Investigation of the crystal structure on the nanomechanical properties of pulsed laser deposited niobium nitride thin films

2012 ◽  
Vol 27 (13) ◽  
pp. 1725-1731 ◽  
Author(s):  
Md Abdullah Al Mamun ◽  
Ashraf Hassan Farha ◽  
Yüksel Ufuktepe ◽  
Hani E. Elsayed-Ali ◽  
Abdelmageed A. Elmustafa
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Pulsed Laser ◽  
Niobium Nitride ◽  
Nanomechanical Properties ◽  
Image Position

Abstract

Investigation of the Crystal Structure on the Nanomechanical Properties of Pulsed Laser Deposited NbN Thin Films

2012 ◽  
pp. 715-722
Author(s):  
M. A. Mamun ◽  
A. H. Farha ◽  
Y. Ufuktepe ◽  
H. E. Elsayed-Ali ◽  
A. A. Elmustafa
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Pulsed Laser ◽  
Nanomechanical Properties

Substrate dependent epitaxy of superconducting niobium nitride thin films grown by pulsed laser deposition

2021 ◽  
Vol 551 ◽  
pp. 149333
Author(s):  
T. Roch ◽  
M. Gregor ◽  
S. Volkov ◽  
M. Čaplovičová ◽  
L. Satrapinskyy ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Niobium Nitride ◽  
Laser Deposition

Studies of Nanomechanical Properties of Pulsed Laser Deposited NbN films on Si Using Nanoindentation

2012 ◽  
Vol 1424 ◽  
Author(s):  
M. A. Mamun ◽  
A. H. Farha ◽  
Y. Ufuktepe ◽  
H. E. Elsayed-Ali ◽  
A. A. Elmustafa
Keyword(s):  
Thin Films ◽  
Pulsed Laser ◽  
Niobium Nitride ◽  
X Ray Diffraction ◽  
Si Substrate ◽  
Force Microscopy ◽  
Atomic Force ◽  
Wide Range ◽  
Pile Up ◽  
Average Modulus

ABSTRACTNanomechanical and structural properties of pulsed laser deposited niobium nitride thin films were investigated using X-ray diffraction, atomic force microscopy, and nanoindentation. NbN film reveals cubic δ-NbN structure with the corresponding diffraction peaks from the (111), (200), and (220) planes. The NbN thin films depict highly granular structure, with a wide range of grain sizes that range from 15-40 nm with an average surface roughness of 6 nm. The average modulus of the film is 420±60 GPa, whereas for the substrate the average modulus is 180 GPa, which is considered higher than the average modulus for Si reported in the literature due to pile-up. The hardness of the film increases from an average of 12 GPa for deep indents (Si substrate) measured using XP CSM and load control (LC) modes to an average of 25 GPa measured using the DCM II head in CSM and LC modules. The average hardness of the Si substrate is 12 GPa.

Disorder-Induced Low-Frequency Raman Band Observed in Deposited MoS2 Films

1994 ◽  
Vol 48 (6) ◽  
pp. 733-736 ◽  
Author(s):  
N. T. McDevitt ◽  
J. S. Zabinski ◽  
M. S. Donley ◽  
J. E. Bultman
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Raman Band ◽  
Low Frequency ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
First Order ◽  
Order Spectrum ◽  
History Of ◽  
Frequency Feature

Crystalline disorder in thin films plays an important role in determining their properties. Disorder in the crystal structure of MoS2 films prepared by magnetron sputtering and pulsed laser deposition was evaluated with the use of Raman spectroscopy. The peak positions and bandwidths of the first-order Raman bands, in the region 100 to 500 cm−1, were used as a measure of crystalline order. In addition, a low-frequency feature was observed at 223 cm−1 that is not part of the normal first-order spectrum of a fully crystalline specimen. Data presented here demonstrate that this band is characteristic of crystalline disorder, and its intensity depends on the annealing history of the film. This behavior seems to be analogous to the disorder found in graphite thin films.

Ferromagnetic signature in vanadium doped ZnO thin films grown by pulsed laser deposition

2016 ◽  
Vol 31 (20) ◽  
pp. 3223-3229 ◽  
Author(s):  
S. Karamat ◽  
R.S. Rawat ◽  
P. Lee ◽  
T.L. Tan ◽  
C. Ke ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Doped Zno ◽  
Image Position

Abstract

Infrared Pulsed Laser Deposition of Niobium Nitride Thin Films

2011 ◽  
Vol 21 (3) ◽  
pp. 143-146 ◽  
Author(s):  
S. Chaudhuri ◽  
M. R. Nevala ◽  
T. Hakkarainen ◽  
T. Niemi ◽  
I. J. Maasilta
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Niobium Nitride ◽  
Laser Deposition

Pulsed laser deposition and thermoelectric properties of In- and Yb-doped CoSb3 skutterudite thin films

2011 ◽  
Vol 26 (15) ◽  
pp. 1836-1841 ◽  
Author(s):  
S.R. Sarath Kumar ◽  
A. Alyamani ◽  
J.W. Graff ◽  
T.M. Tritt ◽  
H.N. Alshareef
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Thermoelectric Properties ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Image Position

Abstract

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