Patterning biopolymer surfaces by enzymatic soft lithography

2011 ◽  
Vol 1340 ◽  
Author(s):  
A. Guyomard-Lack ◽  
C. Moreau ◽  
N. Delorme ◽  
J.-F. Bardeau ◽  
B. Cathala
Keyword(s):  
Soft Lithography ◽  
Silicon Surface ◽  
Large Scale ◽  
Microcontact Printing ◽  
Lateral Diffusion ◽  
Patterned Surfaces ◽  
Force Microscopy ◽  
Atomic Force ◽  
Ink Transfer ◽  
Micro Patterns

ABSTRACTA novel rapid and easy-to-use method for patterning surfaces on large scale is described. Micro-patterns were created by direct contact of trypsin-functionalized poly(dimethylsiloxane) (PDMS) stamps with poly-L-lysine (PLL) layer adsorbed on silicon surface. The catalytic process does not involve ink transfer and thus lateral diffusion is avoided. As a result duplication of the stamp pattern is highly enhanced comparatively to standard microcontact printing procedure where PLL is used as ink and transferred on silicon surface. Patterning was revealed by fluorescence microscopy and atomic force microscopy (AFM). Adsorption on the patterned surfaces of cellulose nanocrystals was investigated as an example of application.

Impact of Chemomechanical Polishing on the Chemical Composition and Morphology of the Silicon Surface

1995 ◽  
Vol 386 ◽  
Author(s):  
Hermann Fusstetrer ◽  
Anton Schnegg ◽  
Dieter Gräf ◽  
Helmut Kirschner ◽  
Michael Brohl ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Silicon Surface ◽  
Large Scale ◽  
Nucleophilic Attack ◽  
Force Microscopy ◽  
Atomic Force ◽  
Light Point ◽  
Resolution Electron ◽  
Surface Irregularities ◽  
Electron Energy Loss

ABSTRACTThe polishing technology used for manufacturing ultraflat and smooth Si surfaces on a large scale is the chemomechanical polishing (CMP) technique. This technique combines the chemical corrosive removal of silicon atoms and the mechanical transport of the agents. The removal rates strongly depend on the interaction of mechanical parameters and the chemistry involved in the polishing process like the pH of the alkaline polishing slurry used. Removal of Si during CMP is explained by a nucleophilic attack of OH− to silicon atoms catalyzing the corrosive reaction of H2O resulting in cleavage of silicon backbonds. Characterization of the surface chemistry of the silicon wafer after polishing by X-Ray Photoelectron Spectroscopy and High-Resolution Electron Energy Loss Spectroscopy reveals an oxide free, predominantly hydride covered silicon surface displaying hydrophobic properties. Morphological features like microroughness as well as localized surface irregularities on the silicon surface, also referred to as Light Point Defects, depend on different strongly interacting process parameters. Microroughness is reduced by CMP by several orders of magnitude as characterized by lightscattering techniques and Atomic Force Microscopy.

Silica Sol-Gel Patterned Surfaces Based on Dip-Pen Nanolithography and Microstamping: A Comparison in Resolution and Throughput

2016 ◽  
Vol 720 ◽  
pp. 264-268 ◽  
Author(s):  
Santiago Arango-Santander ◽  
Sidónio C. Freitas ◽  
Alejandro Pelaez-Vargas ◽  
Claudia García
Keyword(s):  
Soft Lithography ◽  
Sol Gel ◽  
Silica Sol ◽  
Experimental Methodology ◽  
Patterned Surfaces ◽  
Force Microscopy ◽  
Optical Scanning ◽  
Atomic Force ◽  
Biomaterial Surface ◽  
Dip Pen Nanolithography

Fabrication of patterns on silicon and gold via Dip-Pen Nanolithography (DPN) using silica sol as ink and the combination of DPN, soft lithography, and silica sol-gel to transfer patterns from silicon and gold to stainless steel were assessed. In addition, a comparison in terms of throughput and resolution of both protocols was performed. Optical, scanning electron and atomic force microscopy were used to characterize the patterns. Silica sol showed high resolution but low throughput when used to pattern directly on gold and silicon using DPN. The combination of DPN, silica sol-gel and soft lithography showed high throughput and resolution. The present experimental methodology was useful to create patterns on a surface and transfer them to another surface of interest, which may serve as a biomaterial surface modification model.

scholarly journals Thiol-ene click microcontact printing of gold nanoparticles onto silicon surfaces

2018 ◽  
Vol 96 (2) ◽  
pp. 190-195 ◽  
Author(s):  
Casey M. Platnich ◽  
Abhinandan Banerjee ◽  
Vinayaraj Ozhukil Kollath ◽  
Kunal Karan ◽  
Simon Trudel
Keyword(s):  
Electron Microscopy ◽  
Gold Nanoparticles ◽  
Silicon Surface ◽  
Microcontact Printing ◽  
Silicon Surfaces ◽  
Ene Reaction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Printing Ink ◽  
Scanning Electron

We report a novel process to selectively pattern nanomaterials, specifically gold nanoparticles, onto a silicon surface through “click” chemistry, to consistently and efficiently join together small units through a quick and simple reaction. We employed the UV-initiated thiol-ene reaction, which is used in tandem with microcontact printing. Dithiol-capped nanoparticles were used as a printing ink and were grafted onto ene-terminated Si(100) wafers by pressing a nanoparticle-impregnated poly(dimethylsiloxane) stamp, while irradiating with ultraviolet light to activate a radical initiator. The resulting structures were characterized using scanning electron microscopy and atomic force microscopy.

scholarly journals Controlling T cells spreading, mechanics and activation by micropatterning

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Anaïs Sadoun ◽  
Martine Biarnes-Pelicot ◽  
Laura Ghesquiere-Dierickx ◽  
Ambroise Wu ◽  
Olivier Théodoly ◽  
...  
Keyword(s):  
T Cells ◽  
T Cell ◽  
T Cell Activation ◽  
Cell Activation ◽  
Young Modulus ◽  
Careful Examination ◽  
Adhesion Receptor ◽  
Force Microscopy ◽  
Atomic Force ◽  
Micro Patterns

AbstractWe designed a strategy, based on a careful examination of the activation capabilities of proteins and antibodies used as substrates for adhering T cells, coupled to protein microstamping to control at the same time the position, shape, spreading, mechanics and activation state of T cells. Once adhered on patterns, we examined the capacities of T cells to be activated with soluble anti CD3, in comparison to T cells adhered to a continuously decorated substrate with the same density of ligands. We show that, in our hand, adhering onto an anti CD45 antibody decorated surface was not affecting T cell calcium fluxes, even adhered on variable size micro-patterns. Aside, we analyzed the T cell mechanics, when spread on pattern or not, using Atomic Force Microscopy indentation. By expressing MEGF10 as a non immune adhesion receptor in T cells we measured the very same spreading area on PLL substrates and Young modulus than non modified cells, immobilized on anti CD45 antibodies, while retaining similar activation capabilities using soluble anti CD3 antibodies or through model APC contacts. We propose that our system is a way to test activation or anergy of T cells with defined adhesion and mechanical characteristics, and may allow to dissect fine details of these mechanisms since it allows to observe homogenized populations in standardized T cell activation assays.

Characterization of High Quality, Large-Scale Growth of Monolayer WS2 Domains via Chemical Vapor Deposition Technique

2021 ◽  
Author(s):  
Somayeh Asgary ◽  
Amir Hoshang Ramezani ◽  
Zhaleh Ebrahimi Nejad
Keyword(s):  
Large Scale ◽  
Average Length ◽  
Chemical Vapor ◽  
Growth Time ◽  
High Quality ◽  
Force Microscopy ◽  
Atomic Force ◽  
Regular Triangle ◽  
Vapor Deposition Technique

Abstract WS2 flakes have been grown successfully on SiO2 substrate via chemical vapor (CVD) deposition method by reduction and sulfurization of WO3 using Ar/ H2 gas and sulfur evaporated from solid sulfur powder. The prepared samples were characterized by optical microscopy (OM), atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman spectra and photoluminescence (PL). Large domain WS2 monolayers are obtained by extending the growth time. The perfect triangular single-crystalline WS2 flakes with an average length of more than 35 µm were achieved. The sharp PL peak (∼1.98 eV) and two distinct Raman peaks (E2g and A1g) with a ∼ 71.5 cm-1 peak split indicating that relatively high quality WS2 crystals with a regular triangle shape can be synthesized. Higher growth time shows larger triangular-shaped of WS2.

scholarly journals Large-scale analysis of high-speed atomic force microscopy data sets using adaptive image processing

2012 ◽  
Vol 3 ◽  
pp. 747-758 ◽  
Author(s):  
Blake W Erickson ◽  
Séverine Coquoz ◽  
Jonathan D Adams ◽  
Daniel J Burns ◽  
Georg E Fantner
Keyword(s):  
High Speed ◽  
Large Scale ◽  
Data Sets ◽  
Force Microscopy ◽  
Topographic Features ◽  
Atomic Force ◽  
Large Scale Analysis ◽  
Adaptive Image Processing ◽  
True Representation ◽  
Microscopy Data

Modern high-speed atomic force microscopes generate significant quantities of data in a short amount of time. Each image in the sequence has to be processed quickly and accurately in order to obtain a true representation of the sample and its changes over time. This paper presents an automated, adaptive algorithm for the required processing of AFM images. The algorithm adaptively corrects for both common one-dimensional distortions as well as the most common two-dimensional distortions. This method uses an iterative thresholded processing algorithm for rapid and accurate separation of background and surface topography. This separation prevents artificial bias from topographic features and ensures the best possible coherence between the different images in a sequence. This method is equally applicable to all channels of AFM data, and can process images in seconds.

scholarly journals Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon (DLC)-coated Si probe

2011 ◽  
Vol 6 (1) ◽  
pp. 518 ◽  
Author(s):  
Xiaohong Jiang ◽  
Guoyun Wu ◽  
Jingfang Zhou ◽  
Shujie Wang ◽  
Ampere A Tseng ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Silicon Surface ◽  
Diamond Like Carbon ◽  
Force Microscopy ◽  
Atomic Force
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