopy

1998 ◽  
Vol 4 (3) ◽  
pp. 248-253 ◽  
Author(s):  
M. Yeadon ◽  
J.C. Yang ◽  
R.S. Averback ◽  
J.M. Gibson
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Single Crystal Substrate ◽  
Plan View ◽  
Supported Nanoparticles ◽  
Transmission Electron ◽  
Theoretical Predictions ◽  
Crystal Substrate

We discuss various techniques for the characterization of supported nanoparticles by in situ plan-view transmission electron microscopy. In particular, we discuss here mechanisms of image contrast formation by particles undergoing reorientation on the surface of a single crystal substrate. We consider reorientation by a variety of mechanisms including rotation, sintering and grain growth, and surface diffusion. Experimental observations are presented and the data compared with theoretical predictions.

The Use of Advanced Analytical Techniques for Characterization of the Chemical, Physical, and Crystallographic Nature of a Surface

1973 ◽  
Vol 31 ◽  
pp. 132-133 ◽  
Author(s):  
R. E. Herfert
Keyword(s):  
Surface Characterization ◽  
Analytical Techniques ◽  
X Ray Diffraction ◽  
Depth Of Penetration ◽  
X Ray ◽  
The Past ◽  
Transmission Electron ◽  
Scanning Electron

Studies of the nature of a surface, either metallic or nonmetallic, in the past, have been limited to the instrumentation available for these measurements. In the past, optical microscopy, replica transmission electron microscopy, electron or X-ray diffraction and optical or X-ray spectroscopy have provided the means of surface characterization. Actually, some of these techniques are not purely surface; the depth of penetration may be a few thousands of an inch. Within the last five years, instrumentation has been made available which now makes it practical for use to study the outer few 100A of layers and characterize it completely from a chemical, physical, and crystallographic standpoint. The scanning electron microscope (SEM) provides a means of viewing the surface of a material in situ to magnifications as high as 250,000X.

In situ observations of electromigration induced void behavior

1995 ◽  
Vol 53 ◽  
pp. 244-245
Author(s):  
T. Marieb ◽  
J. C. Bravman ◽  
P. Flinn ◽  
D. Gardner ◽  
M. Madden
Keyword(s):  
Electron Microscopy ◽  
Void Nucleation ◽  
Plan View ◽  
Transmission Electron ◽  
Nucleation Sites ◽  
Microelectronics Industry ◽  
In Situ Observations ◽  
Backscatter Electron Detector ◽  
Voltage Scanning

Electromigration and stress voiding have been active areas of research in the microelectronics industry for many years. While accelerated testing of these phenomena has been performed for the last 25 years[1-2], only recently has the introduction of high voltage scanning electron microscopy (HVSEM) made possible in situ testing of realistic, passivated, full thickness samples at high resolution.With a combination of in situ HVSEM and post-testing transmission electron microscopy (TEM) , electromigration void nucleation sites in both normal polycrystalline and near-bamboo pure Al were investigated. The effect of the microstructure of the lines on the void motion was also studied.The HVSEM used was a slightly modified JEOL 1200 EX II scanning TEM with a backscatter electron detector placed above the sample[3]. To observe electromigration in situ the sample was heated and the line had current supplied to it to accelerate the voiding process. After testing lines were prepared for TEM by employing the plan-view wedge technique [6].

A New Method of Wafer Level Plan View TEM Sample Preparation by DualBeam

2008 ◽  
Author(s):  
Hyoung H. Kang ◽  
Michael A. Gribelyuk ◽  
Oliver D. Patterson ◽  
Steven B. Herschbein ◽  
Corey Senowitz
Keyword(s):  
Sample Preparation ◽  
Ex Situ ◽  
Wafer Level ◽  
Cross Sectional ◽  
Plan View ◽  
Manufacturing Line ◽  
Transmission Electron ◽  
Thin Lamella ◽  
Preparation Techniques

Abstract Cross-sectional style transmission electron microscopy (TEM) sample preparation techniques by DualBeam (SEM/FIB) systems are widely used in both laboratory and manufacturing lines with either in-situ or ex-situ lift out methods. By contrast, however, the plan view TEM sample has only been prepared in the laboratory environment, and only after breaking the wafer. This paper introduces a novel methodology for in-line, plan view TEM sample preparation at the 300mm wafer level that does not require breaking the wafer. It also presents the benefit of the technique on electrically short defects. The methodology of thin lamella TEM sample preparation for plan view work in two different tool configurations is also presented. The detailed procedure of thin lamella sample preparation is also described. In-line, full wafer plan view (S)TEM provides a quick turn around solution for defect analysis in the manufacturing line.

scholarly journals Preparation and Characterization of Epoxidised and Acrylated Styrene/Isoprene/Styrene (SIS) Triblock Block Copolymer Based Nanocomposites

2013 ◽  
Vol 28 ◽  
pp. 84-88 ◽  
Author(s):  
Santosh Khanal ◽  
Alina Shakya ◽  
Goerg H. Michler ◽  
Boulos Youssef ◽  
Jean M. Saiter ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Chemical Society ◽  
Performic Acid ◽  
Casting Method ◽  
Immiscible Polymers ◽  
Transmission Electron ◽  
Boehmite Nanoparticles ◽  
Solution Casting Method

In this work, a commercially available Styrene-Isoprene-Styrene (SIS)triblock copolymer was modified into epoxidised version (ESIS)using performic acid generated in situ from hydrogen peroxide and formic acid. The epoxidised sample was further acrylated to prepare acrylated version (ASIS). The nanocomposites of each sample (SIS, ESIS and ASIS) were prepared using boehmite nanoparticles as filler by solution casting method. The polymers were characterized by Fourier Transform Infrared (FTIR) spectroscopy and transmission electron microscopy (TEM). TEM investigations revealed that that the epoxidation of the diene block enhanced the dispersion of the nanofiller in the polymer matrix while the segregation of the nanoparticles towards the interface of the immiscible polymers was observed in the acrylated block copolymer based nanocomposite. DOI: http://dx.doi.org/10.3126/jncs.v28i0.8112 Journal of Nepal Chemical Society Vol. 28, 2011 Page: 84-88 Uploaded Date: May 24, 2013

Fabrication and In Situ Transmission Electron Microscope Characterization of Free-Standing Graphene Nanoribbon Devices

ACS Nano ◽  
2016 ◽  
Vol 10 (1) ◽  
pp. 1475-1480 ◽  
Author(s):  
Qing Wang ◽  
Ryo Kitaura ◽  
Shoji Suzuki ◽  
Yuhei Miyauchi ◽  
Kazunari Matsuda ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Transmission Electron Microscope ◽  
Graphene Nanoribbon ◽  
Free Standing ◽  
Transmission Electron

scholarly journals Hydrogenative Cyclization of Levulinic Acid to γ-Valerolactone with Methanol and Ni-Fe Bimetallic Catalysts

Catalysts ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 1096
Author(s):  
Ligang Luo ◽  
Xiao Han ◽  
Qin Zeng
Keyword(s):  
Photoelectron Spectroscopy ◽  
Levulinic Acid ◽  
Hydrogen Donor ◽  
Effect Of Temperature ◽  
X Ray ◽  
Transmission Electron ◽  
Ft Ir ◽  
Temperature Programmed

A series of Ni-Fe/SBA-15 catalysts was prepared and tested for the catalytic hydrogenation of levulinic acid to γ-valerolactone, adopting methanol as the only hydrogen donor, and investigating the synergism between Fe and Ni, both supported on SBA-15, towards this reaction. The characterization of the synthesized catalysts was carried out by XRD (X-ray powder diffraction), TEM (transmission electron microscopy), H2-TPD (hydrogen temperature-programmed desorption), XPS (X-ray photoelectron spectroscopy), and in situ FT-IR (Fourier transform–infrared spectroscopy) techniques. H2-TPD and XPS results have shown that electron transfer occurs from Fe to Ni, which is helpful both for the activation of the C=O bond and for the dissociative activation of H2 molecules, also in agreement with the results of the in situ FT-IR spectroscopy. The effect of temperature and reaction time on γ-valerolactone production was also investigated, identifying the best reaction conditions at 200 °C and 180 min, allowing for the complete conversion of levulinic acid and the complete selectivity to γ-valerolactone. Moreover, methanol was identified as an efficient hydrogen donor, if used in combination with the Ni-Fe/SBA-15 catalyst. The obtained results are promising, especially if compared with those obtained with the traditional and more expensive molecular hydrogen and noble-based catalysts.

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