Automation Features Used with the Halide-Cvd Technique at the AT&T-Microelectronics Production Plant in Reading, Pennsylvania
Keyword(s):
AbstractThe the Halide-CVD technique is used in both research and development as well as production at AT&T. The unique requirements of the production environment dictate that reactor designs include features to improve reproducibility and maintenance, as well as reduce operator intervention. Features incorporated in the Halide-CVD reactor at AT&T include microprocessor control of valves, mass flow controllers, and furnace temperature setpoints. The unique needs of a production facility, such as process reproducibility, and commonality with standard plant equipment and information systems, will be highlighted.
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