Plasma Impulse CVD Deposited TiO2 Waveguiding Films: Properties and Potential Applications in Integrated Optical Sensor Systems

1992 ◽  
Vol 276 ◽  
Author(s):  
M. Heming ◽  
B. Danielzik ◽  
J. Otto ◽  
V. Paquet ◽  
Ch. Fattinger

ABSTRACTPlasma impulse CVD deposited titania thin films, deposited at low substrate temperatures, exhibit low volume losses of < 0.2 dB/cm and high environmental stability. Their use in novel concepts for integrated optical immunosensors is discussed.

2008 ◽  
Vol 8 (5) ◽  
pp. 628-635 ◽  
Author(s):  
Lin Luan ◽  
Randall D. Evans ◽  
Nan M. Jokerst ◽  
Richard B. Fair

2010 ◽  
Vol 31 (1) ◽  
pp. 12-21 ◽  
Author(s):  
A. A. Egorov ◽  
M. A. Egorov ◽  
A. V. Stavtsev ◽  
A. G. Timakin ◽  
T. K. Chekhlova

Author(s):  
W. Konz ◽  
A. Brandenburg ◽  
R. Edelhäuser ◽  
W. Ott ◽  
H. Wölfelschneider

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