scholarly journals Structural and optical properties of visible active photocatalytic WO3 thin films prepared by reactive dc magnetron sputtering

2012 ◽  
Vol 27 (24) ◽  
pp. 3130-3140 ◽  
Author(s):  
Malin B. Johansson ◽  
Gunnar A. Niklasson ◽  
Lars Österlund
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Structural And Optical Properties ◽  
Image Position ◽  
Wo3 Thin Films

Abstract

scholarly journals Structural and Optical Properties of Mg Doped ZnO Thin Films Deposited by DC Magnetron Sputtering

2016 ◽  
Vol 8 (4(2)) ◽  
pp. 04053-1-04053-4 ◽  
Author(s):  
A. Sh. Asvarov ◽  
◽  
S. Sh. Makhmudov ◽  
A. Kh. Abduev ◽  
A. K. Akhmedov ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Structural And Optical Properties ◽  
Doped Zno ◽  
Mg Doped

scholarly journals Influence of Ar Gas Pressure On The Structural And Optical Properties And Surface Topography of Al-Doped ZnO Thin Films Sputtered By DC-Magnetron Sputtering Method

2021 ◽  
Author(s):  
Mahdiyeh Shiravand ◽  
Nader Ghobadi ◽  
Ebrahim Gholami Hatam
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Visible Region ◽  
Gas Pressure ◽  
Optical Parameters ◽  
Dc Magnetron Sputtering ◽  
Structural And Optical Properties ◽  
Ar Gas ◽  
Physical Quantities

Abstract In this work, Aluminum doped Zinc oxide thin films were sputtered on glass substrate by the direct current (DC) magnetron sputtering method. The influence of Ar gas pressure on the structural and optical properties was measured. The optical parameters were calculated by UV- Visible spectroscopy, the nature of transition reveals direct allowed transition for the prepared films. Also, some physical quantities such as the strength of electron-phonon interaction, dissipation factor (tanδ) in the visible region and the lattice dielectric constant were presented for these thin films. The AFM analysis extracts surface parameters of the AZO thin films that help us to investigate the surface analysis with numerical data. The band gap energy and transition index without any presumption about transition natural were calculated from Derivation Ineffective Thickness Method (DITM) and the reaction of Ar gas pressure plays an essential part in controlling the physical quantities of AZO thin films.

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