High-Hardness, High-Density Powder Metal Bearing Applications

2009 ◽  
pp. 106-106-15 ◽  
Author(s):  
AJ Chidester ◽  
WB Green ◽  
K Corbo
Alloy Digest ◽  
1962 ◽  
Vol 11 (12) ◽  

Abstract Kennertium W-10 is a high density alloy recommended for radioactive shielding, balancing and damping applications. This datasheet provides information on composition, physical properties, hardness, elasticity, tensile properties, and compressive and shear strength as well as fracture toughness and creep. It also includes information on forming, heat treating, machining, joining, and powder metal forms. Filing Code: W-4. Producer or source: Kennametal Inc..


Alloy Digest ◽  
2006 ◽  
Vol 55 (3) ◽  

Abstract DuraTech 30 is a superhigh-speed steel evolved from the ASTM M3-2 composition, but with added cobalt. The exotic composition offers improved toughness and very high hardness. This datasheet provides information on composition, physical properties, hardness, and elasticity. It also includes information on high temperature performance and wear resistance as well as heat treating, machining, and powder metal forms. Filing Code: TS-629. Producer or source: Timken Latrobe Steel.


Alloy Digest ◽  
2018 ◽  
Vol 67 (1) ◽  

Abstract Ancorsteel FLD-49HP is a nickel copper-molybdenum alloy steel powder developed for high-performance sinter-hardening applications. This alloy conforms to MPIF Material standard 35, designation FLDN4C2-4905. The nickel and copper are diffusion-alloyed to the molybdenum pre-alloyed powder during processing to maintain good compressibility while enabling high hardness and toughness in sinter-hardened parts. This datasheet provides information on composition, physical properties, and tensile properties as well as fracture toughness. It also includes information on powder metal forms. Filing Code: SA-809. Producer or source: Hoeganaes Corporation.


2014 ◽  
Vol 3 (5) ◽  
pp. 269-275 ◽  
Author(s):  
Satoru MIZUNO ◽  
Omar BIN HAMIDUN ◽  
Tamio IDA ◽  
Manabu FUCHIHATA ◽  
Takayuki FUMOTO ◽  
...  

2012 ◽  
Vol 91 (1) ◽  
pp. 41-47 ◽  
Author(s):  
Satoru MIZUNO ◽  
Tamio IDA ◽  
Manabu FUCHIHATA ◽  
Kunihiko NAMBA ◽  
Atsushi KAKOSAKA ◽  
...  
Keyword(s):  

Author(s):  
S. McKernan ◽  
C. B. Carter ◽  
D. Bour ◽  
J. R. Shealy

The growth of ternary III-V semiconductors by organo-metallic vapor phase epitaxy (OMVPE) is widely practiced. It has been generally assumed that the resulting structure is the same as that of the corresponding binary semiconductors, but with the two different cation or anion species randomly distributed on their appropriate sublattice sites. Recently several different ternary semiconductors including AlxGa1-xAs, Gaxln-1-xAs and Gaxln1-xP1-6 have been observed in ordered states. A common feature of these ordered compounds is that they contain a relatively high density of defects. This is evident in electron diffraction patterns from these materials where streaks, which are typically parallel to the growth direction, are associated with the extra reflections arising from the ordering. However, where the (Ga,ln)P epilayer is reasonably well ordered the streaking is extremely faint, and the intensity of the ordered spot at 1/2(111) is much greater than that at 1/2(111). In these cases it is possible to image relatively clearly many of the defects found in the ordered structure.


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