A Model of a Combined Film Deposition and Ion Bombardment for Coatings Formation
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ABSTRACTThe mathematical model of a combined film deposition and and high dose ion implantation for coating formation has been developed. Calculations of concentration profiles of implanted element in the film and substrate depending on different parameters of the model have been carried out.
1999 ◽
Vol 7
(3)
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pp. 267-290
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1989 ◽
Vol 39
(1-4)
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pp. 7-10
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1985 ◽
Vol 43
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pp. 300-301
1992 ◽
Vol 50
(2)
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pp. 1652-1653
1990 ◽
Vol 48
(4)
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pp. 576-577
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2001 ◽
Vol 6
(1)
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pp. 9-19
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