Electrical properties of Pt/SrBi2Ta2O9/Bi4Ti3O12/p-Si heterostructure prepared by sol-gel processing

2006 ◽  
Vol 21 (7) ◽  
pp. 1782-1786 ◽  
Author(s):  
Hua Wang ◽  
Min-Fang Ren
Keyword(s):  
Current Density ◽  
Annealing Temperature ◽  
Sol Gel ◽  
Pyrochlore Phase ◽  
Hysteresis Loops ◽  
Memory Window ◽  
Low Temperature Processing ◽  
Sweep Voltage ◽  
Ferroelectric Hysteresis ◽  
Gel Processing

Low-temperature processing as low as 550–700 °C of Pt/SrBi2Ta2O9 (SBT)/Bi4Ti3O12 (BIT)/p-Si heterostructure has been performed by a sol-gel method. The effects of annealing temperature on current density, C-V characteristics, and memory windows of Pt/SBT/BIT/p-Si heterostructure were investigated. The SBT/BIT multilayer films were polycrystalline with no pyrochlore phase and no preferred orientation. The leakage current density was under 3 × 10−7 A/cm2 at 5 V with asymmetry hysteresis loops for Pt/SBT/BIT/p-Si heterostructure. Although all C-V curves showed clockwise ferroelectric hysteresis loops and the memory window reached a maximum of 0.78 V at a sweep voltage of 5 V, the memory window changed asymmetrically with the variation of annealing temperature and sweep voltage. The maximum memory window of Pt/SBT/BIT/p-Si heterostructure prepared at lower temperatures was narrower at lower sweep voltage. The asymmetric behavior of the C-V characteristics was discussed in terms of electron injection from Si and the ferroelectric polarization effect.

Synthesis and Ferroelectric Properties of Sol–Gel Derived Intergrowth-Superlattice-Structured SrBi4Ti4O15-Bi4Ti3O12 Thin Films

2011 ◽  
Vol 197-198 ◽  
pp. 1781-1784
Author(s):  
Hua Wang ◽  
Jian Li ◽  
Ji Wen Xu ◽  
Ling Yang ◽  
Shang Ju Zhou
Keyword(s):  
Thin Films ◽  
Remanent Polarization ◽  
Annealing Temperature ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Hysteresis Loops ◽  
Si Substrates ◽  
Gel Processing ◽  
Coercive Electric Field ◽  
Clockwise Hysteresis

Intergrowth-superlattice-structured SrBi4Ti4O15–Bi4Ti3O12(SBT–BIT) films prepared on p-Si substrates by sol-gel processing. Synthesized SBT–BIT films exhibit good ferroelectric properties. As the annealing temperature increases from 600°C to 700°C, the remanent polarization Prof SBT–BIT films increases, while the coercive electric field Ecdecreases. SBT–BIT films annealed at 700°C have a Prvalue of 18.9µC/cm2which is higher than that of SBT (16.8µC/cm2) and BIT (14.6µC/cm2), and have the lowest Ecof 142 kV/cm which is almost the same as that of SBT and BIT. The C-V curves of Ag/SBT-BIT/p-Si heterostructures show the clockwise hysteresis loops which reveal the memory effect due to the polarization. The memory window in C-V curve of Ag/SBT-BIT/p-Si is larger than that of Ag/SBT/p-Si heterostructure or Ag/BIT/p-Si heterostructure.

Effects of Annealing Temperature on Structure and Properties of PLBZT Ferroelectric Thin Films Synthesized by Sol-Gel Processing

2012 ◽  
Vol 602-604 ◽  
pp. 1461-1464
Author(s):  
Hua Wang ◽  
Li Liu ◽  
Ji Wen Xu ◽  
Ling Yang ◽  
Shang Ju Zhou
Keyword(s):  
Thin Films ◽  
Remanent Polarization ◽  
Annealing Temperature ◽  
Sol Gel ◽  
Pyrochlore Phase ◽  
Ferroelectric Thin Films ◽  
Structure And Properties ◽  
Maximum Value ◽  
Processing Effects ◽  
Gel Processing

[Pb0.95(La0.6Bi0.4)0.05][Zr0.53Ti0.47]O3 (PLBZT) ferroelectric thin films have been synthesized on ITO-coated glass by sol-gel processing. Effects of annealing temperature on structure and properties of PLBZT have been investigated. With the increase of annealing temperature from 500°C to 550°C, the remanent polarization Pr increase slightly to the maximum value of 25.4μC/cm2 due to the improvement in crystallization of PLBZT films. However, when the annealing temperature is more than 550°C, the pyrochlore phase appear and degrade the Pr of PLBZT thin films. The lowest leakage current density of 1.8×10-9 A/cm2 can be observed in PLBZT thin films when the annealing temperature is 550°C.

Influence of Bi3.15Nd0.85Ti3O12 Buffer Layer on Structure and Electrical Properties of Bi0.94Ce0.06Fe0.97Ti0.03O3 Thin Films

2014 ◽  
Vol 703 ◽  
pp. 51-55
Author(s):  
Jia Zeng ◽  
Ming Hua Tang ◽  
Zhen Hua Tang ◽  
Yong Guang Xiao ◽  
Long Peng ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Buffer Layer ◽  
Current Density ◽  
Coercive Field ◽  
Remnant Polarization ◽  
Sol Gel ◽  
Hysteresis Loops ◽  
Si Substrates ◽  
Sol Gel Process

Bi0.94Ce0.06Fe0.97Ti0.03O3 and Bi0.94Ce0.06Fe0.97Ti0.03O3/Bi3.15Nd0.85Ti3O12 double-layered thin films were fabricated via sol-gel process on Pt/Ti/SiO2/Si substrates. The influence of Bi3.15Nd0.85Ti3O12 buffer layer on microstructure and electrical properties of Bi0.94Ce0.06Fe0.97Ti0.03O3 thin films were investigated in detail. Well-saturated P-E hysteresis loops can be obtained in Bi0.94Ce0.06Fe0.97Ti0.03O3 films with Bi3.15Nd0.85Ti3O12 buffer. The remnant polarization (2Pr) of the double-layered thin films is 112 μC/cm2. The coercive field (2Ec) of double-layered films is 672 kV/cm, which is much lower than that of the Bi0.94Ce0.06Fe0.97Ti0.03O3 thin films. The leakage current density of Bi0.94Ce0.06Fe0.97Ti0.03O3/Bi3.15Nd0.85Ti3O12 double-layered thin films is 4.12×10-5 A/cm2.

scholarly journals Structural and Electrical Characteristics of Metal-Ferroelectric Pb1.1(Zr0.40Ti0.60)O3-Insulator (ZnO)-Silicon Capacitors for Nonvolatile Applications

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
S. R. Krishnamoorthi ◽  
K. S. Venkatesh ◽  
Rajangam Ilangovan
Keyword(s):  
Leakage Current ◽  
Leakage Current Density ◽  
Current Density ◽  
Sol Gel ◽  
Film Surface ◽  
Memory Window ◽  
Mis Structure ◽  
Insulator Layer ◽  
Window Width ◽  
Ferroelectric Layer

In this work metal-ferroelectric-insulator-semiconductor (MFIS) thin-film structures usingPb1.1Zr0.40Ti0.60O3(PZT) as the ferroelectric layer and zinc oxide (ZnO) as the insulator layer were fabricated on n-type (100) Si substrate.Pb1.1Zr0.40Ti0.60O3and ZnO thin films were prepared on Si by the sol-gel route and thermal deposition method, respectively. On the optimized PZT (140 nm) and ZnO (40 nm) films were examined by scanning electron microscope (SEM). From AFM data the root mean square (r.m.s.) roughness of the film surface is 13.11 nm. The leakage current density of ZnO/n-Si (MIS) structure was as low as 1.8 × 10−8A/cm2at 2.5 V. The capacitance versus voltage (C-V) characteristics of the annealed ZnO/Si (MIS) diode indicated the good interface properties and no hysteresis was observed. Au/PZT (140 nm)/ZnO (40 nm)/Si (100) leakage-current density was about 5.7 × 10−8 A/cm2at positive bias voltage of 3 V. The large memory window width in C-V (capacitance-voltage) curve of Au/PZT/ZnO/Si capacitor was about 2.9 V under ±12 V which thus possibly enables nonvolatile applications. The memory window as a function of temperature was also discussed.

The Electrical Properties of Epitaxial Grown Sc-Doped (Na0.85K0.15)0.5Bi0.5TiO3 Thin Film Prepared by Sol-Gel Method

2016 ◽  
Vol 697 ◽  
pp. 235-238
Author(s):  
Yun Yi Wu ◽  
Xiao Hui Wang ◽  
Cai Fu Zhong ◽  
Long Tu Li
Keyword(s):  
Thin Film ◽  
Sol Gel ◽  
Hysteresis Loops ◽  
Single Crystal Substrate ◽  
Gel Method ◽  
Sol Gel Method ◽  
Transmission Electron ◽  
Crystal Substrate ◽  
Lcr Meter ◽  
Ferroelectric Hysteresis

Sc-doped (Na0.85K0.15)0.5Bi0.5TiO3 (NKBT-Sc) thin film was deposited on electrical conductive Nb-doped SrTiO3 [100] (Nb:STO) single crystal substrate via an aqueous sol–gel method. Structure analysis by x-ray diffraction and high resolution transmission electron microscopy proves the epitaxial growth relationship between the NKBT-Sc thin film and Nb:STO substrate. Well saturated ferroelectric hysteresis loops with remnant polarization of 26.14 μC/cm2 and typical butterfly shape displacement–voltage loop with effective piezoelectric coefficient d33* of 92 pm/V were observed, which were much higher than the NKBT-Sc thin film deposited on platinized silicon substrate. The precision LCR Meter exhibits a butterfly shape of dielectric constant and electric field curve, which is typical nature for the ferroelectric characteristics of the [001]-epitaxial NKBT-Sc thin film.

Effect of Film Thickness on Structure and Property of Pb(Zr0.53Ti0.47)O3 Thin Film

2010 ◽  
Vol 150-151 ◽  
pp. 112-117 ◽  
Author(s):  
Min Xian Shi ◽  
Wei Mao ◽  
Yan Qin ◽  
Zhi Xiong Huang ◽  
Dong Yun Guo
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Film Thickness ◽  
Sol Gel ◽  
Hysteresis Loops ◽  
Xrd Analysis ◽  
Structure And Property ◽  
Si Substrates ◽  
Sol Gel Process ◽  
Ferroelectric Hysteresis

Pb(Zr0.53Ti0.47)O3 thin films with thickness of 120nm, 190nm, 310nm, 440nm and 630nm were deposited on Pt/Ti/SiO2/Si substrates by sol-gel process through repeating spining process 2 times, 4 times, 6 times, 8 times and 10 times respectively. The structures of PZT films were investigated by SEM and XRD analysis. The ferroelectric hysteresis loops were recorded by Radiant Precision Workstation and dielectric properties were measured using an Agilent HP4294A impedance analyzer. X-ray diffraction indicated that with the film thickness increasing, the diffraction intensity increased. The thickness of PZT film had great effect on ferroelectric and dielectric properties. Conclusively when the film thickness was about 310nm, the PZT thin films possessed better ferroelectric and dielectric properties.

EFFECT OF PRE-HEATING TEMPERATURE ON THE CHARACTERISTICS OF PZT THIN FILMS GROWN BY USING A TRIOL SOL–GEL ROUTE

2007 ◽  
Vol 14 (02) ◽  
pp. 229-234
Author(s):  
SARAWUT THOUNTOM ◽  
MANOCH NAKSATA ◽  
KENNETH MACKENZIE ◽  
TAWEE TUNKASIRI
Keyword(s):  
Thin Films ◽  
Lead Zirconate Titanate ◽  
Heating Temperature ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Hysteresis Loops ◽  
Lead Zirconate ◽  
Pzt Thin Films ◽  
Pzt Films ◽  
Ferroelectric Hysteresis

Lead zirconate titanate (PZT) films with compositions near the morphotropic phase boundary were fabricated on Pt (111)/ Ti / SiO 2/ Si (100) using the triol sol–gel method. The effect of the pre-heating temperature on the phase transformations, microstructures, electrical properties, and ferroelectric properties of the PZT thin films was investigated. Randomly oriented PZT thin films pre-heated at 400°C for 10 min and annealed at 600°C for 30 min showed well-defined ferroelectric hysteresis loops with a remnant polarization of 26.57 μC/cm2 and a coercive field of 115.42 kV/cm. The dielectric constant and dielectric loss of the PZT films were 621 and 0.0395, respectively. The microstructures of the thin films are dense, crack-free, and homogeneous with fine grains about 15–20 nm in size.

Composition and Electrode Effects on the Electrical Properties of SrBi2Ta2O9

1997 ◽  
Vol 493 ◽  
Author(s):  
Darin T. Thomas ◽  
Norifumi Fujimura ◽  
S. K. Streiffer ◽  
Angus I. Kingon
Keyword(s):  
Remnant Polarization ◽  
Pyrochlore Phase ◽  
Hysteresis Loops ◽  
Layered Perovskite ◽  
Low Temperature Processing ◽  
Non Volatile Memory ◽  
Oxygen Gas ◽  
Memory Applications ◽  
Deposited Films ◽  
Deposition Conditions

AbstractSrBi2Ta2O9 has attracted great interest for non-volatile memory applications due to its minimal polarization fatigue. This paper describes systematic studies, using pulsed laser deposition, on the effect of deposition conditions on the Bi-Pt reaction and on the potential for low temperature processing. Changing the deposition temperature (Ts) and oxygen gas pressure during deposition can control the Bi content in the films. At a Ts of 600°C, the films have excess Bi and do not fully crystallize to SBT, resulting in poor remnant polarization (Pr). These films consist mostly of the pyrochlore phase, plus a small amount of disordered, c-oriented layered perovskite SBT. By annealing over 750°C, the films show improved Pr, but further Pt - Bi interactions occur. At a Ts of 700°C, the as-deposited films are fully crystallized and show saturated hysteresis loops. However, Bi deficiency through alloying results in reduced remnant polarization (2Pr = 7.0μC/cm2). Films on Ir/Pt show reduced electrode reactions and improved properties.

Co-Ferrite (CoFe2O4): A Material with High Magnetostriction Produced by Sol-Gel Method

2011 ◽  
Vol 326 ◽  
pp. 157-164
Author(s):  
Nasir Mehmood ◽  
Roland Grössinger ◽  
Rieko Sato Turtelli ◽  
Muhammad Aamir Raza ◽  
Sohail Afzal Khan ◽  
...  
Keyword(s):  
Saturation Magnetization ◽  
Single Phase ◽  
Annealing Temperature ◽  
Sol Gel ◽  
Hysteresis Loops ◽  
Xrd Pattern ◽  
Gel Method ◽  
Heat Treated ◽  
Different Temperatures ◽  
Phase Spinel

Polycrystalline Co-ferrite was produced by modified citrate gel method. Samples were afterward heat treated at different temperatures upto 1300°C. The XRD pattern shows that all samples exhibit a single phase spinel structure and improvement and sharpness in intensity of peaks with increasing annealing temperature. Measurement of hysteresis loops demonstrate that after the heat treatment a saturation magnetization of 60- 84 emu/gis obtained. Measurements of the longitudinal magnetostriction gave values between 20 ppm and 130 ppm. Magnetostriction increases gradually with increase in annealing temperature and becomes highest when the saturation magnetization values are larger.

Epitaxial Growth of (110) KnbO3 Films on (100) MgO Substrates via Sol-Gel Processing

1994 ◽  
Vol 341 ◽  
Author(s):  
Garo J. Derderian ◽  
James D. Barrie ◽  
Kenneth A. Aitchison ◽  
Martha L. Mecartney
Keyword(s):  
Surface Layer ◽  
Epitaxial Growth ◽  
Interfacial Layer ◽  
Single Phase ◽  
Annealing Temperature ◽  
Sol Gel ◽  
Sol Gel Process ◽  
Defective Surface ◽  
Gel Processing

AbstractEpitaxial, single phase (110) KnbO3 films were grown on (100) MgO substrates using a sol-gel process employing ethoxide precursors in methanol. The degree of epitaxy was dependent on both the annealing temperature and the amount of potassium in the film. Excess potassium in the sol-gel solution (K/Nb = 1.2) was necessary to produce single phase films. An amorphous or polycrystalline MgO interfacial layer was observed in some films, postulated to have developed after nucleation of KnbO3 and due to a highly defective surface layer.

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