Krf Excimer Laser Deposition of Titanium from Tici4

1989 ◽  
Vol 158 ◽  
Author(s):  
R. Izquierdo ◽  
C. Lavoie ◽  
M. Meunier
Keyword(s):  
Thin Film ◽  
Excimer Laser ◽  
Optical Waveguides ◽  
Film Growth ◽  
Adsorbed Layer ◽  
Primary Source ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Krf Excimer Laser

ABSTRACTWe have investigated the deposition of titanium lines from TiCl4 induced by KrF excimer laser (248 nm). Substrates are primarily LiNbO3, for the possible formation of Ti:LiNbO3 optical waveguides, as well as silicon and glass. Titanium lines contain [Cl] < 2 at% and are typically 200 to 1000 Angstroms thick with a width ranging from 3 to 20 μm. Results suggest that the process is controlled by photochemistry of TiCl4 but it is difficult at this point to assert which of the gas or adsorbed layer is the primary source of thin film growth.

Preparation of boron carbide thin film by pulsed KrF excimer laser deposition process

2002 ◽  
Vol 407 (1-2) ◽  
pp. 126-131 ◽  
Author(s):  
Shin-ichi Aoqui ◽  
Hisatomo Miyata ◽  
Tamiko Ohshima ◽  
Tomoaki Ikegami ◽  
Kenji Ebihara
Keyword(s):  
Thin Film ◽  
Boron Carbide ◽  
Excimer Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
Krf Excimer Laser

Incongruent pulsed laser deposition strategy for thin film growth of Ca3Co4O9 thermoelectric compound

2019 ◽  
Vol 45 (10) ◽  
pp. 13138-13143 ◽  
Author(s):  
Haiyang Hu ◽  
Fei Shao ◽  
Jikun Chen ◽  
Max Döbeli ◽  
Qingfeng Song ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition

Thin film growth by inverse pulsed laser deposition

2005 ◽  
Vol 484 (1-2) ◽  
pp. 165-169 ◽  
Author(s):  
Tamás Szörényi ◽  
Zsolt Geretovszky
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition

Controlled deposition of wedge-shaped profiles for thin (∼10Å) layers by pulsed laser deposition

2003 ◽  
Vol 804 ◽  
Author(s):  
H.M. Christen ◽  
I. Ohkubo
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Sample Sizes ◽  
Basic Principles ◽  
Controlled Deposition ◽  
Thin Wedge

ABSTRACTA method yielding precisely controlled thickness profiles in thin-film growth is necessary for continuous compositional spread techniques. While multiple approaches have been introduced and successfully tested, some specific applications require the use of very thin “wedge”-type profiles (∼10 Å at the thickest point), while at the same time yielding lateral sample sizes of several centimeters. Here we introduce the basic principles of a pulsed-laser deposition based approach utilizing the translation of the substrate behind a slit-shaped aperture and demonstrate by simple calculations that this method can satisfy these requirements.

Effect of Ga Re-evaporation on AlxGa1-xN Thin Film Growth by Dual-Beam Pulsed Laser Deposition Method in N2Ambient

2003 ◽  
Vol 42 (Part 1, No. 5A) ◽  
pp. 2856-2857 ◽  
Author(s):  
Yoichiro Masuyama ◽  
Shinsuke Komatsu ◽  
Masaya Kiso ◽  
Kouhei Mizuno ◽  
Takeshi Kobayashi
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Deposition Method ◽  
Dual Beam

From Ferroelectrics to Polymers - Perspectives for Thin Film Optical Waveguides and Devices

1999 ◽  
Vol 597 ◽  
Author(s):  
Christoph Buchal
Keyword(s):  
Thin Film ◽  
Optical Waveguides ◽  
Film Growth ◽  
Optical Devices ◽  
Time Span ◽  
Thin Film Growth ◽  
Optical Functions ◽  
Integrated Optical ◽  
Integrated Optical Devices ◽  
Commercial Applications

AbstractPresently commercial optical fiber links experience an explosive growth. On the other hand, the integration of optical functions on a single substrate (“Integrated Optical Device”) is still mostly limited to the R & D-laboratories. Only Mach-Zehnder modulators, made from ferroelectric crystals, have found commercial applications so far. The development phase of the integrated optical devices, based on bulk crystalline LiNbO3, is now covering a time span of nearly 30 years. In comparison, the development of the thin film growth of optical oxide ferroelectrics or of tailored optical polymers is just a few years old and we are still at the beginning of the learning curve.

scholarly journals High quality superconducting titanium nitride thin film growth using infrared pulsed laser deposition

2018 ◽  
Vol 31 (5) ◽  
pp. 055017 ◽  
Author(s):  
A Torgovkin ◽  
S Chaudhuri ◽  
A Ruhtinas ◽  
M Lahtinen ◽  
T Sajavaara ◽  
...  
Keyword(s):  
Thin Film ◽  
Titanium Nitride ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
High Quality
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