Effect of Substrate on the Early Stages of the Growth of YBa2Cu3O7-δ Thin-Films

1990 ◽  
Vol 191 ◽  
Author(s):  
M. Grant Norton ◽  
C. Barry Carter

ABSTRACTThe fabrication of high-quality thin-films often depends on the early stages of the growth process during which epitaxy is established. The substrate structure and orientation generally play a critical role at this stage through epitaxy and interaction or reaction. Many different materials are being used as substrates to support thin-films of the YBa2Cu3O7-δ superconductors. In this study the early stages of the growth of YBa2Cu3O7-δ thin-films have been investigated using transmission electron microscopy (TEM). Using pulsed-laser ablation, ultra-thin films were formed directly onto self-supporting, ion-thinned, single-crystal ceramic substrates. The substrates used were (001)-oriented MgO, (001)-oriented SrTiO3 and (001)-oriented LaAlO3.

1990 ◽  
Vol 5 (12) ◽  
pp. 2762-2765 ◽  
Author(s):  
M. Grant Norton ◽  
C. Barry Carter

Thin-films of barium titanate (BaTiO3) have been deposited onto single-crystal MgO substrates using pulsed-laser ablation. The early stages of film growth have been examined using transmission electron microscopy by deposition of very thin films onto specially prepared electron transparent thin-foil substrates. The films, which were crystalline as deposited and close to stoichiometric composition, were formed by the nucleation and growth of small islands.


2012 ◽  
Vol 135 (2-3) ◽  
pp. 991-997 ◽  
Author(s):  
S.C. Xu ◽  
C. Yang ◽  
M. Liu ◽  
S.Z. Jiang ◽  
Y.Y. Ma ◽  
...  

1993 ◽  
Vol 07 (11) ◽  
pp. 743-746
Author(s):  
YONGJUN TIAN ◽  
HUIBIN LU ◽  
SHIFA XU ◽  
DAFU CUI ◽  
ZHENHAO CHEN ◽  
...  

LaAlO 3 thin films have been deposited on (100) LaAlO 3 substrates by pulsed laser ablation. The deposited films showed the (h00) preferential orientations. Surface profiles indicated that the surface roughness of the films decreased with the increase of the oxygen partial pressure. High quality superconducting YBa 2 Cu 3 O 7 thin films have been successfully deposited by laser ablation on the (100) LaAlO 3 substrates with the LaAlO 3 layers.


Author(s):  
M. Grant Norton ◽  
Gerald R. English ◽  
Christopher Scarfone ◽  
C. Barry Carter

Barium titanate (BaTiO3) may be used in a number of thin-film applications in electronic and optoelectronic devices. For these devices the formation of epitactic films of the correct stoichiometry and phase is essential. In particular, the tetragonal form of BaTiO3, which is stable at room temperature, exhibits ferro-, pyro- and piezoelectric properties. It is desirable to form films of the tetragonal phase directly and thus to avoid formation of either amorphous or polycrystalline material or to form material of the non-ferroelectric cubic phase. Recently two techniques, pulsed-laser ablation and reactive evaporation, have been used to form BaTiO3 thin-films. In the present study BaTiO3 thin-films have been formed using the pulsed-laser ablation technique. Pulsed-laser ablation is now widely used to produce thin-films of the high temperature superconductors and has many advantages over other techniques, in particular the formation of films which maintain the stoichiometry of the target material and by controlling the processing conditions the formation of films having defined crystalline phases.


1990 ◽  
Vol 200 ◽  
Author(s):  
M. Grant Norton ◽  
Gerald R. English ◽  
C. Barry Carter

ABSTRACTBarium titanate (BaTiO3) is of interest for use in a number of thin-film applications in electronic and optoelectronic devices. For these devices the formation of epitactic films of the correct stoichiometry and phase is essential. The substrate is important during the early stages of growth in the establishment of epitaxy, factors such as lattice mismatch, surface preparation and crystallographic orientation can all affect film nucleation and growth. In this study thin-films of BaTiO3 have been formed using the pulsed-laser ablation technique. The early stages of film growth have been studied directly using transmission electron microscopy by examination of very thin films deposited onto specially prepared electron-transparent thin-foil substrates.


1991 ◽  
Vol 6 (10) ◽  
pp. 2022-2025 ◽  
Author(s):  
M. Grant Norton ◽  
Christopher Scarfone ◽  
Jian Li ◽  
C. Barry Carter ◽  
James W. Mayer

Thin films of barium titanate (BaTiO3) have been deposited by pulsed-laser ablation onto (001)-oriented MgO substrates. The films were epitactic with the c-axis perpendicular to the film-substrate interface, as evidenced by both transmission electron microscopy (TEM) and ion-channeling techniques. The elastic resonance of 3.045 MeV α-particles, generating the 16O(α, α)16O reaction was used to determine the oxygen stoichiometry of the film and the minimum yield based on the oxygen peaks, thereby enabling conclusions to be drawn about the crystalline perfection of the oxygen sublattice.


1989 ◽  
Vol 169 ◽  
Author(s):  
M. Grant Norton ◽  
Lisa A. Tietz ◽  
Scott R. Summerfelt ◽  
C. Barry Carter

AbstractThe fabrication of high quality thin films often depends on the early stages of the growth process during which epitaxy is established. The substrate surface structure generally plays a critical role at this stage. Many observations of the high‐Tc superconductor film‐substrate interface structure and chemistry have been made by transmission electron microscopy (TEM) of cross‐section samples. Ion‐milling induced damage, however, can be severe in these specimens. In the present study, the early stages of the growth of high Tc superconducting thin films of YBa2Cu3O7δ have been studied by TEM using a technique which requires no post‐deposition specimen preparation.


2002 ◽  
Vol 197-198 ◽  
pp. 352-356 ◽  
Author(s):  
Tsuyoshi Yoshitake ◽  
Takashi Nishiyama ◽  
Takeshi Hara ◽  
Kunihito Nagayama

2007 ◽  
Vol 22 (8) ◽  
pp. 2339-2344 ◽  
Author(s):  
A. Allenic ◽  
W. Guo ◽  
Y.B. Chen ◽  
G.Y. Zhao ◽  
X.Q. Pan ◽  
...  

Epitaxial ZnO thin films doped uniformly with nitrogen at 1020 atoms/cm3 were fabricated by pulsed laser ablation of a Zn-rich Zn3N2 target. The films grown at 300 °C and annealed at 600 °C in O2 showed p-type conductivity. Two acceptor levels at 105 and 224 meV were determined by temperature-dependent Hall and photoluminescence measurements of the p-type samples. Transmission electron microscopy studies revealed that the p-type ZnO films consist of 10–20 nm columnar grains with a high density of defects and grain boundaries that may facilitate the annihilation of native donors and the activation of acceptors during postdeposition annealing.


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