Electrochemical and Chemical Sulfidation of GaAs: A Surface Chemical Study

1991 ◽  
Vol 237 ◽  
Author(s):  
J. Yota ◽  
V. A. Burrows

ABSTRACTTreatment of gallium arsenide with sulfur-containing media has been shown to improve GaAs surface electronic properties. However, there is still considerable controversy regarding the chemical nature of the surface film which results from the sulfidation, and of the basis of the electronic improvement and of the decay in the improved electronic properties with time. We have investigated the surface chemistry of the chemical sulfidation treatment of GaAs with Na2S-9H2O and the electrochemical sulfidation treatment of GaAs with Na2S-9H2O-ethylene glycol. Using surface infrared spectroscopy (SIRS), we have studied the film formed on the surface after the treatments and its behavior with time. Results show that the film on the GaAs surface contains sulfur which is often associated with oxygen, that this film slowly reacts in air to form unexpected species, e.g. sodium carbonate and sulfur-oxygen group-containing compounds, and that sulfur and oxygen are non-uniformly distributed.

1992 ◽  
Vol 259 ◽  
Author(s):  
J. Yota ◽  
V. A. Burrows

ABSTRACTChemical treatment of GaAs with sulfur-containing compounds has been shown to improve GaAs surface electronic properties. There is still considerable controversy, however, regarding the chemical nature of the surface film which results from the sulfidation, and of the basis of the electronic improvement and of the decay in the improved electronic properties with time. We have investigated the surface chemistry of the chemical sulfidation treatment of GaAs with Na2S.9H2O and (NH4)2S. Using surface infrared reflection spectroscopy (SIRS) and x-ray photoelectron spectroscopy (XPS), we have studied the GaAs surface and its behavior with time after such treatments. Results show that both of these sulfidation treatments removed the chemical oxide of GaAs, leaving behind a thin film on the surface. XPS results show that the Ga-O and As-O peaks were removed after treatment and that As-S and no Ga-S peaks were formed. Infrared results show that the film deposited after Na2S.9H2O treatment slowly reacted in air to form sodium carbonate and rhombic sulfur. In addition, this film contains compounds with sulfur-oxygen bonds, which most likely were arsenic sulfate, sulfite, and thiosulfate salts. The film deposited on the (NH4)2Streated GaAs surface was identified as ammonium thiosulfate and slowly decomposed with time. Rinsing with water removed the thin film formed after either sulfidation treatment.


1992 ◽  
Vol 282 ◽  
Author(s):  
J. Yota ◽  
V. A. Burrows

ABSTRACTChemical sulfur treatments of GaAs have been shown to improve the GaAs surface electronic properties. These treatments result in lower surface state density, lower surface recombination velocity, and shifting or unpinning of the Fermi level, in addition to improvement in the performance of devices. However, there is still considerable controversy regarding the chemical nature of the surface film which results from this chemical sulfidation. It has been shown that this film is not stable chemically and electronically. The improved surface electronic properties decay with time and are sensitive to the chemical environment of the material. In this study, using surface infrared reflection spectroscopy (SIRS) and x-ray photoelectron spectroscopy (XPS), we have investigated the electrochemical sulfidation of GaAs as a possible new method to produce a GaAs surface that is stable chemically and electronically. We have found that anodic treatments with Na2S and (NH4S solutions result in the removal of the pre-existing oxide of GaAs and the formation of films comprising sulfur, sodium carbonate, ammonium thiosulfate, and sulfide and sulfur-oxygen compounds of arsenic. Rinsing the GaAs with water removes the bulk of the film, leaving behind a surface on which only arsenic sulfide was detected.


2018 ◽  
Vol 260 ◽  
pp. 536-548 ◽  
Author(s):  
Dongni Zhao ◽  
Peng Wang ◽  
Xiaoling Cui ◽  
Liping Mao ◽  
Chunlei Li ◽  
...  

2007 ◽  
Vol 111 (1) ◽  
pp. 8-15 ◽  
Author(s):  
Beate Bussemer ◽  
Dirk Munsel ◽  
Heike Wünscher ◽  
Gerhard J. Mohr ◽  
Ulrich-Walter Grummt

1995 ◽  
Vol 176 (1) ◽  
pp. 128-137 ◽  
Author(s):  
M. DOMINGO-GARCIA ◽  
I. FERNÁNDEZ-MORALES ◽  
F.J. LÓPEZ-GARZÓN ◽  
C. MORENO-CASTILLA ◽  
M. PYDA

1989 ◽  
Vol 97 (1129) ◽  
pp. 911-915
Author(s):  
Shin-ichi TAKEDA ◽  
Shinji NAKADA ◽  
Isao TARI

1996 ◽  
Vol 39 (4) ◽  
pp. 507-510 ◽  
Author(s):  
S. Belkouch ◽  
C. Aktik ◽  
H. Xu ◽  
E.L. Ameziane

1994 ◽  
Vol 370 ◽  
Author(s):  
D. L. Cocke ◽  
M. Y. A. Mollah ◽  
T.-C. Lin ◽  
R. K. Vempati ◽  
T. R. Hess

AbstractThe chemical nature and microstructure of the interfacial transition zone (ITZ) are influenced by the interfacial mechanisms of hydration which are primarily controlled by surface and nearsurface phenomena. Recent works from our laboratory involving superplasticizers, metal anions that retard hydration and interaction with silicate based aggregates have established that the interfacial chemistry is of fundamental importance in understanding the mechanisms of CSH formation, surface chemical compound formation and mineralization of the interfacial transition zone and its interaction with the hydrated cement particles and the aggregate. A surface charge control reaction model that accounts for :he importance of calcium and other cations and anions will be outlined and used to discuss the interfacial physical chemistry of the ITZ and its ultimate chemical nature and structure.


2003 ◽  
Vol 218 (1-4) ◽  
pp. 211-215 ◽  
Author(s):  
Peng Jin ◽  
S.H. Pan ◽  
Y.G. Li ◽  
C.Z. Zhang ◽  
Z.G. Wang

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