Point Defects in SiC
Keyword(s):
ABSTRACTTight control of defects is pivotal for semiconductor technology. However, even the basic defects are not entirely understood in silicon carbide. In the recent years significant advances have been reached in identification of defects by combining the experimental tools like electron paramagnetic resonance and photoluminescence with ab initio calculations. We summarize these results and their consequences in silicon carbide based technology. We show recent methodological developments making possible the accurate calculation of absorption and emission signals of defects.
1996 ◽
Vol 98
(9)
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pp. 835-838
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2009 ◽
Vol 156-158
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pp. 145-148
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2013 ◽
Vol 109
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pp. 294-297
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2018 ◽
Vol 26
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pp. 81-91
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2005 ◽
pp. 489-492
2005 ◽
Vol 483-485
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pp. 489-492
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2000 ◽
Vol 15
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pp. 55-60
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2000 ◽
Vol 338-342
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pp. 809-812
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