Novel Amorphous Silicon Thin-Film Transistors for use in Large-Area Microelectronics

1988 ◽  
Vol 118 ◽  
Author(s):  
M. Hack ◽  
J. G. Shaw ◽  
M. Shur
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Thin Film Transistors ◽  
Large Area ◽  
Silicon Thin Film

Amorphous Silicon Thin Film Transistors on Kapton Fibers

2002 ◽  
Vol 736 ◽  
Author(s):  
Eitan Bonderover ◽  
Sigurd Wagner ◽  
Zhigang Suo
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Plasma Etching ◽  
Thin Film Transistors ◽  
Textile Industry ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Large Area ◽  
Silicon Thin Film ◽  
Gold Contact

ABSTRACTThe textile industry uses weaving to create very large quantities of fabric very quickly. The goal of our research is to use this well established technology to create complex large-area circuits quickly and efficiently. In our laboratory we have previously shown that amorphous silicon (a-Si) can be used to make thin-Film transistors (TFTs) on Kapton (a highly temperature-resistant polyimide from DuPont). We also previously showed that these TFTs can survive mechanical loads. A process has been designed to make “TFT fibers” by fabricating a-Si TFTs on Kapton. A special TFT geometry has also been developed. The structure consists of 3 large gold contact pads – one for each terminal of the TFT – running along the fiber. These contact pads allow connections to be made between TFT fibers using conductor fibers – Kapton fibers coated only with gold. The TFT fabrication process is based on a low temperature (150°C) Plasma Enhanced Chemical Vapor Deposition (PECVD) process. The TFTs are fabricated on a Kapton sheet from which flat fibers are made by the slit film technique. So far the best method for cutting a Kapton sheet into fibers has been plasma etching. We will describe the electronic characteristics of these TFTs as well as the electrical characteristics of the contacts between TFT fibers.

Stability of Amorphous Silicon Thin Film Transistors for Analog Circuit Applications

1997 ◽  
Vol 467 ◽  
Author(s):  
R. I. Hornsey ◽  
T. Mahnke ◽  
P. Madeira ◽  
K. Aflatooni ◽  
A. Nathan
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Threshold Voltage ◽  
Analog Circuits ◽  
Thin Film Transistors ◽  
Reverse Bias ◽  
Analog Circuit ◽  
Large Area ◽  
Silicon Thin Film ◽  
Threshold Voltages

ABSTRACTAnalog circuits using amorphous silicon thin film transistors offer significant advantages for in situ signal processing in large-area optical and x-ray imagers. However such circuits are susceptible to gate-bias-induced shifts in the threshold voltages of the constituent transistors. In this work, the change of threshold voltage for devices undergoing cycles of stress, relaxation and reverse bias is measured in order to determine the feasibility of resetting the threshold voltage electrically. It is concluded that, although the reverse bias does assist the recovery of the threshold voltage, the process is still not sufficiently rapid. An analog amplifier circuit is then described which uses negative feedback to achieve a gain that is stable to within 6% over a period of 8 hours.

The Instability Characteristics of Amorphous Silicon Thin Film Transistors with Various Interfacial and Bulk Defect States

1997 ◽  
Vol 36 (Part 1, No. 10) ◽  
pp. 6226-6229 ◽  
Author(s):  
Huang-Chung Cheng ◽  
Jun-Wei Tsai ◽  
Chun-Yao Huang ◽  
Fang-Chen Luo ◽  
Hsing-Chien Tuan
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Thin Film Transistors ◽  
Defect States ◽  
Silicon Thin Film

Hot-Wire Deposited Amorphous Silicon Thin-Film Transistors

1996 ◽  
Vol 424 ◽  
Author(s):  
R. E. I. Schropp ◽  
K. F. Feenstra ◽  
C. H. M. Van Der Werf ◽  
J. Holleman ◽  
H. Meiling
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Thin Film Transistors ◽  
Gate Dielectric ◽  
Chemical Vapor ◽  
Current Crowding ◽  
Hot Wire ◽  
Saturation Regime ◽  
Silicon Thin Film ◽  
Order Of Magnitude

AbstractWe present the first thin film transistors (TFTs) incorporating a low hydrogen content (5 - 9 at.-%) amorphous silicon (a-Si:H) layer deposited by the Hot-Wire Chemical Vapor Deposition (HWCVD) technique. This demonstrates the possibility of utilizing this material in devices. The deposition rate by Hot-Wire CVD is an order of magnitude higher than by Plasma Enhanced CVD. The switching ratio for TFTs based on HWCVD a-Si:H is better than 5 orders of magnitude. The field-effect mobility as determined from the saturation regime of the transfer characteristics is still quite poor. The interface with the gate dielectric needs further optimization. Current crowding effects, however, could be completely eliminated by a H2 plasma treatment of the HW-deposited intrinsic layer. In contrast to the PECVD reference device, the HWCVD device appears to be almost unsensitive to bias voltage stressing. This shows that HW-deposited material might be an approach to much more stable devices.

Low frequency noise in amorphous silicon thin film transistors with SiNx gate dielectric

2009 ◽  
Vol 105 (12) ◽  
pp. 124504 ◽  
Author(s):  
S. L. Rumyantsev ◽  
Sung Hun Jin ◽  
M. S. Shur ◽  
Mun-Soo Park
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Thin Film Transistors ◽  
Gate Dielectric ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Silicon Thin Film
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