Conformality of PVD shell layers on GLAD-nanorods investigated by Monte Carlo simulations

MRS Advances ◽  
2020 ◽  
Vol 5 (43) ◽  
pp. 2241-2248
Author(s):  
Mesut Yurukcu ◽  
Fatma M. Yurtsever ◽  
Serkan Demirel ◽  
Tansel Karabacak
Keyword(s):  
High Pressure ◽  
Monte Carlo ◽  
Physical Vapor Deposition ◽  
Normal Incidence ◽  
Sputter Deposition ◽  
Glancing Angle ◽  
Device Applications ◽  
Coating Formation ◽  
Normal Angle

AbstractThe quality of the shell coating around nanorods is critical in device applications. Conventional physical vapor deposition (PVD) techniques can be utilized for highly conformal shell coating formation in core-shell structure devices. To identify scalable fabrication techniques for conformal shell coatings, Monte Carlo (MC) simulations of PVD growth were performed under different atomic flux distributions and angles on arrays of glancing angle deposition (GLAD) nanorods, which were also generated by MC simulations. We investigated the conformality of PVD films (shell) around GLAD rod arrays (core) and analyzed the thickness uniformity of the shell layer across the sidewalls of rods. Our results show that Angular Flux-Normal Angle (A-NAD), which might correspond to high-pressure sputter deposition at normal incidence (HIPS at θ = 0o) can generate better conformal shell coating compared to others. In Uniform Flux-Normal Angle technique (U-NAD), which corresponds to a thermal evaporation deposition, the growth suffers from poor sidewall coverage. In addition, introducing a small angle to the flux also improves the shell conformality. Therefore, high-pressure sputter deposition technique is expected to provide superior conformality for a catalyst or semiconductor coating around base nanorods, for example for fuel cell and solar cell applications, with the help of obliquely incident atoms of the HIPS flux.

Conformality of PVD shell layers on vertical arrays of rods with different aspect ratios investigated by Monte Carlo simulations

MRS Advances ◽  
2017 ◽  
Vol 2 (8) ◽  
pp. 465-470 ◽  
Author(s):  
M. Yurukcu ◽  
H. Cansizoglu ◽  
M. F. Cansizoglu ◽  
T. Karabacak
Keyword(s):  
High Pressure ◽  
Monte Carlo ◽  
Flux Distribution ◽  
Thermal Evaporation ◽  
Sputter Deposition ◽  
Core Shell ◽  
Nanorod Arrays ◽  
Aspect Ratios ◽  
Normal Angle ◽  
Angle Deposition

AbstractApplications such as batteries, fuel cells, solar cells, and sensors, can benefit from high surface-to-volume ratio core/shell arrays of nanorods. The fabrication of the conformal shell layers on nanorod arrays has been a formidable task. In order to assess the deposition conditions for the production of conformal shell coatings by physical vapor deposition (PVD) techniques, we employed Monte Carlo (MC) simulations that involved shell depositions under different flux distributions and angles on arrays of rods. We investigated the conformality of PVD shell layers on nanorod arrays of different aspect ratios, which is defined to be the ratio of rod height to the gaps between nearest-neighbor rods. MC simulated core/shell structures were analyzed for the thickness uniformity of the shell layer across the sidewalls of rods. Our results show that a small angle deposition approach involving a uniform oblique flux (U-SAD) with a small incidence angle ≤ 30o can generate a fairly conformal shell coating around small aspect-ratio rods. However, normal angle deposition with an angular flux distribution (A-NAD) achieves superior conformality both on small and high-aspect-ratio structures compared to U-SAD, conventional uniform normal angle deposition (U-NAD), and SAD with an angular flux distribution (A-SAD). A-NAD can be realized in a PVD system such as by high pressure sputter deposition; while U-SAD can be achieved in thermal evaporation system with a small angle incident flux. In addition, U-NAD and A-SAD can correspond to film growth by normal incidence thermal evaporation and SAD-high pressure sputter deposition, respectively.

Conformal core-shell nanostructured photodetectors with enhanced photoresponsivity by high pressure sputter deposition

MRS Advances ◽  
2016 ◽  
Vol 1 (28) ◽  
pp. 2045-2050 ◽  
Author(s):  
Filiz Keles ◽  
Hilal Cansizoglu ◽  
Matthew Brozak ◽  
Emad Badraddin ◽  
Tansel Karabacak
Keyword(s):  
Thin Film ◽  
High Pressure ◽  
Shell Structure ◽  
Physical Vapor Deposition ◽  
Rf Sputtering ◽  
Low Pressure ◽  
Morphological Characterization ◽  
Sputter Deposition ◽  
Core Shell ◽  
Core Shell Structure

ABSTRACTWorking gas pressure during sputter deposition can significantly affect the conformality of a thin film when it is grown on a nanostructured surface. In this study, we fabricated core-shell nanostructured photodetectors, where n-type In2S3 nanorod arrays (core) were coated with p-type CuInS2 (CIS) films (shell) at relatively low and high Ar gas pressures. In2S3 nanorods were prepared by glancing angle deposition (GLAD) technique using a thermal evaporator unit. CIS films were deposited by RF sputtering at Ar pressures of 2.7x10-2 mbar (high pressure sputtering, HIPS) and 7.3x10-3 mbar (low pressure sputtering, LPS). The morphological characterization was carried out by means of SEM. The photocurrent measurement was conducted under 1.5 AM Sun under no bias. Nanostructured photodetectors of HIPS-CIS/GLAD-In2S3 (i.e. HIPS-GLAD) were shown to demonstrate enhanced photoresponse with a photocurrent value of 98 μA, which is about ∼230% higher than that of LPS-GLAD devices. The enhancement originates from the improved core-shell structure achieved by more conformal coating of the CIS shell. In addition, the results were compared to their counterpart thin-film devices incorporating an In2S3 film coated either with HIPS or LPS CIS layer. Nanorod devices with high and low pressure CIS films showed photocurrent values ∼20 times and ∼ 19 times higher compared to those of high and low pressure film devices, respectively. This finding can be explained by the higher light absorption property of nanorods, and the reduced inter-electrode distance as a result of core-shell structure, which allows the effective capture of the photo-generated carriers. Therefore, the results of this work can pave way to the development of high photoresponse core-shell semiconductor devices fabricated by physical vapor deposition techniques.

UGR CALCULATION BASED ON THE LUMINANCE SPATIAL-ANGULAR DISTRIBUTION

2020 ◽  
Vol 2020 (4) ◽  
pp. 25-32
Author(s):  
Viktor Zheltov ◽  
Viktor Chembaev
Keyword(s):  
Monte Carlo ◽  
Angular Distribution ◽  
Monte Carlo Method ◽  
Visual Task ◽  
New Method ◽  
Lighting System ◽  
Preliminary Assessment ◽  
System A ◽  
The Monte Carlo Method

The article has considered the calculation of the unified glare rating (UGR) based on the luminance spatial-angular distribution (LSAD). The method of local estimations of the Monte Carlo method is proposed as a method for modeling LSAD. On the basis of LSAD, it becomes possible to evaluate the quality of lighting by many criteria, including the generally accepted UGR. UGR allows preliminary assessment of the level of comfort for performing a visual task in a lighting system. A new method of "pixel-by-pixel" calculation of UGR based on LSAD is proposed.

Improving of quality of gate assembly contact surfaces of high-pressure fi ttings by diamond burnishing

2020 ◽  
pp. 99-104
Author(s):  
S.A. Zaydes ◽  
A.N. Mashukov ◽  
T.Ya. Druzhinina
Keyword(s):  
Surface Roughness ◽  
High Pressure ◽  
Main Part ◽  
Conical Surface ◽  
The Real ◽  
Metal Seal ◽  
Diamond Burnishing ◽  
Air Tightness ◽  
Contact Surfaces

The contact belt of the gate assembly is the main part of high pressure fittings. The serviceability of the fittings assembly as whole depends on the air-tightness and quality of the mating surfaces. The technology of diamond burnishing allows to increase the interface of the nodes by red ucing the surface roughness of the metal-to-metal seal. The real experience for improving of the fittings contact belt due to the use of diamond burnishing of the nozzles seats and the conical surface of the rods.

An experimental and theoretical study of the abrasion performance of digital light processing parts

2020 ◽  
pp. 095440542098133
Author(s):  
Mehdi Kazemi ◽  
Abdolreza Rahimi
Keyword(s):  
Layer Thickness ◽  
Normal Load ◽  
Digital Light Processing ◽  
One Step ◽  
Pin On Disk ◽  
The Relationship ◽  
Influential Parameters ◽  
Disk Method ◽  
Normal Angle

Generally, interactions at surface asperities are the cause of wear. Two-Thirds of wear in industry occurs because of the abrasive or adhesive mechanisms. This research presents an analytical model for abrasion of additive manufactured Digital Light Processing products using pin-on-disk method. Particularly, the relationship between abrasion volume, normal load, and surface asperities’ angle is investigated. To verify the proposed mathematical model, the results of this model are verified with the practical experiments. Results show that the most influential parameters on abrasion rate are normal load and surface’s normal angle. Abrasion value increases linearly with increasing normal load. The maximum abrasion value occurs when the surface’s normal angle during fabrication is 45°. After the asperities are worn the abrasion volume is the same for all specimens with different surface’s normal angle. Though layer thickness does not directly affect the wear rate, but surface roughness tests show that layer thickness has a great impact on the quality of the abraded surface. When the thickness of the layers is high, the abraded surface has deeper valleys, and thus has a more negative skewness. This paper presents an original approach in abrasion behavior improvement of DLP parts which no research has been done on it so far; thus, bringing the AM one step closer to maturity.

scholarly journals Evaluation of Changes in Protein Quality of High-Pressure Treated Aqueous Aquafaba

Molecules ◽  
2021 ◽  
Vol 26 (1) ◽  
pp. 234
Author(s):  
Fatemah B. Alsalman ◽  
Hosahalli S. Ramaswamy
Keyword(s):  
High Pressure ◽  
Protein Quality ◽  
Treatment Time ◽  
Control Sample ◽  
Thermal Characteristics ◽  
Protein Digestibility ◽  
Foaming Properties ◽  
Freeze Dried ◽  
Cooking Water

Chickpea cooking water (CCW), known as aquafaba, has potential as a replacement for egg whites due to its emulsion and foaming properties which come from the proteins and starch that leach out from chickpeas into the cooking water. High pressure (HP) processing has the ability to modify the functional characteristics of proteins. It is hypothesized that HP processing could favorably affect the functional properties of CCW proteins by influencing their structure. The objective of this study to evaluate the effect of HP treatment on the associated secondary structure, emulsion properties and thermal characteristics of CCW proteins. A central composite rotatable design is used with pressure level (227–573 MPa) and treatment time (6–24 min) as HP variables, and concentration of freeze dried CCW aquafaba powder (11–29%) as product variable, and compared to untreated CCW powder. HP improves aquafaba emulsion properties compared to control sample. HP reduces protein aggregates by 33.3%, while β-sheets decreases by 4.2–87.6% in which both correlated to increasing protein digestibility. α-helices drops by 50%. It affects the intensity of some HP treated samples, but not the trend of bands in most of them. HP treatment decreases Td and enthalpy because of increasing the degree of denaturation.

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