Reaction Mechanisms and Rate Limitations in Dry Etching of Silicon Dioxide with Anhydrous Hydrogen Fluoride

Author(s):  
LD Clements ◽  
JE Busse ◽  
J Mehta
1998 ◽  
Vol 32 (10) ◽  
pp. 557-559 ◽  
Author(s):  
Yu. D. Markovich ◽  
A. V. Panfilov ◽  
A. A. Zhirov ◽  
A. T. Kirsanov ◽  
L. A. Gorbach ◽  
...  

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