High Power and High Frequency Silicon Carbide Devices

1994 ◽  
Vol 339 ◽  
Author(s):  
John W. Palmour ◽  
C. H. Carter ◽  
C. E. Weitzel ◽  
K. J. Nordquist

ABSTRACTThe breakdown electric field of 4H-SiC as a function of doping was measured using pn junction rectifiers, with maximum voltages of 1130 V being achieved. 4H-SiC vertical power MOSFET structures have shown specific on-resistances of 33 mΩ-cm2 for devices capable of blocking 150 V. A current density of 100 A/cm2 was achieved at a drain voltage of 3.3 V. Thyristors fabricated in SiC have also shown blocking voltages of 160 V and 100 A/cm2 at 3.0 V. High temperature operation was measured, with the power MOSFETs operating to 300°C, and the thyristors operating to 500°C.Submicron 6H- and 4H-SiC MESFETs have shown good I-V characteristics to Vd= 40 V, with an Idss of 200–300 mA/mm. The maximum operating frequencies (fmax) achieved for 6H-SiC MESFETs is 13.8 GHz, with small-signal power gains of 9.8 dB and 2.9 dB at 5 GHz and 10 GHz, respectively. 4H-SiC MESFETs have demonstrated an RF output power density of 2.8 W/mm at 1.8 GHz. This is the highest power density ever reported for SiC and is 2–3 times higher than reported for comparable GaAs devices.

2006 ◽  
Vol 527-529 ◽  
pp. 1277-1280 ◽  
Author(s):  
G. Gudjónsson ◽  
Fredrik Allerstam ◽  
H.Ö. Ólafsson ◽  
Per Åke Nilsson ◽  
Hans Hjelmgren ◽  
...  

We have made a 4H-SiC RF power MOSFETs with cutoff frequency up to 12 GHz, delivering RF power of 1.9 W/mm at 3 GHz. The transistors withstand 200 V drain voltage, are normally-off, and show no gate lag, which is often encountered in SiC MESFETs. The measured devices have a single drain finger and a double gate finger and a total gate width of 0.8 mm. To our knowledge this is the first time that power densities above 1 W/mm at 3 GHz are reported for SiC MOSFETs.


Author(s):  
R.S Balmer ◽  
I Friel ◽  
S.M Woollard ◽  
C.J.H Wort ◽  
G.A Scarsbrook ◽  
...  

In this paper, we review the suitability of diamond as a semiconductor material for high-performance electronic applications. The current status of the manufacture of synthetic diamond is reviewed and assessed. In particular, we consider the quality of intrinsic material now available and the challenges in making doped structures suitable for practical devices. Two practical applications are considered in detail. First, the development of high-voltage switches capable of switching voltages in excess of 10 kV. Second, the development of diamond MESFETs for high-frequency and high-power applications. Here device data are reported showing a current density of more than 30 mA mm −1 along with small-signal RF measurements demonstrating gigahertz operation. We conclude by considering the remaining challenges which will need to be overcome if commercially attractive diamond electronic devices are to be manufactured.


Electronics ◽  
2021 ◽  
Vol 10 (4) ◽  
pp. 441
Author(s):  
Marcello Cioni ◽  
Alessandro Bertacchini ◽  
Alessandro Mucci ◽  
Nicolò Zagni ◽  
Giovanni Verzellesi ◽  
...  

In this paper, we investigate the evolution of threshold voltage (VTH) and on-resistance (RON) drifts in the silicon carbide (SiC) power metal-oxide-semiconductor field-effect transistors (MOSFETs) during the switch-mode operation. A novel measurement setup for performing the required on-the-fly characterization is presented and the experimental results, obtained on commercially available TO-247 packaged SiC devices, are reported. Measurements were performed for 1000 s, during which negative VTH shifts (i.e., VTH decrease) and negative RON drifts (i.e., RON decrease) were observed. To better understand the origin of these parameter drifts and their possible correlation, measurements were performed for different (i) gate-driving voltage (VGH) and (ii) off-state drain voltage (VPH). We found that VTH reduction leads to a current increase, thus yielding RON to decrease. This correlation was explained by the RON dependence on the overdrive voltage (VGS–VTH). We also found that gate-related effects dominate the parameter drifts at low VPH with no observable recovery, due to the repeated switching of the gate signal required for the parameter monitoring. Conversely, the drain-induced instabilities caused by high VPH are completely recoverable within 1000 s from the VPH removal. These results show that the measurement setup is able to discern the gate/drain contributions, clarifying the origin of the observed VTH and RON drifts.


1957 ◽  
Vol 28 (6) ◽  
pp. 694-704 ◽  
Author(s):  
H. A. Haus ◽  
D. L. Bobroff

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