Test Method for Pass Through Flux of Circular Magnetic Sputtering Targets, Method 2

Pass through flux (PTF) is an essential parameter for the magnetron sputtering process of ferromagnetic materials. In the present investigation the influence of deformation, recrystallized microstructure and thickness on PTF of Ni was examined by the analysis of microstructure and hardness of high purity Ni. The experimental results showed that PTF of rolled Ni increased significantly comparing to the annealing microstructure that is related to the dislocation and stress of microstructure. With the recrystallization and grain growth of deformed samples, PTF decreased to be about 30%. PTF was also associated with the thickness of material. It increased by 6% when the thickness of 0.5mm decreased. This research is useful to guide and improve the design, development and preparation of magnetic sputtering materials.

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Instrumentation for detecting channelling radiation in the high-voltage electron microscope

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100075385 ◽

1983 ◽

Vol 41 ◽

pp. 318-319

Author(s):

J. H. Butler ◽

C. J. Humphreys

Keyword(s):

Monochromatic Light ◽

Incident Beam ◽

Laboratory Frame ◽

Relativistic Electrons ◽

Voltage Electron ◽

Dipole Emission ◽

Sinusoidal Oscillations ◽

Pass Through ◽

Incident Beam Energy ◽

Increasing Function

Electromagnetic radiation is emitted when fast (relativistic) electrons pass through crystal targets which are oriented in a preferential (channelling) direction with respect to the incident beam. In the classical sense, the electrons perform sinusoidal oscillations as they propagate through the crystal (as illustrated in Fig. 1 for the case of planar channelling). When viewed in the electron rest frame, this motion, a result of successive Bragg reflections, gives rise to familiar dipole emission. In the laboratory frame, the radiation is seen to be of a higher energy (because of the Doppler shift) and is also compressed into a narrower cone of emission (due to the relativistic “searchlight” effect). The energy and yield of this monochromatic light is a continuously increasing function of the incident beam energy and, for beam energies of 1 MeV and higher, it occurs in the x-ray and γ-ray regions of the spectrum. Consequently, much interest has been expressed in regard to the use of this phenomenon as the basis for fabricating a coherent, tunable radiation source.

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Radiation Damage, Contrast and Statistics in High Resolution Biological Electron Microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100068291 ◽

1970 ◽

Vol 28 ◽

pp. 260-261

Author(s):

Robert M. Glaeser

Keyword(s):

High Resolution ◽

Particle Flux ◽

Unit Area ◽

Signal To Noise ◽

Resolution Image ◽

High Resolution Image ◽

Pass Through ◽

Counting Statistics ◽

The Relationship ◽

Picture Element

It is well known that a large flux of electrons must pass through a specimen in order to obtain a high resolution image while a smaller particle flux is satisfactory for a low resolution image. The minimum particle flux that is required depends upon the contrast in the image and the signal-to-noise (S/N) ratio at which the data are considered acceptable. For a given S/N associated with statistical fluxtuations, the relationship between contrast and “counting statistics” is s131_eqn1, where C = contrast; r2 is the area of a picture element corresponding to the resolution, r; N is the number of electrons incident per unit area of the specimen; f is the fraction of electrons that contribute to formation of the image, relative to the total number of electrons incident upon the object.

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A New High Intensity Grid Cap for RCA-EMU-3 Electron Microscopes

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100101323 ◽

1968 ◽

Vol 26 ◽

pp. 316-317

Author(s):

George Christov ◽

Bolivar J. Lloyd

Keyword(s):

Electron Beam ◽

Electron Microscope ◽

High Voltage ◽

High Intensity ◽

Electron Gun ◽

Tungsten Filament ◽

Fluorescent Screen ◽

Electron Microscopes ◽

Pass Through ◽

Ground Potential

A new high intensity grid cap has been designed for the RCA-EMU-3 electron microscope. Various parameters of the new grid cap were investigated to determine its characteristics. The increase in illumination produced provides ease of focusing on the fluorescent screen at magnifications from 1500 to 50,000 times using an accelerating voltage of 50 KV.The EMU-3 type electron gun assembly consists of a V-shaped tungsten filament for a cathode with a thin metal threaded cathode shield and an anode with a central aperture to permit the beam to course the length of the column. The cathode shield is negatively biased at a potential of several hundred volts with respect to the filament. The electron beam is formed by electrons emitted from the tip of the filament which pass through an aperture of 0.1 inch diameter in the cap and then it is accelerated by the negative high voltage through a 0.625 inch diameter aperture in the anode which is at ground potential.

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