High Aspect Ratio Machining of Nanocarbon Materials by Reactive Ion Etching

MRS Advances ◽  
2017 ◽  
Vol 2 (1) ◽  
pp. 9-14
Author(s):  
Atsuko Sekiguchi ◽  
Don N. Futaba ◽  
Takeo Yamada ◽  
Kenji Hata
Keyword(s):  
Carbon Nanotube ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Reactive Ion Etching ◽  
Thick Layer ◽  
Lateral Resolution ◽  
Ion Etching ◽  
Deep Etching ◽  
Nanocarbon Materials ◽  
Micrometer Scale

AbstractWe demonstrate anisotropic, vertical deep etching of graphite and densely packed carbon nanotube (CNT) thick layer beyond the micrometer scale, which representing the first step toward nanocarbon bulk micromachining. This micromachining process is compatible with standard lithography and therefore allows the fabrication of graphite and CNT architectures with 1 μm lateral resolution and up to 10 μm scale depth.

Deep reactive ion etching of sub-micrometer trenches with ultra high aspect ratio

2014 ◽  
Vol 113 ◽  
pp. 35-39 ◽  
Author(s):  
Jayalakshmi Parasuraman ◽  
Anand Summanwar ◽  
Frédéric Marty ◽  
Philippe Basset ◽  
Dan E. Angelescu ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

Sharp High-Aspect-Ratio AFM Tips Fabricated by a Combination of Deep Reactive Ion Etching and Focused Ion Beam Techniques

2010 ◽  
Vol 10 (1) ◽  
pp. 497-501 ◽  
Author(s):  
David Caballero ◽  
Guillermo Villanueva ◽  
Jose Antonio Plaza ◽  
Christopher A. Mills ◽  
Josep Samitier ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Afm Tips
Sign in / Sign up

Export Citation Format

Share Document