ICP Source Optical Emission Spectroscopy Analysis of Radioactive Materials: A View of the United Kingdom Scene

2008 ◽  
pp. 5-5-10
Author(s):  
JW McMillan
Keyword(s):  
United Kingdom ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Spectroscopy Analysis ◽  
Radioactive Materials ◽  
The United Kingdom

Improved inductively coupled plasma optical emission spectroscopy analysis of trace elements in complex matrices by chemometric resolution

2015 ◽  
Vol 30 (4) ◽  
pp. 936-940 ◽  
Author(s):  
Pao Li ◽  
Wensheng Cai ◽  
Xueguang Shao
Keyword(s):  
Trace Elements ◽  
Quantitative Analysis ◽  
Inductively Coupled Plasma ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Icp Oes ◽  
Spectroscopy Analysis ◽  
Inductively Coupled ◽  
Plasma Optical Emission Spectroscopy

With the help of standard signals, the signals of trace elements in overlapping ICP OES signals can be obtained by a non-negative immune algorithm and used for quantitative analysis.

Study on coating growth characteristics during the electrolytic oxidation of a magnesium–lithium alloy by optical emission spectroscopy analysis

RSC Advances ◽  
2015 ◽  
Vol 5 (84) ◽  
pp. 68806-68814 ◽  
Author(s):  
Zhongping Yao ◽  
Qixing Xia ◽  
Han Wei ◽  
Dongqi Li ◽  
Qiu Sun ◽  
...  
Keyword(s):  
Emission Spectroscopy ◽  
Plasma Electrolytic Oxidation ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Growth Characteristics ◽  
Spectroscopy Analysis ◽  
Electrolytic Oxidation ◽  
Composition Structure ◽  
Plasma Electrolytic ◽  
Peo Coatings

The aim of this study is to analyze the composition, structure and growth characteristics of plasma electrolytic oxidation (PEO) coatings through optical emission spectroscopy (OES).

scholarly journals Methods Employed in Optical Emission Spectroscopy Analysis: a Review

2015 ◽  
Vol 11 (21) ◽  
pp. 239-267 ◽  
Author(s):  
D M Devia ◽  
L V Rodriguez-Restrepo ◽  
E Restrepo-Parra
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Emission Spectra ◽  
Optical Emission ◽  
Spectroscopy Analysis ◽  
Electronic Temperature ◽  
Arc Discharges ◽  
Plasma Techniques ◽  
Fundamental Physical ◽  
Physical Principles

In this work, different methods employed for the analysis of emission spectra are presented. The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films. Some of these tecnniques include magnetron sputtering and arc discharges. Initially, some fundamental physical principles that support the Optical Emission Spec-troscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed. Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are described.

A Better Understanding of the Very Low-Pressure Plasma Polymerization of Aniline by Optical Emission Spectroscopy Analysis

2018 ◽  
Vol 38 (4) ◽  
pp. 887-902 ◽  
Author(s):  
Abdoul Aziz Ndiaye ◽  
Ana Lacoste ◽  
Alexandre Bès ◽  
Andrii Zaitsev ◽  
Fabienne Poncin-Epaillard ◽  
...  
Keyword(s):  
Emission Spectroscopy ◽  
Plasma Polymerization ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Pressure ◽  
Spectroscopy Analysis ◽  
Pressure Plasma ◽  
Low Pressure Plasma

OPTICAL EMISSION SPECTROSCOPY ANALYSIS OF ATMOSPHERIC PLASMA JET PLUME ON BACTERIA INACTIVATION

2015 ◽  
Vol 77 (6) ◽  
Author(s):  
Nor Aimi Saad ◽  
SK Zaaba ◽  
M.T. Mustaffa ◽  
A. Zakaria ◽  
Roslan Md Nor ◽  
...  
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Plasma Plume ◽  
Optical Emission ◽  
Plasma Jet ◽  
Reactive Species ◽  
Microbial Inactivation ◽  
Atmospheric Plasma ◽  
Spectroscopy Analysis ◽  
Bacteria Inactivation

In this paper, an atmospheric plasma jet plasma plume generated using Helium gas was investigated for reactive plasma species. The method of investigation is by using Optical Emission Spectroscopy analysis. Observation of the emission spectrum enables understanding of the influence of reactive species inside plasma plume to microbial inactivation process. The reactive species in plasma plume were detected using spectrometer without presence of bacteria. Escherichia coli and Methicillin-resistant staphylococcus aureus were used as inactivation targets. Bacteria were cultured in 10 Colony Forming Unit per milliliter in single colony and exposed to plasma at different time. It is found that, both bacteria were inactivated at 180 seconds.  The result of emission line spectrum showed the presence of nitrogen and oxygen between line 300 nm until 700 nm. Nitrogen and oxygen are involved in oxidation process which is known as Reactive Nitrogen Species and Reactive Oxygen Species. These species are main key in bacteria inactivation.

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