Ion Beam Crystallography of Metal-Silicon Interfaces: Pd-Si(111)

1981 ◽  
Vol 10 ◽  
Author(s):  
R. Tromp ◽  
E. J. Van Loenen ◽  
M. Iwami ◽  
R. Smeenk ◽  
F. W. Saris

The application of medium energy ion scattering in combination with channelling and blocking to the study of the initial stages of palladium siuicide formation is discussed. After a brief description of the experimental arrangement and method, the effects on the Rutherford backscattering spectra of depositing small quantities of palladium on clean Si(111) are reported. The uniformity and thermal stability of thin palladium silicide films grown at room temperature were measured. Finally, channelling and blocking results were used to carry out a structural analysis of thin epitaxial Pd2Si layers.

2011 ◽  
Vol 83 (8) ◽  
Author(s):  
M. Walker ◽  
M. G. Brown ◽  
M. Draxler ◽  
M. G. Dowsett ◽  
C. F. McConville ◽  
...  

1997 ◽  
Vol 04 (06) ◽  
pp. 1091-1094 ◽  
Author(s):  
K. H. CHAE ◽  
H. C. LU ◽  
P. STATIRIS ◽  
T. GUSTAFSSON

We have used medium energy ion scattering with channeling and blocking to measure the spacing between the two outermost atomic layers on the (111) faces of Cu and Ag as a function of temperature. The Ag (111) surface undergoes a dramatic transformation from being slightly contracted at room temperature to being strongly expanded (+10% of the bulk spacing) around 900°C. Cu (111) shows similar but smaller effects. The change of the surface lattice constant is paralleled by large enhancements of the surface vibration amplitudes. We therefore conclude that our observations are due to large anharmonic effects at the surface. We further discuss our results in terms of a recent microscopic theoretical analysis.


2011 ◽  
Vol 605 (23-24) ◽  
pp. 1934-1940 ◽  
Author(s):  
M. Walker ◽  
M.G. Brown ◽  
M. Draxler ◽  
M.G. Dowsett ◽  
C.F. McConville ◽  
...  

1998 ◽  
Vol 58 (8) ◽  
pp. 4934-4941 ◽  
Author(s):  
T. C. Q. Noakes ◽  
P. Bailey ◽  
P. K. Hucknall ◽  
K. Donovan ◽  
M. A. Howson

1997 ◽  
Vol 117-118 ◽  
pp. 207-211 ◽  
Author(s):  
Young Pil Kim ◽  
Si Kying Choi ◽  
Yong Ho Ha ◽  
Sehun Kim ◽  
Hyun Kyong Kim ◽  
...  

1982 ◽  
Vol 18 ◽  
Author(s):  
E. J. Van Loenen ◽  
M. Iwami ◽  
R. M. Tromp ◽  
J. F. Van Der Veen ◽  
F. W. Saris

The growth process of silver deposited onto the Si(111) 7 × 7 surface at room temperature was studied with medium energy ion scattering in combination with channelling. Coverages studied were in the range 0−8 × 1015 Ag atoms cm−2. The measurements show that silver forms three-dimensional islands. Although incorporation of small amounts of silicon in the silver islands (less than 8 × 10−4 Si atoms cm−2) cannot be excluded, no evidence was found for mixing between silver and silicon or for silicide formation.


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