Measurements of SiH3 and SiH2 Radical Densities in RF Silane Plasmas Using Laser Spectroscopic Techniques

1993 ◽  
Vol 297 ◽  
Author(s):  
T. Goto
Keyword(s):  
Absorption Spectroscopy ◽  
Spectroscopic Techniques ◽  
Laser Absorption Spectroscopy ◽  
Silicon Thin Film ◽  
Laser Absorption ◽  
Intracavity Laser ◽  
Laser Spectroscopic ◽  
Hydrogenated Amorphous ◽  
Diode Laser Absorption ◽  
Silane Plasma

In the RF (13.56 MHz) silane plasma, recently the SiH3 radical density was measured using infrared diode laser absorption spectroscopy, and the correlation between the SiH3 radical density and the growth rate of hydrogenated amorphous silicon thin film was investigated. The SiH2 radical density was also measured using modified laser induced fluorescence spectroscopy and intracavity laser absorption spectroscopy. Those measurement methods and main results are reviewed here.

scholarly journals Molecular Laser Spectroscopy as a Tool for Gas Analysis Applications

2011 ◽  
Vol 2011 ◽  
pp. 1-12 ◽  
Author(s):  
Javis Anyangwe Nwaboh ◽  
Thibault Desbois ◽  
Daniele Romanini ◽  
Detlef Schiel ◽  
Olav Werhahn
Keyword(s):  
Absorption Spectroscopy ◽  
Gas Analysis ◽  
Tunable Diode Laser ◽  
Spectroscopic Techniques ◽  
Laser Absorption Spectroscopy ◽  
Quantum Cascade ◽  
Laser Absorption ◽  
Fraction Measurement ◽  
Laser Spectroscopic ◽  
Diode Laser Absorption

We have used the traceable infrared laser spectrometric amount fraction measurement (TILSAM) method to perform absolute concentration measurements of molecular species using three laser spectroscopic techniques. We report results performed by tunable diode laser absorption spectroscopy (TDLAS), quantum cascade laser absorption spectroscopy (QCLAS), and cavity ring down spectroscopy (CRDS), all based on the TILSAM methodology. The measured results of the different spectroscopic techniques are in agreement with respective gravimetric values, showing that the TILSAM method is feasible with all different techniques. We emphasize the data quality objectives given by traceability issues and uncertainty analyses.

Measurement of the SiH3Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy

1988 ◽  
Vol 27 (Part 2, No. 8) ◽  
pp. L1565-L1567 ◽  
Author(s):  
Naoshi Itabashi ◽  
Kozo Kato ◽  
Nobuki Nishiwaki ◽  
Toshio Goto ◽  
Chikashi Yamada ◽  
...  
Keyword(s):  
Diode Laser ◽  
Absorption Spectroscopy ◽  
Laser Absorption Spectroscopy ◽  
Laser Absorption ◽  
Diode Laser Absorption ◽  
Silane Plasma

INTRACAVITY LASER ABSORPTION SPECTROSCOPY OF NO2 AND CH4 COOLED IN A SLIT JET SUPERSONIC EXPANSION

1991 ◽  
Vol 01 (C7) ◽  
pp. C7-471-C7-476
Author(s):  
A. CAMPARGUE ◽  
M. CHENEVIER ◽  
A. DELON ◽  
R. JOST ◽  
F. STOECKEL
Keyword(s):  
Absorption Spectroscopy ◽  
Laser Absorption Spectroscopy ◽  
Supersonic Expansion ◽  
Laser Absorption ◽  
Intracavity Laser

Monitoring the Fractional Distillation Purification of Inorganic Hydrides by Diode Laser Absorption Spectroscopy

2020 ◽  
Vol 56 (12) ◽  
pp. 1284-1289
Author(s):  
Ya. Ya. Ponurovskii ◽  
D. B. Stavrovskii ◽  
Yu. P. Shapovalov ◽  
M. V. Spiridonov ◽  
A. S. Kuz’michev ◽  
...  
Keyword(s):  
Diode Laser ◽  
Absorption Spectroscopy ◽  
Fractional Distillation ◽  
Laser Absorption Spectroscopy ◽  
Laser Absorption ◽  
Diode Laser Absorption

CF3,CF2and CF Radical Measurements in RFCHF3Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy

1994 ◽  
Vol 33 (Part 1, No. 7B) ◽  
pp. 4298-4302 ◽  
Author(s):  
Koji Maruyama ◽  
Katsunori Ohkouchi ◽  
Yasunori Ohtsu ◽  
Toshio Goto
Keyword(s):  
Diode Laser ◽  
Absorption Spectroscopy ◽  
Laser Absorption Spectroscopy ◽  
Laser Absorption ◽  
Diode Laser Absorption
Sign in / Sign up

Export Citation Format

Share Document