Spatial-Resolution Limits of Laser Patterning: Submicrometer Projection Microchemistry
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ABSTRACTThe predictions of a simple two-dimensional model for the sensitivity to process contrast of direct-write and projection laser microchemistry are reviewed. Microchemical reactions excited by UV image projection are demonstrated using a 30X reduction reflecting system and excimer laser illumination. Well-resolved images with submicrometer features are obtained by: (1) reaction of an Al/O cermet, (2) projection doping of Si in BCl3,(3) projection etching of Pyrex glass in H2, and (4) reactive patterning of an organic bilayer. Linewidths of 0.5 – 0.2 μm have been demonstrated for projection imaging in these systems.
2002 ◽
Vol 61
(1)
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pp. 34-44
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2020 ◽
Vol 34
(4)
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pp. 05020003
2001 ◽
Vol 55
(8)
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pp. 14
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1969 ◽
Vol 18
(189)
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pp. 489-493