Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces

2016 ◽  
Vol 6 (2) ◽  
pp. 77-83 ◽  
Author(s):  
Ning An ◽  
Kaiyang Wang ◽  
Haohan Wei ◽  
Qinghai Song ◽  
Shumin Xiao
Keyword(s):  
Refractive Index ◽  
Titanium Dioxide ◽  
Electron Beam ◽  
High Refractive Index ◽  
Electron Beam Evaporation ◽  
Titanium Dioxide Film ◽  
Image Position ◽  
Dioxide Film

Abstract

Titanium Dioxide Film Coated Excessively Tilted Fiber Grating for Ultra-Sensitive Refractive Index Sensor

2018 ◽  
Vol 36 (22) ◽  
pp. 5285-5297 ◽  
Author(s):  
Zhihong Li ◽  
Qianqian Luo ◽  
Boteng Yan ◽  
Xiukai Ruan ◽  
Yaoju Zhang ◽  
...  
Keyword(s):  
Refractive Index ◽  
Titanium Dioxide ◽  
Refractive Index Sensor ◽  
Fiber Grating ◽  
Titanium Dioxide Film ◽  
Dioxide Film

High refractive index TiO2film deposited by electron beam evaporation

2009 ◽  
Vol 25 (3) ◽  
pp. 257-260 ◽  
Author(s):  
J. K. Yao ◽  
H. L. Huang ◽  
J. Y. Ma ◽  
Y. X. Jin ◽  
Y. A. Zhao ◽  
...  
Keyword(s):  
Refractive Index ◽  
Electron Beam ◽  
High Refractive Index ◽  
Electron Beam Evaporation

High Refractive Index Dielectric Prepared by Electron Beam Evaporation for Photonic Crystal Optical Biosensor Application

2010 ◽  
Vol 93-94 ◽  
pp. 545-548
Author(s):  
B. Saekow ◽  
S. Porntheeraphat ◽  
Sakon Rahong ◽  
S. Jaruvanawat ◽  
J. Nukeaw
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Refractive Index ◽  
Electron Beam ◽  
Photonic Crystal ◽  
Optical Measurement ◽  
High Refractive Index ◽  
Electron Beam Evaporation ◽  
Dielectric Thin Film ◽  
Thin Film Layer

The fabricated photonic crystal biosensor device consists of SOG material and titanium dioxide (TiO2) thin films as low and high refractive indexes dielectric layers, respectively. Nano-Imprinting Lithography (NIL) process was used to duplicate periodic line as grating structure from Ni-master mold onto SOG/glass. High refractive index dielectric thin film layer was deposited by using electron beam evaporation system. The surface morphology and thickness of thin film are characterized by atomic force microscope (AFM) and field emission scanning electron microscope (FE-SEM), respectively. The optical measurement system is set up to observed the sensitivity of fabricated device. A shift of reflected peak wavelength observed from DI-water and IPA was tested. The morphology and the thickness of the prepared dielectric thin films are affected to the efficiency of fabricated device.

Preparation and properties of a long time durable superhydrophilic titanium dioxide film obtained by a sol-gel process

2017 ◽  
Vol 59 (1) ◽  
pp. 81-85
Author(s):  
Jianjun Zhang ◽  
Hao Zeng ◽  
Chun Liu ◽  
Chao Li ◽  
Sude Ma ◽  
...  
Keyword(s):  
Titanium Dioxide ◽  
Sol Gel ◽  
Titanium Dioxide Film ◽  
Sol Gel Process ◽  
Long Time ◽  
Dioxide Film

Preparation of anatase phase titanium dioxide film by non-aqueous electrodeposition

2016 ◽  
Vol 65 ◽  
pp. 5-8 ◽  
Author(s):  
Takuma Hachisu ◽  
Kazuaki Shi ◽  
Tokihiko Yokoshima ◽  
Atsushi Sugiyama ◽  
Shigeki Kuroiwa ◽  
...  
Keyword(s):  
Titanium Dioxide ◽  
Anatase Phase ◽  
Titanium Dioxide Film ◽  
Dioxide Film ◽  
Aqueous Electrodeposition
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