Strain Relief Mechanisms and Nature of Misfit Dislocations in GaAs/Si Heterostructures
Keyword(s):
AbstractThe nucleation and glide of misfit dislocations in GaAs/Si system is investigated using transmission electron microscopy. GaAs epilayers of different thicknesses were examined by electron microscopy (plan and cross-section) and the elastic strain remaining in the film has been related to the average spacing of the misfit dislocations at the interface. A model is developed based on minimum energy considerations to determine the strain-thickness relationship. The theoretical predictions of strain relaxation are compared with experimental observations using high resolution electron microscopy.
1993 ◽
Vol 8
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pp. 1019-1027
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1986 ◽
Vol 44
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pp. 468-471
1990 ◽
Vol 48
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pp. 242-243
1989 ◽
Vol 47
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pp. 466-467
2001 ◽
Vol 16
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pp. 2189-2191
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