Micro-Indentation and Micro-Scratch Tests on Sub-Micron Carbon Films

1988 ◽  
Vol 130 ◽  
Author(s):  
T. W. Wu ◽  
R. A. Burn ◽  
M. M. Chen ◽  
P. S. Alexopoulos
Keyword(s):  
Carbon Film ◽  
Carbon Films ◽  
Silicon Substrates ◽  
Argon Sputtering ◽  
Scratch Tests ◽  
Sputtering Pressure ◽  
Micro Indentation ◽  
Poor Adhesion ◽  
Mtorr Argon ◽  
Hardness Depth

AbstractMicro-indentation and micro-scratch techniques were used to characterize the hardness and the adhesion strength of 0.11 μm thick sputtered carbon f-ilms on Silicon substrates. Hardness depth profiles and critical loads were measured using a microindenter under indentation and scratch testing modes, respectively. The carbon film with 6 mtorr argon sputtering pressure shows better practical adhesion (or higher critical load) and slightly higher hardness. The indentation fracture phenomenon observed on the 30 mtorr film is closely related to its poor adhesion. The failure mechanism will also be discussed.

NITROGEN DOPING IN CAMPHORIC CARBON FILMS AND ITS APPLICATION TO PHOTOVOLTAIC CELL

2005 ◽  
Vol 12 (01) ◽  
pp. 35-39 ◽  
Author(s):  
M. RUSOP ◽  
M. MOMINUZZAMAN ◽  
T. SOGA ◽  
T. JIMBO ◽  
M. UMENO
Keyword(s):  
Carbon Film ◽  
Single Crystal Silicon ◽  
Photovoltaic Cell ◽  
Carbon Layer ◽  
Carbon Films ◽  
Silicon Substrates ◽  
Crystal Silicon ◽  
N Content ◽  
Optical Gap ◽  
N Incorporation

Carbon films have been deposited on quartz and single-crystal silicon substrates by pulsed laser deposition technique. The soot for the target was obtained from burning camphor, a natural source. The effect of nitrogen (N) incorporation in camphoric carbon film is investigated. Optical gap for the undoped film is about 0.95 eV. The optical gap remains unchanged for low N content and decreases to about 0.7 eV. With higher N content, the optical gap increases. The resistivity of the carbon film increases with N content, initially and decreases with higher N content up till the film that is deposited at 30 mTorr. The results indicate successful doping for the film deposited at low nitrogen content. The J–V characteristics of N-incorporated carbon/silicon photovoltaic cells under illumination are observed to improve upon N-incorporation in the carbon layer.

scholarly journals Preparation and Characterization of Electrolessly Deposited Platimum and Palladium Nanoparticles on Pyrolyzed Photoresist Films on Silicon Substrates

2002 ◽  
Vol 1 (1) ◽  
Author(s):  
Vivian Liang ◽  
Raymond Chan ◽  
Oliver Chyan
Keyword(s):  
Electron Transfer ◽  
Metal Nanoparticles ◽  
Palladium Nanoparticles ◽  
Metal Ion ◽  
Carbon Film ◽  
Carbon Films ◽  
Ion Concentration ◽  
Silicon Substrates ◽  
Production Of Hydrogen ◽  
Pyrolyzed Photoresist

The effects of metal depositions on pyrolyzed photoresist films (PPF) grown on silicon substrates were investigated. A silicon chip, spin-coated with a positive photoresist was pyrolyzed through heating to form a PPF, or a conductive carbon film. For increasing periods of time, nanometersized metal particles of platinum and palladium were spontaneously deposited on conductive carbon films by immersion in solutions of 0.049% HF containing 100 ppm, 200 ppm, and 500 ppm concentrations of metal ions Pt2+ or Pd2+. Following each hour of deposition, the electrochemical behavior of the metal-deposited carbon films were investigated by cyclic voltammetry, utilizing a 0.1 M H2SO4 electrolyte system. The electron-transfer rates and characteristics of hydrogen evolution exhibited positive catalytic effects when the platinum and palladium nanoparticles were deposited on the carbon films. Scanning electron microscopy and energy-dispersive x-ray analysis were employed to characterize the surface morphology and distribution of metal nanoparticles on the PPF surface based on metal ion concentration and deposition time. The depositions of metal nanoparticles accelerate the electron transfer process, which could improve the efficiency and performance of PPF electrodes in the production of hydrogen fuel.

scholarly journals Nanoindentation and Nanoscratching of Hard Carbon Coatings for Magnetic Disks

1995 ◽  
Vol 383 ◽  
Author(s):  
T. Y. Tsui ◽  
G. M. Pharr ◽  
W. C. Oliver ◽  
C. S. Bhatia ◽  
R. L. White ◽  
...  
Keyword(s):  
Elastic Modulus ◽  
Carbon Film ◽  
Scratch Resistance ◽  
Carbon Films ◽  
Magnetic Disks ◽  
Wear Resistant Coatings ◽  
Beneficial Effects ◽  
Ar Gas ◽  
Scratch Tests ◽  
Cathodic Arc

ABSTRACTNanoindentation and nanoscratching experiments have been performed to assess the mechanical properties of several carbon thin films with potential application as wear resistant coatings for magnetic disks. These include three hydrogenated-carbon films prepared by sputter deposition in a H2/Ar gas mixture (hydrogen contents of 20, 34, and 40 atomic %) and a pure carbon film prepared by cathodic-arc plasma techniques. Each film was deposited on a silicon substrate to thickness of about 300 nm. The hardness and elastic modulus were measured using nanoindentation methods, and ultra-low load scratch tests were used to assess the scratch resistance of the films and measure friction coefficients. The results show that the hardness, elastic modulus, and scratch resistance of the 20% and 34% hydrogenated films are significantly greater than the 40% film, thereby showing that there is a limit to the amount of hydrogen producing beneficial effects. The cathodic-arc film, with a hardness of greater than 59 GPa, is considerably harder than any of the hydrogenated films and has a superior scratch resistance.

Interfacial adhesion and friction of pyrolytic carbon thin films on silicon substrates

2008 ◽  
Vol 23 (10) ◽  
pp. 2749-2756 ◽  
Author(s):  
N. Deyneka-Dupriez ◽  
U. Herr ◽  
H-J. Fecht ◽  
A. Pfrang ◽  
Th. Schimmel ◽  
...  
Keyword(s):  
Residence Time ◽  
Interfacial Adhesion ◽  
Elastic Recovery ◽  
Carbon Film ◽  
Pyrolytic Carbon ◽  
Carbon Films ◽  
Normal Displacement ◽  
Silicon Substrates ◽  
Scratch Testing ◽  
Interface Failure

Frictional behavior and interfacial adhesion of differently textured pyrolytic carbon layers on Si substrate were investigated by indentation and scratch testing. A large amount of elastic recovery and a low coefficient of friction (μ = 0.05 to 0.09) were observed. Elastic/plastic and frictional behaviors of the coatings are strongly influenced by the microstructure of the pyrolytic carbon films, especially by the texture. The critical load at which the first abrupt increase in the normal displacement occurs was used to characterize interfacial adhesive strength. A pyrolytic carbon film deposited at higher residence time from a gas mixture containing 3% oxygen exhibited higher critical loads than film deposited at lower residence time without oxygen. The results can be understood if one assumes that the gas phase composition during deposition significantly influences the bonding strength at the interface. Failure mechanisms are discussed for both types of films.

Benzylamine Tartrate as an Organic Glass Substrate for Carbon Films by Evaporation

1970 ◽  
Vol 28 ◽  
pp. 484-485
Author(s):  
A. C. Faberge
Keyword(s):  
Vapor Pressure ◽  
Viscous Liquid ◽  
Glass Substrate ◽  
Room Temperature ◽  
Carbon Film ◽  
Carbon Films ◽  
Organic Glass ◽  
Spectroscopic Examination ◽  
Polymeric Substrates

Benzylamine tartrate (m.p. 63°C) seems to be a better and more convenient substrate for making carbon films than any of those previously proposed. Using it in the manner described, it is easy consistently to make batches of specimen grids as open as 200 mesh with no broken squares, and without individual handling of the grids. Benzylamine tartrate (hereafter called B.T.) is a viscous liquid when molten, which sets to a glass. Unlike polymeric substrates it does not swell before dissolving; such swelling of the substrate seems to be a principal cause of breakage of carbon film. Mass spectroscopic examination indicates a vapor pressure less than 10−9 Torr at room temperature.

Carbon Film Deposition On Silicon Using Low Energy Ion Beams

1991 ◽  
Vol 223 ◽  
Author(s):  
Qin Fuguang ◽  
Yao Zhenyu ◽  
Ren Zhizhang ◽  
S.-T. Lee ◽  
I. Bello ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Carbon Film ◽  
Carbon Films ◽  
Film Deposition ◽  
Ion Energy ◽  
Transmission Electron ◽  
Higher Temperature ◽  
Post Implantation ◽  
Beam Deposition

ABSTRACTDirect ion beam deposition of carbon films on silicon in the ion energy range of 15–500eV and temperature range of 25–800°C has been studied using mass selected C+ ions under ultrahigh vacuum. The films were characterized with X-ray photoelectron spectroscopy, Raman spectroscopy, and transmission electron microscopy and diffraction analysis. Films deposited at room temperature consist mainly of amorphous carbon. Deposition at a higher temperature, or post-implantation annealing leads to formation of microcrystalline graphite. A deposition temperature above 800°C favors the formation of microcrystalline graphite with a preferred orientation in the (0001) direction. No evidence of diamond formation was observed in these films.

scholarly journals Field Emission from Carbon Films Deposited by Controlled-Low-Energy Beams and CVD Sources

1999 ◽  
Vol 585 ◽  
Author(s):  
Douglas H. Lowndes ◽  
Vladimir I. Merkulov ◽  
L. R. Baylor ◽  
G. E. Jellison ◽  
D. B. Poker ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Surface Morphology ◽  
Field Emission ◽  
Metal Ion ◽  
Ion Beam ◽  
Pyrolytic Graphite ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Damage Site

AbstractThe principal interests in this work are energetic-beam control of carbon-film properties and the roles of doping and surface morphology in field emission. Carbon films with variable sp3-bonding fraction were deposited on n-type Si substrates by ArF (193 nm) pulsed-laser ablation (PLA) of a pyrolytic graphite target, and by direct metal ion beam deposition (DMIBD) using a primary Cs+ beam to generate the secondary C- deposition beam. The PLA films are undoped while the DMIBD films are doped with Cs. The kinetic energy (KE) of the incident C atoms/ions was controlled and varied over the range from ∼25 eV to ∼175 eV. Earlier studies have shown that C films' sp3-bonding fraction and diamond-like properties can be maximized by using KE values near 90 eV. The films' surface morphology, sp3–bonding fraction, and Cs-content were determined as a function of KE using atomic force microscopy, TEM/EELS, Rutherford backscattering and nuclear reaction measurements, respectively. Field emission (FE) from these very smooth undoped and Cs-containing films is compared with the FE from two types of deliberately nanostructured carbon films, namely hot-filament chemical vapor deposition (HF-CVD) carbon and carbon nanotubes grown by plasma-enhanced CVD. Electron field emission (FE) characteristics were measured using ∼25-μm, ∼5-μm and ∼1-μm diameter probes that were scanned with ∼75 nm resolution in the x-, y-, and z-directions in a vacuum chamber (∼5 × 10-7 torr base pressure) equipped with a video camera for viewing. The hydrogen-free and very smooth a-D or a-C films (with high or low sp3 content, and with or without ∼1% Cs doping) produced by PLD and DMIBD are not good field emitters. Conditioning accompanied by arcing was required to obtain emission, so that their subsequent FE is characteristic of the arc-produced damage site. However, deliberate surface texturing can eliminate the need for conditioning, apparently by geometrical enhancement of the local electric field. But the most promising approach for producing macroscopically flat FE cathodes is to use materials that are highly nanostructured, either by the deposition process (e.g. HF-CVD carbon) or intrinsically (e.g. carbon nanotubes). HF-CVD films were found to combine a number of desirable properties for FE displays and vacuum microelectronics, including the absence of conditioning, low turn-on fields, high emission site density, and apparent stability and durability during limited long-term testing. Preliminary FE measurements revealed that vertically aligned carbon nanotubes are equally promising.

The Effects of Sputtering Pressure on the Properties of Carbon Counter Electrodes for Dye-Sensitized Solar Cells

2012 ◽  
Vol 430-432 ◽  
pp. 631-635
Author(s):  
Shu Hong Liu ◽  
Gui Shan Liu ◽  
Xiao Yue Shen ◽  
Zhi Qiang Hu
Keyword(s):  
Solar Cells ◽  
Sheet Resistance ◽  
Carbon Film ◽  
Dye Sensitized Solar Cells ◽  
Photoelectric Conversion Efficiency ◽  
Photoelectric Conversion ◽  
Counter Electrodes ◽  
Dye Sensitized ◽  
Sputtering Pressure ◽  
Sensitized Solar Cells

The carbon counter electrodes for Dye-sensitized solar cells (DSSCs) were deposited on FTO glass using graphite target by bipolar pulse magnetron sputtering. The effects of sputtering pressure on the structures and properties for carbon films were investigated. The carbon bond structure was analyzed by Raman spectra. The sheet resistance of carbon film was detected by four-probe tester. The transmittance was tested by UV-visible spectrum. The performance of DSSCs was tested by solar simulator after the cells assembled. The results indicated that the ratio of ID/IG reduced, the degree of graphitization decreased, sheet resistance raised, transmittance increased and photoelectric conversion efficiency reduced with the increasing of sputtering pressure.

scholarly journals Robust low friction performance of graphene sheets embedded carbon films coated orthodontic stainless steel archwires

Friction ◽  
2021 ◽  
Author(s):  
Zonglin Pan ◽  
Qinzhao Zhou ◽  
Pengfei Wang ◽  
Dongfeng Diao
Keyword(s):  
Stainless Steel ◽  
Friction Coefficient ◽  
Orthodontic Treatment ◽  
Artificial Saliva ◽  
Carbon Film ◽  
Carbon Films ◽  
Graphene Sheets ◽  
Substrate Bias ◽  
Low Friction ◽  
Substrate Bias Voltage

AbstractReducing the friction force between the commercial archwire and bracket during the orthodontic treatment in general dental practice has attracted worldwide interest. An investigation on the friction and wear behaviors of the uncoated and carbon film coated stainless steel archwires running against stainless steel brackets was systematically conducted. The carbon films were prepared at substrate bias voltages from +5 to +50 V using an electron cyclotron resonance plasma sputtering system. With increasing substrate bias voltage, local microstructures of the carbon films evolved from amorphous carbon to graphene nanocrystallites. Both static and stable friction coefficients of the archwire-bracket contacts sliding in dry and wet (artificial saliva) conditions decreased with the deposition of carbon films on the archwires. Low friction coefficient of 0.12 was achieved in artificial saliva environment for the graphene sheets embedded carbon (GSEC) film coated archwire. Deterioration of the friction behavior of the GSEC film coated archwire occurred after immersion of the archwire in artificial saliva solution for different periods before friction test. However, moderate friction coefficient of less than 0.30 sustained after 30 days immersion periods. The low friction mechanism is clarified to be the formation of salivary adsorbed layer and graphene sheets containing tribofilm on the contact interfaces. The robust low friction and low wear performances of the GSEC film coated archwires make them good candidates for clinical orthodontic treatment applications.

scholarly journals Electron Spin Resonance of Carbon Films Prepared from Graphite Oxide (I) A Graphitized Carbon Film

TANSO ◽  
1973 ◽  
Vol 1973 (72) ◽  
pp. 8-13 ◽  
Author(s):  
Sadaharu TOYODA ◽  
Toshio YAMAKAWA ◽  
Yoshio YAMADA ◽  
Kazuo KOBAYASHI
Keyword(s):  
Electron Spin Resonance ◽  
Electron Spin ◽  
Graphite Oxide ◽  
Carbon Film ◽  
Carbon Films ◽  
Graphitized Carbon ◽  
Spin Resonance
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