Guide for Determining Mass Per Unit Area of Electrodeposited and Related Coatings by Gravimetric and Other Chemical Analysis Procedures

10.1520/b0767 ◽  
2008 ◽  
Author(s):  
Keyword(s):  
Chemical Analysis ◽  
Unit Area

Radiation Damage, Contrast and Statistics in High Resolution Biological Electron Microscopy

1970 ◽  
Vol 28 ◽  
pp. 260-261
Author(s):  
Robert M. Glaeser
Keyword(s):  
High Resolution ◽  
Particle Flux ◽  
Unit Area ◽  
Signal To Noise ◽  
Resolution Image ◽  
High Resolution Image ◽  
Pass Through ◽  
Counting Statistics ◽  
The Relationship ◽  
Picture Element

It is well known that a large flux of electrons must pass through a specimen in order to obtain a high resolution image while a smaller particle flux is satisfactory for a low resolution image. The minimum particle flux that is required depends upon the contrast in the image and the signal-to-noise (S/N) ratio at which the data are considered acceptable. For a given S/N associated with statistical fluxtuations, the relationship between contrast and “counting statistics” is s131_eqn1, where C = contrast; r2 is the area of a picture element corresponding to the resolution, r; N is the number of electrons incident per unit area of the specimen; f is the fraction of electrons that contribute to formation of the image, relative to the total number of electrons incident upon the object.

Sign in / Sign up

Export Citation Format

Share Document