Reaction Mechanisms and Rate Limitations in Dry Etching of Silicon Dioxide with Anhydrous Hydrogen Fluoride
2008 ◽
pp. 182-182-20
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Keyword(s):
1995 ◽
Vol 34
(Part 1, No. 12B)
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pp. 6882-6885
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1998 ◽
Vol 32
(10)
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pp. 557-559
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