Electrical properties of zinc oxide thin films deposited using high-energy H2O generated from a catalytic reaction on platinum nanoparticles

2013 ◽  
Vol 1494 ◽  
pp. 127-132
Author(s):  
Kanji Yasui ◽  
Naoya Yamaguchi ◽  
Eichi Nagatomi ◽  
Souichi Satomoto ◽  
Takahiro Kato
Keyword(s):  
Zinc Oxide ◽  
Electrical Properties ◽  
Film Thickness ◽  
Electron Mobility ◽  
Lattice Mismatch ◽  
Defect Density ◽  
Chemical Vapor ◽  
High Energy ◽  
Chemical Vapor Deposition Method ◽  
Zno Films

ABSTRACTZinc oxide (ZnO) with excellent crystallinity and large electron mobility was grown on aplane (11-20) sapphire (a-Al2O3) substrates by a new chemical vapor deposition method via the reaction between dimethylzinc (DMZn) and high-energy H2O produced by a Pt-catalyzed H2-O2 reaction. The electron mobility at room temperature increased from 30 cm2/Vs to 189 cm2/Vs with increasing film thickness from 0.1 μm to approximately 3 μm. Electron mobility increased significantly with decreasing temperature to approximately 110 – 150 K, but decreased at temperatures less than 100 K for films greater than 500 nm in thickness. On the other hand, the mobility hardly changed with temperature for films lesser than 500 nm in thickness. Based on the dependence of the electrical properties on the film thickness, the ZnO films grown on a-Al2O3 substrates are considered to consist of an interfacial layer with a high defect density (degenerate layer) generated due to a large lattice mismatch between ZnO and Al2O3 substrates and an upper layer with a low defect density.

Preparation of ZnO by a nearby vaporizing chemical vapor deposition method

2003 ◽  
Vol 18 (9) ◽  
pp. 2029-2032 ◽  
Author(s):  
Junichi Nishino ◽  
Yoshio Nosaka
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Source Material ◽  
Chemical Vapor Deposition Method ◽  
Zno Films ◽  
Source Surface ◽  
Deposition Method ◽  
Zno Film

Zinc oxide (ZnO) films were prepared by a nearby vaporizing chemical vapor deposition method using bis(2,4-pentanedionato)zinc as a source material. The deposition rate increased exponentially from 0.58 to 147 nm min−1 with increasing substrate temperature (Ts). The highest preferred orientation to the c axis was obtained under the conditions that the distance between substrate and source surface was 5.0 mm, and the Ts was 300 °C. When we used a sapphire (0001) substrate, an epitaxial ZnO film could be deposited on this condition.

Growth of Hexagonal Gallium Nitride Films On The (111) Surfaces of Silicon with Zinc Oxide Buffer Layers

1996 ◽  
Vol 449 ◽  
Author(s):  
Y. Kim ◽  
C. G. Kim ◽  
K-W. Lee ◽  
K-S. Yu ◽  
J. T. Park ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Gallium Nitride ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Lattice Mismatch ◽  
Chemical Vapor ◽  
High Energy ◽  
Buffer Layers ◽  
X Ray

ABSTRACTThe growth of gallium nitride films on sapphire substrates has not been straightforward because of the large lattice mismatch between gallium nitride and sapphire. Zinc oxide is structurally the closest material to gallium nitride and therefore is finding use as the substrate for gallium nitride. Single crystal wafers of zinc oxide are hard to obtain and very expensive. However, a thin layer of zinc oxide on a suitable substrate might solve this problem. In this work, highly c-axis oriented zinc oxide buffer layers were grown on Si(lll) substrates at temperatures 410–540 °C by chemical vapor deposition of bis(2,2,6,6-tetramethyl–3,5-heptanedionato)zinc, Zn(tmhd)2, and the hexagonal GaN films were subsequently deposited on them at 500 °C using the single precursor tris(diethyl -μ-amido-gallium), [(C2H5)2 GaNH2]3. The compound Zn(tmhd)2 was found to require oxygen for the deposition of zinc oxide. In the case of gallium nitride, low pressure chemical vapor deposition of tris(diethyl-μ-amido-gallium) worked reasonably well with or without a carrier gas. The buffer layers and the GaN films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), and reflection high energy elctron diffraction (RHEED).

scholarly journals Electrical properties of mechanically activated zinc oxide

2006 ◽  
Vol 38 (2) ◽  
pp. 131-138 ◽  
Author(s):  
K. Vojisavljevic ◽  
M. Zunic ◽  
G. Brankovic ◽  
T. Sreckovic
Keyword(s):  
Zinc Oxide ◽  
Electrical Properties ◽  
Grain Boundaries ◽  
Arrhenius Equation ◽  
Electrical Response ◽  
High Energy ◽  
Microstructural Properties ◽  
Impedance Analyzer ◽  
Zinc Oxide Powder ◽  
Zno Ceramics

Microstructural properties of a commercial zinc oxide powder were modified by mechanical activation in a high-energy vibro-mill. The obtained powders were dry pressed and sintered at 1100?C for 2 h. The electrical properties of grain boundaries of obtained ZnO ceramics were studied using an ac impedance analyzer. For that purpose, the ac electrical response was measured in the temperature range from 23 to 240?C in order to determine the resistance and capacitance of grain boundaries. The activation energies of conduction were obtained using an Arrhenius equation. Donor densities were calculated from Mott-Schottky measurements. The influence of microstructure, types and concentrations of defects on electrical properties was discussed.

On the UV-light-induced Desorption/Adsorption Mechanism of Atmospheric Species in Solution-processed Zinc Oxide Thin Films

MRS Advances ◽  
2019 ◽  
Vol 4 (2) ◽  
pp. 111-117
Author(s):  
José Bruno Cantuária ◽  
Giovani Gozzi ◽  
Lucas Fugikawa Santos
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Electrical Properties ◽  
Uv Light ◽  
Atmospheric Oxygen ◽  
Low Cost ◽  
Environmental Parameters ◽  
Zno Films ◽  
Desorption Rate ◽  
Transparent Semiconductor

AbstractZinc oxide (ZnO) is a n-type transparent semiconductor which can be processed by low cost techniques (such as spray-pyrolysis and spin-coating) and can be applied as the active layer of thin-films transistors (TFTs). The electrical properties of ZnO films are strongly affected when the device is exposed to room conditions and/or UV-light, suggesting possible applications as UV or/and gas sensors. Atmospheric oxygen molecules adsorbed on ZnO surface act as charge traps, decreasing the material conductivity. The incidence of UV-light causes an increase of the material conductivity due to the photogeneration of electron-hole pairs via direct band-to-band transitions (classic photoconductivity process) and due to the desorption of oxygen molecules, which presents a relatively slower response and is a less understood mechanism. In the current paper, we study the influence of environmental parameters, such as temperature, humidity and UV-light intensity, on the electrical properties of spin-coated ZnO thin films to understand the role of the desorption mechanism on the photoconductivity process. The analysis of the device current vs. time curves shows the existence of two light-induced desorption mechanisms: i) one which increases the electrical conductivity of the ZnO film (desorption-like process) and ii) a second one which decreases the conductivity (adsorption-like process). A Plackett-Burman design of experiment (DOE) was used to study the influence of characterization factors like UV intensity, temperature and humidity on electrical parameters obtained from the experimental curves. We observed that the desorption-like process is a first order mechanism, exhibiting desorption rate proportional to n(t), where n(t) represents the adsorbate concentration as a function of the time, whereas the adsorption-like mechanism exhibits a desorption rate proportional to the forth power of n(t).

Growth of Highly Oriented Zinc Oxide Thin Films by Plasma Enhanced Chemical Vapor Deposition

2006 ◽  
Vol 321-323 ◽  
pp. 1687-1690 ◽  
Author(s):  
Hee Joon Kim ◽  
Dong Young Jang ◽  
Prem Kumar Shishodia ◽  
Akira Yoshida
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Visible Region ◽  
Chemical Vapor ◽  
Zno Films ◽  
X Ray ◽  
Crystalline Films

In the paper, zinc oxide (ZnO) thin films are deposited by plasma enhanced chemical vapor deposition (PECVD) at different substrate temperatures. The ZnO films are characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The analysis results indicate that highly crystalline films with high orientation can be obtained at a substrate temperature of 300 oC with 50 ml/min flow rate from Diethylzinc (DEZ). Furthermore, the investigation of optical property shows that ZnO films are transparent, and the peak transmittance in the visible region is as high as 85%.

Intrinsic Stress Measurements in CVD Diamond Films

1999 ◽  
Vol 593 ◽  
Author(s):  
Jin Yu ◽  
J.G. Kim ◽  
Y. C. Sohn ◽  
Y. S. Lee
Keyword(s):  
Film Thickness ◽  
Diamond Films ◽  
Strain Analysis ◽  
Chemical Vapor ◽  
Film Stress ◽  
Intrinsic Stress ◽  
Ex Situ ◽  
Chemical Vapor Deposition Method ◽  
Si Substrate ◽  
Curvature Measurements

ABSTRACTDiamond films were grown over Si substrate at 1253K by the hot filament chemical vapor deposition method using CH4/H2 gas mixture, and intrinsic stresses in the film were deduced from the ex-situ curvature measurements. In order to account for the creep deformation of the Si substrate, an elastic/plastic stress and strain analysis were conducted. Results showed that intrinsic stresses were generally several times larger than the average film stresses and always positive increasing with the film thickness. For the film thickness larger than 10μm, stress relaxation by creep of the substrate became significant, and must be considered for the accurate assessment of the film stress in diamond. Later, an analysis based on the grain growth accounted for the development of intrinsic stresses reasonably well

scholarly journals Correlation of Electrical Properties With Defects in A Homoepitaxial Chemical-Vapor-Deposited Diamond

1995 ◽  
Vol 416 ◽  
Author(s):  
S. Han ◽  
G. Rodriguez ◽  
A. Taylori ◽  
M. A. Plano ◽  
M. D. Moyer ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Diamond Film ◽  
Carrier Transport ◽  
Defect Density ◽  
Chemical Vapor ◽  
Hole Mobility ◽  
Limiting Factor ◽  
X Ray Diffraction ◽  
Density Region ◽  
X Ray

ABSTRACTA high-quality, low-stress 200 gim epitaxial diamond film has been grown on a 400 μm thick high-temperature-high-pressure Ila diamond. X-ray diffraction images of the film indicate that a large region of the film is fairly defect free and individual dislocations have been imaged in this region. Depth-resolved Raman results indicate that the region of the film with a low density of defects also has lower stress than in the higher defect density region. Transient photoconductivity measurements were performed on the high and low line defect density regions of the homoepitaxial diamond film to determine the effects of the stress and defect density on the combined electron-hole mobility and carrier lifetime. The correlation between the electrical properties and the x-ray diffraction imaging suggests that line defects may not be the limiting factor in the carrier transport at the present film quality

Structural Defects and Critical Electric Field in 3C-SiC

2006 ◽  
Vol 527-529 ◽  
pp. 431-434 ◽  
Author(s):  
Michael A. Capano ◽  
A.R. Smith ◽  
Byeung C. Kim ◽  
E.P. Kvam ◽  
S. Tsoi ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Electric Field ◽  
Lattice Mismatch ◽  
Defect Density ◽  
Chemical Vapor ◽  
Structural Defects ◽  
X Ray ◽  
Transmission Electron ◽  
Current Voltage ◽  
P Type

3C-SiC p-type epilayers were grown to thicknesses of 1.5, 3, 6 and 10 μm on 2.5° off-axis Si(001) substrates by chemical vapor deposition (CVD). Silane and propane were used as precursors. Structural analysis of epilayers was performed using transmission electron microscopy (TEM), high-resolution x-ray diffractometry (HRXRD), and Raman spectroscopy. TEM showed defect densities (stacking faults, twins and dislocations) decreasing with increasing distance from the SiC/Si interface as the lattice mismatch stress is relaxed. This observation was corroborated by a monotonic decrease in HRXRD peak width (FWHM) from 780 arcsecs (1.5 μm thick epilayer) to 350 arcsecs (10 μm thick epilayer). Significant further reduction in x-ray FWHM is possible because the minimum FWHM detected is greater than the theoretical FWHM for SiC (about 12 arcsecs). Raman spectroscopy also indicates that the residual biaxial in-plane strain decreases with increasing epilayer thickness initially, but becomes essentially constant between 6 and 10 μm. Structural defect density shows the most significant reduction in the first 2 μm of growth. Phosphorus implantation was used to generate n+/p junctions for the measurement of the critical electric field in 3C-SiC. Based on current-voltage analyses, the critical electric field in p-type 3C-SiC with a doping of 2x1017 cm-3 is 1.3x106 V/cm.

Deposition of Zinc Oxide Thin Films Using a Surface Reaction on Platinum Nanoparticles

2011 ◽  
Vol 1315 ◽  
Author(s):  
Kanji Yasui ◽  
Hitoshi Miura ◽  
Hiroshi Nishiyama
Keyword(s):  
Free Exciton ◽  
Exothermic Reaction ◽  
Chemical Vapor ◽  
Band Edge ◽  
Chemical Vapor Deposition Method ◽  
Zno Films ◽  
Band Edge Emission ◽  
Edge Emission ◽  
Neutral Donor ◽  
Pl Spectra

ABSTRACTA new chemical vapor deposition method for the growth of ZnO films using the reaction between dimethylzinc (DMZn) and thermally excited H2O produced by a Pt-catalyzed H2–O2 reaction was investigated. The thermally excited H2O molecules formed by the exothermic reaction of H2 and O2 on the catalyst were ejected from a fine nozzle into the reaction zone and allowed to collide with DMZn ejected from another fine nozzle. The ZnO films were grown directly on a-plane (11-20) sapphire substrates at substrate temperatures of 773-873 K with no buffer layer. X-ray diffraction patterns exhibited intense (0002) and (0004) peaks from the ZnO(0001) index plane. The smallest full width at half maximum (FWHM) value of the ω- rocking curve of ZnO(0002) was less than 0.1º. The largest Hall mobility and the smallest residual carrier concentration of the ZnO films were 169 cm2V−1s−1 and 1.7×1017 cm−3, respectively. Photoluminescence (PL) spectra at room temperature exhibited a band edge emission at 3.29 eV, with a FWHM of 104 meV. Green luminescence from deeper levels was generally about 1.5% of the band edge emission intensity. PL spectra at 5 K showed a strong emission peak at 3.3603 eV, attributed to the neutral donor-bound exciton Dºx. The FWHM was as low as 1.0 meV. Free exciton emissions also appeared at 3.3757 eV (FXA, n=1) and 3.4221 eV (FXA, n=2).

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