From Point Defects to Amorphous Structures: Atomic Resolution Studies of Semiconductor Surfaces by Scanning Tunneling Microscopy (STM)
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AbstractWe have studied point defects, linear defects as well as spatial transitions between ordered and disordered structures on silicon surfaces with atomic resolution by using scanning tunneling microscopy (STM). Point defects in the vicinity of multiple step edges as well as surface reconstructions at multiple step edges as high as 3 nm have been characterized by STM. STM images of partially disordered silicon surfaces prepared by laser and thermal annealing demonstrate the potential of STM for characterizing non-periodic surfaces on the atomic scale.
1990 ◽
Vol 48
(4)
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pp. 406-407
1989 ◽
Vol 47
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pp. 330-331
1990 ◽
Vol 48
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pp. 318-319
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1996 ◽
Vol 76
(8)
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pp. 1276-1279
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2009 ◽
Vol 603
(10-12)
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pp. 1315-1327
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1998 ◽
Vol 16
(4)
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pp. 2632-2640
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