Electron Microscopy of Semiconductors Reconstructed Surfaces
Keyword(s):
ABSTRACTSurface sensitive transmission electron microscopy (SSTEM) and reflection electron microscopy (REM) have been used to analyze the Si (111) 1×1 → 7×7 surface reconstruction. The SSTEM and transmission electron diffraction results for the Si (111) 7×7 surface are interpreted using several possible “surface dislocation” models. The SSTEM and REM techniques have also been applied to the GaAs (100) MBE deposited surfaces. The rough surface topography for the c(4×4) reconstructed surface is attributed to surface steps motions and bunching upon interruption of the MBE deposition.
1990 ◽
Vol 48
(4)
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pp. 424-424
1989 ◽
Vol 47
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pp. 462-463
1997 ◽
Vol 04
(03)
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pp. 559-566
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2003 ◽
Vol 18
(2)
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pp. 475-481
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2011 ◽
Vol 189-193
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pp. 1036-1039