Chemical deterioration of Al film prepared on CF4 plasma-etched LiNbO3 surface
2000 ◽
Vol 15
(2)
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pp. 476-482
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Keyword(s):
X Ray
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The fabrication process of an Al thin-film optical polarizer on LiNbO3 waveguides after CF4 plasma dry etching of a previously deposited SiO2 buffer layer was investigated. The problem in this process is a precipitation of compounds containing C, O, F, and Li on the etched LiNbO3 surface and a chemical deterioration of the Al caused by a reaction with these precipitates. Most notably, the growth of amorphous phase in addition to the crystalline Al metal grains and a partial oxidization of Al were found at the interface using transmission electron microscopy and x-ray photoelectron spectroscopy.
2016 ◽
Vol 120
(34)
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pp. 19204-19211
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2019 ◽
Vol 10
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pp. 62-70
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2019 ◽
Vol 79
(7)
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pp. 1276-1286
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1991 ◽
Vol 19
(4)
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pp. 473-485
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2012 ◽
Vol 137
(2)
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pp. 493-498
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