Physics of Oxides for Future Devices

MRS Bulletin ◽  
2010 ◽  
Vol 35 (3) ◽  
pp. 227-230 ◽  
Author(s):  
James F. Scott

AbstractFerroelectric oxides underwent a renaissance in the 1980s and 1990s, driven by the success in commercializing thin-film ferroelectric random-access memory devices (FRAMs) for applications such as the SONY PlayStation 2 memory board. Materials scientists gravitated into this new field from magnetic oxides and from high-Tcsuperconductivity. But as the FRAM prospects wane and neither dynamic random-access memory devices nor FLASH memory has been replaced, we now require new directions for materials research on oxides. In this article, I outline briefly four new directions for ferroelectric oxide research: something old—ferroelectrically induced ferromagnetism and multiferroic switching; something new—THz emission from oxide ferroelectrics; something borrowed—Heisenberg-like switching of domains in nanoferroelectrics; and something blue—ZnO light-emitting devices. Magnetoelectricity—the linear coupling of polarization and magnetization—was theoretically predicted by Igor Dzyaloshinskii in 1957 and measured experimentally by Astrov two years later. It did not produce commercial devices. Although a flurry of new work occurred in the 1970s, emphasizing boracites—mostly by Hans Schmid in Geneva, no materials were found that exhibited large effects at room temperature. In the past decade, the search has been renewed, emphasizing rare earth systems such as Tb manganites.

2020 ◽  
Vol 12 (2) ◽  
pp. 02008-1-02008-4
Author(s):  
Pramod J. Patil ◽  
◽  
Namita A. Ahir ◽  
Suhas Yadav ◽  
Chetan C. Revadekar ◽  
...  

2012 ◽  
Vol 21 (6) ◽  
pp. 065201 ◽  
Author(s):  
Jian-Wei Zhao ◽  
Feng-Juan Liu ◽  
Hai-Qin Huang ◽  
Zuo-Fu Hu ◽  
Xi-Qing Zhang

2014 ◽  
Vol 602-603 ◽  
pp. 1056-1059 ◽  
Author(s):  
Min Chang Kuan ◽  
Fann Wei Yang ◽  
Chien Min Cheng ◽  
Kai Huang Chen ◽  
Jian Tz Lee

Up to now, the various non-volatile memory devices such as, ferroelectric random access memory (FeRAM), magnetron random access memory (MRAM), and resistance random access memory (RRAM) were widely discussed and investigated. For these nonvolatile memory devices, the resistance random access memory (RRAM) devices will play an important role because of its non-destructive readout, low operation voltage, high operation speed, long retention time, and simple structure. The resistance random access memory (RRAM) devices were only consisting of one resistor and one corresponding transistor. The subject of this work was to study the characteristics of manganese oxide (MnO) thin films deposited on transparent conductive thin film using the rf magnetron sputtering method. The optimal sputtering conditions of as-deposited manganese oxide (MnO) thin films were the rf power of 80 W, chamber pressure of 20 mTorr, substrate temperature of 580°C, and an oxygen concentration of 40%. The basic mechanisms for the bistable resistance switching were observed. In which, the non-volatile memory and switching properties of the manganese oxide (MnO) thin film structures were reported and the relationship between the memory windows and electrical properties was investigated.


2012 ◽  
Vol 101 (3) ◽  
pp. 032403 ◽  
Author(s):  
H. Liu ◽  
D. Bedau ◽  
D. Backes ◽  
J. A. Katine ◽  
A. D. Kent

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