The Role of thin Low Temperature Deposited GaAs Films on the two Step Growth of GaAs on Si By Mocvd
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AbstractThe structural change of the thin low temperature (~450°C) deposited GaAs films and the role for conventional temperature growth were studied by RHEED and cross-sectional TEN observation. The formation of the threedimensional high quality single crystalline islands from continuous twin GaAs layer deposited at low temperature (~450°C) was clarified. These three-dimensional islands act as the seeds for conventional temperature growth.
2008 ◽
Vol 354
(19-25)
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pp. 2079-2082
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2020 ◽
Vol 271
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pp. 118924
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2001 ◽
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2009 ◽
Vol 11
(3)
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pp. 297-301
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