Optoelectronic properties of graphene-MoS2 hybrid

2013 ◽  
Vol 1505 ◽  
Author(s):  
Medini Padmanabhan ◽  
Kallol Roy ◽  
Srijit Goswami ◽  
T. Phanindra Sai ◽  
Gopalakrishnan Ramalingam ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Electrical Response ◽  
Chemical Vapor ◽  
Layered Materials ◽  
Strong Function ◽  
Exfoliated Graphene ◽  
Device Architecture ◽  
Graphene Flakes ◽  
Grown Graphene

ABSTRACTUltra-thin flakes of layered materials have recently been attracting widespread research interest due to their exotic properties. In this work, we study the optoelectronic response of a hybrid of two such materials – graphene and MoS2. Our devices consist of mechanically exfoliated graphene flakes transferred on top of similarly exfoliated MoS2. The electrical response of the hybrid is studied in the presence of white light. We show that the four-point resistance of graphene is modulated in the presence of light. This effect is observed to be a strong function of gate voltage. We have also extended our studies to CVD (chemical vapor deposition) - grown graphene transferred onto MoS2 which show qualitatively similar features, thereby attesting to the scalability of the device architecture.

scholarly journals Ultrahigh-mobility graphene devices from chemical vapor deposition on reusable copper

2015 ◽  
Vol 1 (6) ◽  
pp. e1500222 ◽  
Author(s):  
Luca Banszerus ◽  
Michael Schmitz ◽  
Stephan Engels ◽  
Jan Dauber ◽  
Martin Oellers ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Copper Substrate ◽  
High Mobility ◽  
Chemical Vapor ◽  
Magnetic Field Sensors ◽  
Exfoliated Graphene ◽  
Cost Efficient ◽  
Grown Graphene ◽  
Graphene Devices

Graphene research has prospered impressively in the past few years, and promising applications such as high-frequency transistors, magnetic field sensors, and flexible optoelectronics are just waiting for a scalable and cost-efficient fabrication technology to produce high-mobility graphene. Although significant progress has been made in chemical vapor deposition (CVD) and epitaxial growth of graphene, the carrier mobility obtained with these techniques is still significantly lower than what is achieved using exfoliated graphene. We show that the quality of CVD-grown graphene depends critically on the used transfer process, and we report on an advanced transfer technique that allows both reusing the copper substrate of the CVD growth and making devices with mobilities as high as 350,000 cm2V–1s–1, thus rivaling exfoliated graphene.

Flexible and Transparent Dielectric Film with a High Dielectric Constant Using Chemical Vapor Deposition-Grown Graphene Interlayer

ACS Nano ◽  
2013 ◽  
Vol 8 (1) ◽  
pp. 269-274 ◽  
Author(s):  
Jin-Young Kim ◽  
Jongho Lee ◽  
Wi Hyoung Lee ◽  
Iskandar N. Kholmanov ◽  
Ji Won Suk ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Dielectric Constant ◽  
Dielectric Film ◽  
Chemical Vapor ◽  
Transparent Dielectric ◽  
Grown Graphene ◽  
High Dielectric

The Effects of Hydrogen Flowrate during Pre-Annealing on Graphene Growth by Chemical Vapor Deposition Using Methanol as a Liquid Carbon Precursor

2019 ◽  
Vol 290 ◽  
pp. 107-112
Author(s):  
Raed Abdalrheem ◽  
Fong Kwong Yam ◽  
Abdul Razak Ibrahim ◽  
Khi Poay Beh ◽  
Hwee San Lim ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Light Transmittance ◽  
High Hydrogen ◽  
Flow Rates ◽  
Hydrogen Flow ◽  
Number Of Layers ◽  
Crystallite Sizes ◽  
Grown Graphene

Studying an influence of several parameters on Chemical Vapor Deposition (CVD) used for graphene synthesis is crucial to optimizing the graphene quality to be Compatible with advanced devices. The effect of different hydrogen (H2) flow-rates (0, 50, 100, 150, 200, 250, and 300 sccm) during the pre-annealing process on CVD grown graphene have been reported. This study revealed that hydrogen flow rates during annealing changed the surface roughness/smoothness of the copper substrates. For high hydrogen flow rates, the smoothing effect was increased. Furthermore, the annealed graphene samples emerged a deferent number of layers because of morphological surface changes. According to Raman D- to G-band intensity ratios (ID/IG), the graphene quality was influenced by the annealing hydrogen flowrate. The visible light transmittance values of the grown graphene samples confirmed a few number of layers (mono to seven-layer). Mostly, the samples which annealed under moderate hydrogen flow rates showed less defects intensities and higher crystallite sizes.

scholarly journals Large scale structures in chemical vapor deposition-grown graphene on Ni thin films

2020 ◽  
Vol 709 ◽  
pp. 138225
Author(s):  
Derya Ataç ◽  
Johnny G.M. Sanderink ◽  
Sachin Kinge ◽  
Dirk J. Gravesteijn ◽  
Alexey Y. Kovalgin ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Large Scale ◽  
Chemical Vapor ◽  
Large Scale Structures ◽  
Scale Structures ◽  
Grown Graphene

Chemical vapor deposition of layered two-dimensional MoSi2N4 materials

Science ◽  
2020 ◽  
Vol 369 (6504) ◽  
pp. 670-674 ◽  
Author(s):  
Yi-Lun Hong ◽  
Zhibo Liu ◽  
Lei Wang ◽  
Tianya Zhou ◽  
Wei Ma ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Density Functional ◽  
Chemical Vapor ◽  
Large Family ◽  
Density Functional Theory Calculations ◽  
Layered Materials ◽  
Molybdenum Nitride ◽  
Two Dimensional ◽  
Chemical Vapor Deposition Growth

Identifying two-dimensional layered materials in the monolayer limit has led to discoveries of numerous new phenomena and unusual properties. We introduced elemental silicon during chemical vapor deposition growth of nonlayered molybdenum nitride to passivate its surface, which enabled the growth of centimeter-scale monolayer films of MoSi2N4. This monolayer was built up by septuple atomic layers of N-Si-N-Mo-N-Si-N, which can be viewed as a MoN2 layer sandwiched between two Si-N bilayers. This material exhibited semiconducting behavior (bandgap ~1.94 electron volts), high strength (~66 gigapascals), and excellent ambient stability. Density functional theory calculations predict a large family of such monolayer structured two-dimensional layered materials, including semiconductors, metals, and magnetic half-metals.

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