Fundamentals of Surface Chemistry and Surface Physics

2009 ◽  
pp. 3-3-21 ◽  
Author(s):  
Alan S. Michaels
Keyword(s):  
Surface Chemistry ◽  
Surface Physics

Decoration technique and surface physics

1978 ◽  
Vol 36 (1) ◽  
pp. 436-437 ◽  
Author(s):  
H. Bethge
Keyword(s):  
Diffusion Path ◽  
Special Importance ◽  
Surface Physics ◽  
Step Structure ◽  
Initial Stage ◽  
Special Cases ◽  
Atomic Surface ◽  
The Mean ◽  
Bulk Structure ◽  
Decoration Technique

Besides the atomic surface structure, diverging in special cases with respect to the bulk structure, the real structure of a surface Is determined by the step structure. Using the decoration technique /1/ it is possible to image step structures having step heights down to a single lattice plane distance electron-microscopically. For a number of problems the knowledge of the monatomic step structures is important, because numerous problems of surface physics are directly connected with processes taking place at these steps, e.g. crystal growth or evaporation, sorption and nucleatlon as initial stage of overgrowth of thin films.To demonstrate the decoration technique by means of evaporation of heavy metals Fig. 1 from our former investigations shows the monatomic step structure of an evaporated NaCI crystal. of special Importance Is the detection of the movement of steps during the growth or evaporation of a crystal. From the velocity of a step fundamental quantities for the molecular processes can be determined, e.g. the mean free diffusion path of molecules.

Surface physics of thermotropic liquid crystals

1987 ◽  
Vol 152 (7) ◽  
pp. 449 ◽  
Author(s):  
L.M. Blinov ◽  
E.I. Kats ◽  
A.A. Sonin
Keyword(s):  
Liquid Crystals ◽  
Surface Physics ◽  
Thermotropic Liquid Crystals

Photoluminescence behavior of silicon nanocrystals: Role of surface chemistry and size

2008 ◽  
Author(s):  
Anoop Gupta ◽  
Folarin Erogbogbo ◽  
Mark T. Swihart ◽  
Hartmut Wiggers
Keyword(s):  
Surface Chemistry ◽  
Silicon Nanocrystals ◽  
Photoluminescence Behavior

Improved Autoadhesion Measurement Method for Micromachined Polysilicon Beams

1996 ◽  
Vol 444 ◽  
Author(s):  
Maarten P. de Boer ◽  
Terry A. Michalske
Keyword(s):  
Surface Chemistry ◽  
Optical Microscopy ◽  
Measurement Method ◽  
Current Practice ◽  
Cantilever Beams ◽  
Beam Length ◽  
Substrate Adhesion

AbstractWe have measured autoadhesion (e.g. stiction) of individual polysilicon beams by interferometric optical microscopy. Untreated cantilever beams were dried from water in air, while treated beams were coated with a hydrophobic molecular coating of octadecyltrichlorosilane (ODTS). Adhesion values obtained for beams adhered to the substrate over a long length (large d) are independent of beam length with values of 16.7 and 4.4 mJ/m2 for untreated and treated samples respectively. These values can be understood in terms of differences in surface chemistry and polysilicon roughness. Using the shortest length beam which remains attached to the substrate, adhesion values were 280 and 16 mJ/m2 respectively. These higher values may be a result of capillarity effects. We recommend that measurements be made on beams in which d is large, in contrast to the current practice of noting the shortest beam adhered.

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