A Comparative Study of Near-Surface Effects Due to Very High Fluence H+ Implantation In Single Crystal FZ, CZ, and Web SI
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ABSTRACTCrystals of float-zone, Czochralski, and Web Si having widely differing oxygen concentrations were imrplanted at 300°K with large fluences of hydrogen. Experiments using RBS/channeling, profilometry and microscopy are reported. For room temperature implants the step-height h, the distribution of displaced atoms ND(x) and the total number of displaced atoms/cm2 (aD) are all essentially independent of the oxygen convent of the Si.
1983 ◽
Vol 209-210
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pp. 407-412
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1983 ◽
Vol 209-210
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pp. 303-307
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1976 ◽
Vol 34
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pp. 592-593
1978 ◽
Vol 36
(1)
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pp. 594-595
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