Sputter Deposition of Indium Nitride on The (111) Face of Elemental and Compound Semiconductors

1990 ◽  
Vol 202 ◽  
Author(s):  
J. S. Morgan ◽  
T. J. Kistenmacher ◽  
W. A. Bryden ◽  
S. A. Ecelberger
Keyword(s):  
Transport Properties ◽  
Electrical Transport ◽  
Lattice Mismatch ◽  
Indium Nitride ◽  
Rf Magnetron Sputtering ◽  
Film Structure ◽  
Electrical Mobility ◽  
Electrical Transport Properties ◽  
Structure Morphology ◽  
Structural Coherence

ABSTRACTThe structure, morphology, and transport properties of thin films of InN grown on several cubic semiconductors has been studied as a function of substrate temperature. Films were deposited using rf-magnetron sputtering onto the (111) face of GaAs, Ge, Si and ZrO2. In general, the film structure is such that (00.1)InN parallels the (111) plane of the cubic substrate above some deposition temperature. The in-plane structural coherence duplicates the magnitude of the calculated lattice mismatch between InN and the substrate. Electrical transport properties for growth onto (111) ZrO2 were characterized by n-type carrier concentration and mobilities ranging up to 44 cm2 /Vsec. A morphology-induced decrease in electrical mobility is observed for deposition temperatures above 350°C, as shown by SEM.

Buffer Layer Thickness and the Properties of InN Thin Films on AIN- Seeded (00.1) Sapphire And (111) Silicon

1994 ◽  
Vol 339 ◽  
Author(s):  
T. J. Kistenmacher ◽  
S. A. Ecelberger ◽  
W. A. Bryden
Keyword(s):  
Thin Films ◽  
Buffer Layer ◽  
Layer Thickness ◽  
Electrical Transport ◽  
Lattice Mismatch ◽  
Electrical Mobility ◽  
Seeded Growth ◽  
Electrical Transport Properties ◽  
Buffer Layer Thickness ◽  
Homogeneous Strain

ABSTRACTIntroduction of a buffer layer to facilitate heteroepitaxy in thin films of the Group IIIA nitrides has had a tremendous impact on growth morphology and electrical transport. While AIN- and self-seeded growth of GaN has captured the majority of attention, the use of AIN-buffered substrates for InN thin films has also had considerable success. Herein, the properties of InN thin films grown by reactive magnetron sputtering on AIN-buffered (00.1) sapphire and (111) silicon are presented and, in particular, the evolution of the structural and electrical transport properties as a function of buffer layer sputter time (corresponding to thicknesses from ∼50Å to ∼0.64 μm) described. Pertinent results include: (a) for the InN overlayer, structural coherence and homogeneous strain normal to the (00.1) growth plane are highly dependent on the thickness of the AIN-buffer layer; (b) the homogeneous strain in the AIN-buffer layer is virtually nonexistent from a thickness of 200Å (where a significant X-ray intensity for (00.2)AIN is observed); and (c) the n-type electrical mobility for films on AIN-nucleated (00.1) sapphire is independent of AIN-buffer layer thickness, owing to divergent variations in carrier concentration and film resistivity. These effects are in the main interpreted as arising from a competition between the lattice mismatch of the InN overlayer with the substrate and with the AIN-buffer layer.

Morphology and Low Temperature Electrical Transport in Heteroepitaxial Indium Nitride Films

1992 ◽  
Vol 263 ◽  
Author(s):  
W. A. Bryden ◽  
S. A. Ecelberger ◽  
T. J. Kistenmacher
Keyword(s):  
Low Temperature ◽  
Temperature Dependence ◽  
Electrical Transport ◽  
Deposition Temperature ◽  
Amorphous Materials ◽  
Indium Nitride ◽  
Electrical Contact ◽  
Rf Magnetron Sputtering ◽  
Electrical Mobility ◽  
Reactive Rf Magnetron Sputtering

ABSTRACTThe correlation of low temperature electrical transport with the evolution of heteroepitaxy and morphology for sputtered indium nitride thin films has been studied. A series of indium nitride films were deposited at temperatures ranging from 50 -650 °C by reactive rf magnetron sputtering onto the (00.1) face of sapphire. Above 350 °C, a transition occurs from a continuous morphology, in which grains are in intimate electrical contact, to an open, porous morphology with poor electrical contact. This transition in morphology deeply affects the electrical transport of the semiconductor. At low deposition temperature, the electrical transport is dominated by the relatively weak intergrain scattering leading to films with moderate mobility. As the deposition temperature is raised, the increasingly porous nature of the film leads to a deterioration in electrical mobility. It is proposed here that the relevant physics of these films is analogous to that for granular solids with a distribution of electrical connectivities that suggests a scattering potential dominated by disorder. In fact, the temperature dependence of the resistivity is found to be analogous to that observed in disordered and amorphous materials. In particular, the resistivity is characterized by: 1) A very weak temperature dependence; 2) The observation of a resistance minimum; and, 3) A steep rise in the low temperature (<4K) resistivity that follows a T1/ dependence.

Structure, morphology and electrical transport properties of the Ti3AlC2 materials

2018 ◽  
Vol 44 (15) ◽  
pp. 18322-18328 ◽  
Author(s):  
K. Goc ◽  
W. Prendota ◽  
L. Chlubny ◽  
T. Strączek ◽  
W. Tokarz ◽  
...  
Keyword(s):  
Transport Properties ◽  
Electrical Transport ◽  
Electrical Transport Properties ◽  
Structure Morphology

Correlation between the structural change and the electrical transport properties of indium nitride under high pressure

2017 ◽  
Vol 19 (39) ◽  
pp. 26758-26764 ◽  
Author(s):  
Junkai Zhang ◽  
Ji Qi ◽  
Yanzhang Ma ◽  
Tingjing Hu ◽  
Jiejuan Yan ◽  
...  
Keyword(s):  
High Pressure ◽  
Structural Change ◽  
Transport Properties ◽  
Electrical Transport ◽  
Structural Transition ◽  
Indium Nitride ◽  
Electrical Performance ◽  
Electrical Transport Properties

Pressure realized modulation of electrical performance and the direct-indirect gap transformation of InN during the wurtzite–rocksalt structural transition.

scholarly journals Gold Nanoparticle-Mediated Noncovalent Functionalization of Graphene for Field-Effect Transistor

2021 ◽  
Author(s):  
Dongha Shin ◽  
Hwa Rang Kim ◽  
Byung Hee Hong
Keyword(s):  
Transport Properties ◽  
Gold Nanoparticle ◽  
Electrical Transport ◽  
Field Effect ◽  
High Performance ◽  
Field Effect Transistor ◽  
Electrical Transport Properties ◽  
Noncovalent Functionalization ◽  
Effect Transistor

Since of its first discovery, graphene has attracted much attention because of the unique electrical transport properties that can be applied to high-performance field-effect transistor (FET). However, mounting chemical functionalities...

scholarly journals Pressure-Induced Structural Phase Transition and Metallization in Ga2Se3 up to 40.2 GPa under Non-Hydrostatic and Hydrostatic Environments

Crystals ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 746
Author(s):  
Meiling Hong ◽  
Lidong Dai ◽  
Haiying Hu ◽  
Xinyu Zhang
Keyword(s):  
Phase Transition ◽  
Electrical Conductivity ◽  
High Pressure ◽  
Phase Transformation ◽  
Transport Properties ◽  
Electrical Transport ◽  
Structural Phase ◽  
Structure Evolution ◽  
Systematic Research ◽  
Electrical Transport Properties

A series of investigations on the structural, vibrational, and electrical transport characterizations for Ga2Se3 were conducted up to 40.2 GPa under different hydrostatic environments by virtue of Raman scattering, electrical conductivity, high-resolution transmission electron microscopy, and atomic force microscopy. Upon compression, Ga2Se3 underwent a phase transformation from the zinc-blende to NaCl-type structure at 10.6 GPa under non-hydrostatic conditions, which was manifested by the disappearance of an A mode and the noticeable discontinuities in the pressure-dependent Raman full width at half maximum (FWHMs) and electrical conductivity. Further increasing the pressure to 18.8 GPa, the semiconductor-to-metal phase transition occurred in Ga2Se3, which was evidenced by the high-pressure variable-temperature electrical conductivity measurements. However, the higher structural transition pressure point of 13.2 GPa was detected for Ga2Se3 under hydrostatic conditions, which was possibly related to the protective influence of the pressure medium. Upon decompression, the phase transformation and metallization were found to be reversible but existed in the large pressure hysteresis effect under different hydrostatic environments. Systematic research on the high-pressure structural and electrical transport properties for Ga2Se3 would be helpful to further explore the crystal structure evolution and electrical transport properties for other A2B3-type compounds.

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