The Enhanced Magnetization Observed in FE/mo Multilayers Deposited by Ion-Beam Sputtering

1991 ◽  
Vol 231 ◽  
Author(s):  
Y. Wang ◽  
F.Z. Cui ◽  
W.Z. Li ◽  
Y.D. Fan
Keyword(s):  
Magnetic Properties ◽  
Layer Thickness ◽  
Lattice Spacing ◽  
Ion Beam ◽  
Single Layer ◽  
Film Plane ◽  
Ion Beam Sputtering ◽  
Modulated Structure ◽  
Beam Sputtering ◽  
Structural And Magnetic Properties

AbstractFe/Mo multilayers, with varied Fe single layer thickness, tF, and Mo single layer thickness, tMO, were deposited by using a focusing ion-beam sputtering technique. Their structural and magnetic properties were studied. The periodic modulated structure was observed for all samples. An enhancement of magnetization over the value of bulk Fe was noticed for some samples. The change of lattice spacing of Fe layers, as a result of compress stress in the film plane, was considered to be responsible for the increase of the magnetization for Fe/Mo multilayers.

Structural and magnetic properties of Fe-Co thin films elaborated by ion-beam sputtering

1994 ◽  
Vol 133 (1-3) ◽  
pp. 493-496 ◽  
Author(s):  
P. Pain ◽  
J.P. Eymery ◽  
M. Cahoreau ◽  
M.F. Denanot ◽  
J.F. Dinhut
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Structural And Magnetic Properties

Structural and magnetic properties of Al/Fe multilayers deposited by ion beam sputtering

1991 ◽  
Vol 49 (1-3) ◽  
pp. 139-142 ◽  
Author(s):  
S.B. Qadri ◽  
C. Kim ◽  
M. Twigg ◽  
M.Z. Harford ◽  
P. Lubitz
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Structural And Magnetic Properties

Synthesis and magnetic properties of iron nitride films deposited on Ge(100) by reactive ion beam sputtering

1997 ◽  
Vol 82 (10) ◽  
pp. 5154-5158 ◽  
Author(s):  
Xing-zhao Ding ◽  
Fu-min Zhang ◽  
Jian-sheng Yan ◽  
Hong-lie Shen ◽  
Xi Wang ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Iron Nitride ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Ion-beam modification of Co/Ag multilayers II: Variation of structural and magnetic properties with Co layer thickness

2000 ◽  
Vol 87 (12) ◽  
pp. 8513-8521 ◽  
Author(s):  
T. Veres ◽  
M. Cai ◽  
S. Germain ◽  
M. Rouabhi ◽  
F. Schiettekatte ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Layer Thickness ◽  
Ion Beam ◽  
Ion Beam Modification ◽  
Structural And Magnetic Properties

scholarly journals Luminescence Properties of Si Nanocrystals Fabricated by Ion Beam Sputtering and Annealing

2012 ◽  
Vol 2012 ◽  
pp. 1-8 ◽  
Author(s):  
Sung Kim ◽  
Dong Hee Shin ◽  
Dong Yeol Shin ◽  
Chang Oh Kim ◽  
Jae Hee Park ◽  
...  
Keyword(s):  
Recent Progress ◽  
Ion Beam ◽  
Single Layer ◽  
Optoelectronic Device ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
The Past ◽  
Si Nanocrystals ◽  
Beam Sputtering ◽  
Device Applications

During the past several decades, Si nanocrystals (NCs) have received remarkable attention in view of potential optoelectronic device applications. This paper summarizes recent progress in the study of luminescence from Si NCs, such as photoluminescence (PL), cathodoluminescence, time-solved PL, and electroluminescence. The paper is especially focused on Si NCs produced by ion beam sputtering deposition ofSiOxsingle layer orSiOx/SiO2multilayers and subsequent annealing. The effects of stoichiometry (x) and thickness of SiOxlayers on the luminescence are analyzed in detail and discussed based on possible mechanisms.

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