Titanium Deposition on Polymer Surfaces: An Xps Study

1993 ◽  
Vol 304 ◽  
Author(s):  
K. Konstadinidis ◽  
R. L. Opila ◽  
J. A. Taylor ◽  
A. C. Miller
Keyword(s):  
Titanium Carbide ◽  
Photoelectron Spectroscopy ◽  
Polymer Surfaces ◽  
Chemical Interactions ◽  
X Ray ◽  
Stable Oxide ◽  
Xps Study ◽  
Aging In Air

AbstractWe have used X-ray Photoelectron Spectroscopy to study the chemical interactions at the interface formed during in situ deposition of Ti atoms on triazine, polyimide (PMDAODA), and polystyrene surfaces. For deposition on thin triazine films (∼ 100Å) we observe that titanium carbide is the dominant product, while oxides and nitrides are formed as well. Aging in air causes the carbide and nitride to convert to the more thermodynamically stable oxide. Titanium carbide is also the primary species at the Ti/polyimide and Ti/polystyrene interface. In all cases the reaction of Ti atoms with different sites in the polymer is nonselective.

In-Situ XPS Study of the Aluminum Poly(p-Phenylenevinylene) Interface

1995 ◽  
Vol 385 ◽  
Author(s):  
K. Konstadinidis ◽  
F. Papadimitrakopoulos ◽  
M. Galvin ◽  
R. Opila
Keyword(s):  
Valence Band ◽  
Oxygen Content ◽  
Photoelectron Spectroscopy ◽  
Surface Oxygen ◽  
Band Bending ◽  
X Ray ◽  
In Situ Xps ◽  
Synthetic Routes ◽  
Xps Study

ABSTRACTThe chemical and electronic properties of aluminum/poly(p-phenylenevinylene) (PPV) interfaces were studied in situ using x-ray photoelectron spectroscopy (XPS). It was observed that the aluminum atoms react with the oxygen-containing groups present as impurities on the surface of PPV to form Al-O-C linkages. The Al atoms also interact with the wrsystem of the polymer as indicated by changes in the valence band. Contrary to to recent suggestions (Ettedgui et al.) the relation between surface oxygen content and band bending is not straightforward, as shown by deposition on PPV surfaces prepared by two different synthetic routes.

scholarly journals In situ monitoring of the influence of water on DNA radiation damage by near-ambient pressure X-ray photoelectron spectroscopy

2021 ◽  
Vol 4 (1) ◽  
Author(s):  
Marc Benjamin Hahn ◽  
Paul M. Dietrich ◽  
Jörg Radnik
Keyword(s):  
Dna Damage ◽  
Radiation Damage ◽  
Photoelectron Spectroscopy ◽  
Ambient Pressure ◽  
In Situ Monitoring ◽  
Strong Increase ◽  
Oh Radicals ◽  
Strand Breaks ◽  
X Ray

AbstractIonizing radiation damage to DNA plays a fundamental role in cancer therapy. X-ray photoelectron-spectroscopy (XPS) allows simultaneous irradiation and damage monitoring. Although water radiolysis is essential for radiation damage, all previous XPS studies were performed in vacuum. Here we present near-ambient-pressure XPS experiments to directly measure DNA damage under water atmosphere. They permit in-situ monitoring of the effects of radicals on fully hydrated double-stranded DNA. The results allow us to distinguish direct damage, by photons and secondary low-energy electrons (LEE), from damage by hydroxyl radicals or hydration induced modifications of damage pathways. The exposure of dry DNA to x-rays leads to strand-breaks at the sugar-phosphate backbone, while deoxyribose and nucleobases are less affected. In contrast, a strong increase of DNA damage is observed in water, where OH-radicals are produced. In consequence, base damage and base release become predominant, even though the number of strand-breaks increases further.

In situ Hard X-ray Photoelectron Spectroscopy on the Origin of Irreversibility in Electrochromic LixWO3 Thin Films

2021 ◽  
pp. 150898
Author(s):  
Makoto Takayanagi ◽  
Takashi Tsuchiya ◽  
Shigenori Ueda ◽  
Tohru Higuchi ◽  
Kazuya Terabe
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
X Ray

Incorporation and Role of Nitrogen During Oxynitridation of Silicon Studied by Photoelectron Spectroscopy

1999 ◽  
Vol 567 ◽  
Author(s):  
Masayuki Suzuki ◽  
Yoji Saito
Keyword(s):  
Photoelectron Spectroscopy ◽  
High Vacuum ◽  
Oxide Films ◽  
Silicon Surfaces ◽  
Gaseous Mixtures ◽  
X Ray ◽  
Initial Stage ◽  
Thermal Stability Of

ABSTRACTWe tried direct oxynitridation of silicon surfaces by remote-plasma-exited nitrogen and oxygen gaseous mixtures at 700°C in a high vacuum. The oxynitrided surfaces were investigated with in-situ X-ray photoelectron spectroscopy. With increase of the oxynitridation time, the surface density of nitrogen gradually increases, but that of oxygen shows nearly saturation behavior after the rapid increase in the initial stage. We also annealed the grown oxynitride and oxide films to investigate the role of the contained nitrogen. The desorption rate of oxygen from the oxynitride films is much less than that from oxide films. We confirmed that nitrogen stabilizes the thermal stability of these oxynitride films.

Formation of a ZnO/ZnS interface passivation layer on (NH4)2S treated In0.53Ga0.47As: Electrical and in-situ X-ray photoelectron spectroscopy characterization

2016 ◽  
Vol 55 (8S2) ◽  
pp. 08PC02 ◽  
Author(s):  
Antonio T. Lucero ◽  
Young-Chul Byun ◽  
Xiaoye Qin ◽  
Lanxia Cheng ◽  
Hyoungsub Kim ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Passivation Layer ◽  
X Ray ◽  
Interface Passivation
Sign in / Sign up

Export Citation Format

Share Document