Effect of Substrate Temperature on Hardness and Transparency of SiOC(–H) Thin Films Synthesized by Atmospheric Pressure Plasma Enhanced CVD Method

2011 ◽  
Vol 1321 ◽  
Author(s):  
Mayui Noborisaka ◽  
So Nagashima ◽  
Hidetaka Hayashi ◽  
Naoharu Ueda ◽  
Kyoko Kumagai ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Atmospheric Pressure ◽  
Structural Changes ◽  
Protective Coatings ◽  
Atmospheric Pressure Plasma ◽  
Polymeric Materials ◽  
Optical Transmittance ◽  
Plasma Enhanced Cvd ◽  
Pressure Plasma

ABSTRACTSilicon-based films have gained much interest as protective coatings for transparent polymeric materials. In this study, SiOC(–H) thin films were deposited on polycarbonate (PC) or Si substrates from trimethylsilane (TrMS) gas diluted with He gas by atmospheric pressure plasma enhanced CVD (AP-PECVD) method with varying substrate temperature, and transparency and hardness of the films were investigated. The films exhibited a good optical transparency with an optical transmittance of about 90% irrespective of the substrate temperature, and the hardness increased from 0.6 to 1.3 GPa as the substrate temperature increased from 60 to 140°C. The results are discussed in terms of chemical structural changes in the films according to the substrate temperature.

scholarly journals Atmospheric Pressure Plasma Polymerized 2-Ethyl-2-oxazoline Based Thin Films for Biomedical Purposes

Polymers ◽  
2020 ◽  
Vol 12 (11) ◽  
pp. 2679
Author(s):  
Věra Mazánková ◽  
Pavel Sťahel ◽  
Petra Matoušková ◽  
Antonín Brablec ◽  
Jan Čech ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Atmospheric Pressure ◽  
Plasma Polymerization ◽  
Film Surface ◽  
Atmospheric Pressure Plasma ◽  
Bacterial Biofilm ◽  
Depth Sensing ◽  
Pressure Plasma ◽  
Highly Active

Polyoxazoline thin coatings were deposited on glass substrates using atmospheric pressure plasma polymerization from 2-ethyl-2-oxazoline vapours. The plasma polymerization was performed in dielectric barrier discharge burning in nitrogen at atmospheric pressure. The thin films stable in aqueous environments were obtained at the deposition with increased substrate temperature, which was changed from 20 ∘C to 150 ∘C. The thin film deposited samples were highly active against both S. aureus and E. coli strains in general. The chemical composition of polyoxazoline films was studied by FTIR and XPS, the mechanical properties of films were studied by depth sensing indentation technique and by scratch tests. The film surface properties were studied by AFM and by surface energy measurement. After tuning the deposition parameters (i.e., monomer flow rate and substrate temperature), stable films, which resist bacterial biofilm formation and have cell-repellent properties, were achieved. Such antibiofouling polyoxazoline thin films can have many potential biomedical applications.

scholarly journals Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1296
Author(s):  
Iryna Kuchakova ◽  
Maria Daniela Ionita ◽  
Eusebiu-Rosini Ionita ◽  
Andrada Lazea-Stoyanova ◽  
Simona Brajnicov ◽  
...  
Keyword(s):  
Thin Films ◽  
Atmospheric Pressure ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Polymeric Materials ◽  
Thin Film Deposition ◽  
Plasma Jets ◽  
Film Deposition ◽  
Rf Plasma ◽  
Pressure Plasma

Thin film deposition with atmospheric pressure plasmas is highly interesting for industrial demands and scientific interests in the field of biomaterials. However, the engineering of high-quality films by high-pressure plasmas with precise control over morphology and surface chemistry still poses a challenge. The two types of atmospheric-pressure plasma depositions of organosilicon films by the direct and indirect injection of hexamethyldisiloxane (HMDSO) precursor into a plasma region were chosen and compared in terms of the films chemical composition and morphology to address this. Although different methods of plasma excitation were used, the deposition of inorganic films with above 98% of SiO2 content was achieved for both cases. The chemical structure of the films was insignificantly dependent on the substrate type. The deposition in the afterglow of the DC discharge resulted in a soft film with high roughness, whereas RF plasma deposition led to a smoother film. In the case of the RF plasma deposition on polymeric materials resulted in films with delamination and cracks formation. Lastly, despite some material limitations, both deposition methods demonstrated significant potential for SiOx thin-films preparation for a variety of bio-related substrates, including glass, ceramics, metals, and polymers.

Trajectory effect on the properties of large area ZnO thin films deposited by atmospheric pressure plasma jet

2014 ◽  
Vol 314 ◽  
pp. 1074-1081 ◽  
Author(s):  
Jia-Yang Juang ◽  
Tung-Sheng Chou ◽  
Hsin-Tien Lin ◽  
Yuan-Fang Chou ◽  
Chih-Chiang Weng
Keyword(s):  
Thin Films ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Zno Thin Films ◽  
Atmospheric Pressure Plasma Jet ◽  
Large Area ◽  
Pressure Plasma

Deposition of thin films on glass fiber fabrics by atmospheric pressure plasma jet

2020 ◽  
Vol 404 ◽  
pp. 126498
Author(s):  
Ming Gao ◽  
Yu Wang ◽  
Yongliang Zhang ◽  
Ying Li ◽  
Yao Tang ◽  
...  
Keyword(s):  
Thin Films ◽  
Glass Fiber ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma
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