Ultrathin Single Crystal CoSi2 Layers on Si(111) and Si(100)

1987 ◽  
Vol 102 ◽  
Author(s):  
R. T. Tung ◽  
J. L. Batstone ◽  
S. M. Yalisove

ABSTRACTThe growth of ultrathin epitaxial CoSi2 layers on Si by molecular beam epitaxy has been studied. This paper briefly outlines recent progress in the growth on Si(111) substrates. New results on the growth of epitaxial CoSi2 on Si(100) are also presented.

2012 ◽  
Vol 111 (6) ◽  
pp. 064112 ◽  
Author(s):  
Miri Choi ◽  
Agham Posadas ◽  
Rytis Dargis ◽  
Chih-Kang Shih ◽  
Alexander A. Demkov ◽  
...  

2015 ◽  
Vol 8 (4) ◽  
pp. 041201 ◽  
Author(s):  
Li Yue ◽  
Peng Wang ◽  
Kai Wang ◽  
Xiaoyan Wu ◽  
Wenwu Pan ◽  
...  

1982 ◽  
Vol 20 (3) ◽  
pp. 731-732 ◽  
Author(s):  
P. W. Sullivan ◽  
T. I. Cox ◽  
R. F. C. Farrow ◽  
G. R. Jones ◽  
D. B. Gasson ◽  
...  

2003 ◽  
Vol 251 (1-4) ◽  
pp. 465-470 ◽  
Author(s):  
Min-Ho Kim ◽  
F.S. Juang ◽  
Y.G. Hong ◽  
C.W. Tu ◽  
Seong-Ju Park

ChemInform ◽  
2010 ◽  
Vol 30 (45) ◽  
pp. no-no
Author(s):  
Li He ◽  
Jianrong Yang ◽  
Shanli Wang ◽  
Yan Wu ◽  
Weizheng Fang

1990 ◽  
Vol 99 (1-4) ◽  
pp. 451-454 ◽  
Author(s):  
Yoshitaka Tomomura ◽  
Masahiko Kitagawa ◽  
Akira Suzuki ◽  
Shigeo Nakajima

1976 ◽  
Vol 15 (6) ◽  
pp. 1001-1007 ◽  
Author(s):  
Takafumi Yao ◽  
Satoru Amano ◽  
Yunosuke Makita ◽  
Shigeru Maekawa

1995 ◽  
Vol 150 ◽  
pp. 1154-1158 ◽  
Author(s):  
Kiyoshi Sakaue, ◽  
Naokatsu Sano ◽  
Hikaru Terauchi ◽  
Akira Yoshihara

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