Strong visible light emission from silicon-oxycarbide nanowire arrays prepared by electron beam lithography and reactive ion etching

2015 ◽  
Vol 30 (23) ◽  
pp. 3692-3699 ◽  
Author(s):  
Vasileios Nikas ◽  
Natasha Tabassum ◽  
Brian Ford ◽  
Lloyd Smith ◽  
Alain E. Kaloyeros ◽  
...  
Keyword(s):  
Electron Beam ◽  
Visible Light ◽  
Electron Beam Lithography ◽  
Light Emission ◽  
Reactive Ion Etching ◽  
Silicon Oxycarbide ◽  
Nanowire Arrays ◽  
Ion Etching ◽  
Image Position ◽  
Visible Light Emission

Abstract

Electron beam lithography and reactive ion etching of nanometer size features in niobium films

2001 ◽  
Vol 15 (1-2) ◽  
pp. 171-173 ◽  
Author(s):  
T.T. Piotrowski ◽  
A. Piotrowska ◽  
E. Kamińska ◽  
Z. Szopniewski ◽  
S. Koleśnik ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Nanometer Size

Sub-half-micrometre gratings using e-beam lithography and reactive ion etching

1991 ◽  
Vol 69 (3-4) ◽  
pp. 508-511
Author(s):  
M. Fallahi ◽  
R. Barber
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Light Attenuation ◽  
Reactive Ion Etching ◽  
Single Layer ◽  
Second Order ◽  
High Quality ◽  
Ion Etching ◽  
Wave Guides

A simple, manufacturable technique for the generation of sub-half-micrometre gratings in GaAs is demonstrated. The technique uses a single layer of polymethylmethacrylate photoresist, electron-beam lithography, and BCl3–He reactive ion etching to achieve high-quality second-order gratings. Good light attenuation properties are demonstrated for planar and ridge wave guides.

scholarly journals Silicon Nanohole Arrays Fabricated by Electron Beam Lithography and Reactive Ion Etching

2019 ◽  
Vol 48 (6) ◽  
pp. 1157-1161
Author(s):  
Lita Rahmasari ◽  
Mohd Faizol Abdullah ◽  
Ahmad Rifqi Md Zain ◽  
Abdul Manaf Hashim
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Nanohole Arrays
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