The Effect of Reactor Pressure on the Growth of Glow Discharge a-SiN:H
Keyword(s):
AbstractThe electrical resistivity and N content of a-SiN:H films can be controlled by varying the reactor pressure. This appears to be a result of the increased dissociation of the ammonia feed gas by the change in the electron energy spectrum. The effect of ion bombardment of the substrate surface does not result in observable changes in film quality.
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1988 ◽
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