Synthesis by successive ionic layer deposition (SILD) methodology and characterization of gold nanoclusters on the surface of tin and indium oxide films

2014 ◽  
Vol 86 (5) ◽  
pp. 801-817 ◽  
Author(s):  
Ghenadii Korotcenkov ◽  
Larisa B. Gulina ◽  
Beongki Cho ◽  
Vladimir Brinzari ◽  
Valery P. Tolstoy
Keyword(s):  
Active Sites ◽  
Gold Nanoclusters ◽  
Oxide Films ◽  
Gold Clusters ◽  
Adsorbed Species ◽  
Layer Deposition ◽  
Deposited Metal ◽  
Multiple Stages ◽  
Ionic Layer

AbstractThe ability of successive ionic layer deposition (SILD) technology to synthesize gold clusters on the surface of tin(IV) oxide and indium(III) oxide films is discussed. It was shown that during the process, concentration of active sites that are capable of absorbing gold ions, and the size of the gold particles thus formed, may be controlled by both concentration of the solutions used and the number of SILD cycles. Thus, SILD methodology, employing separate and multiple stages of adsorption and reduction of adsorbed species, has considerable potential for customizing the properties of the deposited metal nanoparticles. In particular, it is shown that during the deposition of gold nanoparticles on the surface of tin(IV) oxide and indium(III) oxide films by SILD methodology, conditions can be realized under which the size of gold nanoclusters may be controllably varied between 1–3 nm and 50 nm. A model is proposed for the formation of gold clusters during the SILD process.

Preparation by atomic layer deposition and characterization of active sites in nanodispersed vanadia/titania/silica catalysts

2004 ◽  
Vol 91-92 ◽  
pp. 67-71 ◽  
Author(s):  
Jetta Keränen ◽  
Paolo Carniti ◽  
Antonella Gervasini ◽  
Eero Iiskola ◽  
Aline Auroux ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Active Sites ◽  
Atomic Layer ◽  
Layer Deposition

Characterization of Electrochemically Co-deposited Metal−Molybdenum Oxide Films

2004 ◽  
Vol 16 (13) ◽  
pp. 2662-2668 ◽  
Author(s):  
A. C. Pereira ◽  
T. L. Ferreira ◽  
L. Kosminsky ◽  
R. C. Matos ◽  
M. Bertotti ◽  
...  
Keyword(s):  
Molybdenum Oxide ◽  
Oxide Films ◽  
Deposited Metal

scholarly journals Structural characterization and phase transformations in metal oxide films synthesized by successive ionic layer deposition (SILD) method

2009 ◽  
Vol 3 (1-2) ◽  
pp. 19-28 ◽  
Author(s):  
Ghenadii Korotcenkov ◽  
Sang Han ◽  
Beongki Cho ◽  
Valeri Tolstoy
Keyword(s):  
Metal Oxide ◽  
Metal Oxides ◽  
Oxide Films ◽  
Metal Oxide Films ◽  
Sensor Applications ◽  
Xrd Diffraction ◽  
Layer Deposition ◽  
High Roughness ◽  
High Degree ◽  
Ionic Layer

In this paper the peculiarities of phase composition and morphology of metal oxides synthesized by successive ionic layer deposition (SILD) method are discussed. The main attention is focused on SnO2-based metal oxides, which are promising materials for gas sensor applications. FTIR spectroscopy has shown that the precipitates of metal oxides, deposited by SILD method, are hydroxide, peroxide or hydrated metal oxide-based compounds. After annealing at relatively low temperatures (200-400?C) these compounds release both water and peroxide oxygen and transform into corresponding oxides. According to XRD, SEM and AFM measurements it was confirmed that deposited films had fine-dispersed structures. Only after annealing at Tan>500?C, XRD diffraction peaks, typical for nanocrystalline material with grain size < 6-8 nm, were observed. High roughness and high degree of agglomeration are important peculiarities of metal oxides deposited by SILD. Metal oxide films consist of spherical agglomerates. Degree of agglomeration of the films and agglomerate size could be controlled. It was found that introduction of various additives in the solution for SILD could sufficiently change the microstructure of synthesized metal oxides. .

Characterization of Ultra-Thin Hafnium Oxide Films Grown on Silicon by Atomic Layer Deposition Using Tetrakis(ethylmethyl-amino) Hafnium and Water Precursors

2007 ◽  
Vol 19 (13) ◽  
pp. 3127-3138 ◽  
Author(s):  
Y. Wang ◽  
M.-T. Ho ◽  
L. V. Goncharova ◽  
L. S. Wielunski ◽  
S. Rivillon-Amy ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Heterogeneous Cross-Coupling over Gold Nanoclusters

Nanomaterials ◽  
2019 ◽  
Vol 9 (6) ◽  
pp. 838 ◽  
Author(s):  
Quanquan Shi ◽  
Zhaoxian Qin ◽  
Hui Xu ◽  
Gao Li
Keyword(s):  
Active Sites ◽  
Gold Nanoclusters ◽  
Cross Coupling ◽  
Gold Clusters ◽  
Organic Ligands ◽  
Coupling Reactions ◽  
Au Nanoclusters ◽  
Cross Coupling Reactions ◽  
Au Clusters ◽  
A3 Coupling

Au clusters with the precise numbers of gold atoms, a novel nanogold material, have recently attracted increasing interest in the nanoscience because of very unique and unexpected properties. The unique interaction and electron transfer between gold clusters and reactants make the clusters promising catalysts during organic transformations. The AunLm nanoclusters (where L represents organic ligands and n and m mean the number of gold atoms and ligands, respectively) have been well investigated and developed for selective oxidation, hydrogenation, photo-catalysis, and so on. These gold clusters possess unique frameworks, providing insights into the catalytic processes and an excellent arena to correlate the atomic frameworks with their intrinsic catalytic properties and to further investigate the tentative reaction mechanisms. This review comprehensively summarizes the very latest advances in the catalytic applications of the Au nanoclusters for the C−C cross-coupling reactions, e.g., Ullmann, Sonogashira, Suzuki cross-couplings, and A3−coupling reactions. It is found that the proposed catalytically active sites are associated with the exposure of gold atoms on the surface of the metal core when partial capping organic ligands are selectively detached under the reaction conditions. Finally, the tentative catalytic mechanisms over the ligand-capped Au nanoclusters and the relationship of structure and catalytic performances at the atomic level using computational methods are explored in detail.

Characterization of thin metal oxide films grown by atomic layer deposition

2004 ◽  
Author(s):  
Peter J. Evans ◽  
Kathryn Prince ◽  
Gerry Triani ◽  
Kim S. Finnie ◽  
David R. G. Mitchell ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Thin Metal ◽  
Metal Oxide Films ◽  
Layer Deposition
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