Mechanisms of Doping-Enhanced Superlattice Disordering and of Gallium Self-Diffusion in GaAs

1987 ◽  
Vol 104 ◽  
Author(s):  
T. Y. Tan ◽  
U. Gösele ◽  
B. P. R. Marioton
Keyword(s):  
Fermi Level ◽  
Point Defect ◽  
Dopant Diffusion ◽  
Self Diffusion ◽  
N Doping ◽  
Charged Point Defect ◽  
Charged Point ◽  
Defect Species ◽  
Level Effect ◽  
Positively Charged

ABSTRACTRecently available Ga-Al interdiffusion results in GaAs/AlAs superlattices allow to conclude that Ga self-diffusion in GaAs is carried by triply-negatively charged Ga vacancies under intrinsic and n-doping conditions. The mechanism of the Si enhanced superlattice disordering is the Fermi-level effect which increases the concentrations of the charged point defect species. For the effect of the p-dopants Be and Zn, the Fermi-level effect has to be considered together with dopant diffusion induced Ga self-interstitial supersaturation or undersaturation. Self-diffusion of Ga in GaAs under heavy p-doping conditions is governed by positively charged Ga self-interstitials.

Simulation of Under- and Supersaturation of Gallium Vacancies in Gallium Arsenide During Silicon in- and Outdiffusion

1997 ◽  
Vol 490 ◽  
Author(s):  
C.-H. Chen ◽  
U. Gösele ◽  
T. Y. Tan
Keyword(s):  
Gallium Arsenide ◽  
Fermi Level ◽  
Point Defect ◽  
Surface States ◽  
Effect Model ◽  
N Doping ◽  
Defect Species ◽  
Concentration Of Electrons ◽  
Level Effect ◽  
Doping Condition

ABSTRACTThe diffusivity of Si in GaAs shows a dependence on the cubic power of its concentration or the concentration of electrons n under both in- and outdiffusion conditions. Hence, the diffusion of Si in GaAs is consistent with the Fermi-level effect model invoking the triply-negatively-charged Ga vacancies, , as the point defect species responsible for diffusion to occur on the Ga sublattice under n-doping condition. However, the Si diffusivity values of the indiffusion cases is several orders of magnitude smaller than those of the outdiffusion cases at the same Si concentrations. This means that the two apparent Si diffusivity values under intrinsic conditions will contain also the same discrepancy, which has been previously assessed to be due to a undersaturation in indiffusion cases and a supersaturation in outdiffusion cases. In this study we have calculated the under- and supersaturation values using the known Si diffusivities. We found that the GaAs surface states play a key role in the development of the under- and supersaturations.

Mechanisms of Self-Diffusion and of Doping-Enhancement of Superlattice Disordering in GaAs and AlAs Compounds

1988 ◽  
Vol 144 ◽  
Author(s):  
T.Y. Tan ◽  
U. Gösele
Keyword(s):  
Diffusion Process ◽  
Point Defect ◽  
Group V ◽  
Self Diffusion ◽  
Defect Pair ◽  
Element Diffusion ◽  
N Doping ◽  
Compound Materials ◽  
Positively Charged

ABSTRACTAn understanding of the mechanisms of self-diffusion and of interdiffusion in the compound materials GaAs and AlAs may be arrived at byt noting the effects of (i) charge, (ii) As pressure, and (iii) point defect supersaturation, on the doping enhanced superlattice disordering phenomena. The Ga self-diffusion (and hence Ga-Al interdiffusion) is dominated by the triply-negatively-charged Ga (or Al) vacancy, , under intrinsic and n-doping conditions. Under p-doping, a positively charged Ga self-interstitial , with m not known, contributes to the Ga(AI) diffusion process. Less is known for the group V element diffusion, but the As vacancy (VAs) should be contributing under intrinsic and n-doping conditions while the As selfinterstitial (LAs) may be contributing under p-doping. The contribution of a defect pair may also be involved under p-doping.

An Examination of the Mechanisms of Si Diffusion in GaAs

1989 ◽  
Vol 163 ◽  
Author(s):  
Shaofeng Yu ◽  
Ulrich M. Gosele ◽  
Teh Y. Tan
Keyword(s):  
Fermi Level ◽  
Point Defect ◽  
Essential Role ◽  
Defect Concentration ◽  
Experimental Results ◽  
Quantitative Models ◽  
Effect Mechanism ◽  
Level Effect

AbstractAn examination of the three available quantitative models of Si diffusion in GaAs has led to the conclusion that the Fermi-level effect mechanism plays the most essential role. In some experimental results a point defect concentration transient is involved which should be incoorporated in future models.

Fermi-Level Effect on Group III Atom Interdiffusion in III-V Compounds: Bandgap Heterogeneity and Low Silicon-Doping

1997 ◽  
Vol 490 ◽  
Author(s):  
C.-H. Chen ◽  
U. Gösele ◽  
T. Y. Tan
Keyword(s):  
Fermi Level ◽  
Equilibrium Concentration ◽  
Electric Field Effect ◽  
Silicon Doping ◽  
Group Iii ◽  
Semiconductor Superlattice ◽  
Effect Model ◽  
N Doping ◽  
Short Annealing ◽  
Level Effect

ABSTRACTHeavy n-doping enhanced disordering of GaAs based III-V semiconductor superlattice or quantum well layers, as well as the diffusion of Si in GaAs have been previously explained by the Fermi-level effect model with the triply-negatively-charged group III lattice vacancies identified to be the responsible point defect species. These vacancies have a thermal equilibrium concentration proportional to the cubic power of the electron concentration n, leading to the same dependence of the layer disordering rate. In this paper, in addition, we take into account also the electric field effect produced by the material bandgap heterogeneity and/or hetero-junctions. In heavily n-doped or long time annealing cases, this effect is negligible. At low n-doping levels and for short annealing times, the layer disordering rate can be enhanced or reduced by this effect. Available experimental results of low Si-doped and very short-time annealed samples have been satisfactorily fitted using the Fermi-level effect model.

Thermal Equilibrium Concentrations and Effects of Ga Vacancies in n-TYPE GaAs

1993 ◽  
Vol 300 ◽  
Author(s):  
Teh Y. Tan ◽  
Homg-Ming You ◽  
Ulrich M. Gösele
Keyword(s):  
Temperature Dependence ◽  
Point Defect ◽  
Thermal Equilibrium ◽  
Quantitative Data ◽  
Equilibrium Concentration ◽  
Negative Temperature ◽  
Positive Temperature ◽  
Self Diffusion ◽  
N Doping ◽  
Equilibrium Concentrations

ABSTRACTWe have calculated the thermal equilibrium concentrations of the various Ga vacancy species in GaAs. That of the triply-negatively-charged Ga vacancy, V3Ga has been emphasized, since it dominates Ga self-diffusion and Ga-Al interdiffusion under intrinsic and ndoping conditions, as well as the diffusion of Si donor atoms occupying Ga sites. Under strong n-doping conditions, the thermal equilibrium V3Ga concentration, CeqvGa.3−(n), has been found to exhibit a temperature independence or a negative temperature dependence, in the sense that the CeqvGa.3−(n) value is either unchanged or increases as the temperature is lowered. This is contrary to the normal positive temperature dependence of point defect theerqmal equilibrium concentrations, which decreases as the temperature is lowered. This CeqvGa.3−(n) property provides explanations to a number of outstanding experimental results, either requiring the interpretation thatV3−Ga has attained its thermal equilibrium concentration at the onset of each experiment, or requiring mechanisms involving point defect non-equilibrium phenomena. Furthermore, there exist also a few quantitative data which are in agreement with the presently calculated results.

scholarly journals Modeling Fermi Level Effects in Atomistic Simulations

2002 ◽  
Vol 717 ◽  
Author(s):  
Zudian Qin ◽  
Scott T. Dunham
Keyword(s):  
Fermi Level ◽  
Atomistic Simulations ◽  
Electron Hole ◽  
Lattice Monte Carlo ◽  
Coupled Diffusion ◽  
External Point ◽  
Work Variations ◽  
Dopant Atoms ◽  
Charged Point Defect ◽  
Charged Point

AbstractIn this work, variations in electron potential are incorporated into a Kinetic Lattice Monte Carlo (KLMC) simulator and applied to dopant diffusion in silicon. To account for the effect of dopants, the charge redistribution induced by an external point charge immersed in an electron (hole) sea is solved numerically using the quantum perturbation method. The local carrier concentrations are then determined by summing contributions from all ionized dopant atoms and charged point defects, from which the Fermi level of the system is derived by the Boltzmann equation. KLMC simulations with incorporated Fermi level effects are demonstrated for charged point defect concentration as a function of Fermi level, coupled diffusion phenomenon and field effect on doping fluctuations.

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