scholarly journals Effect of the structure on biological and photocatalytic activity of transparent titania thin-film coatings

2016 ◽  
Vol 34 (4) ◽  
pp. 856-862 ◽  
Author(s):  
Damian Wojcieszak ◽  
Michał Mazur ◽  
Danuta Kaczmarek ◽  
Agata Poniedziałek ◽  
Piotr Domanowski ◽  
...  

AbstractIn this work, the effect of titanium dioxide (TiO2) thin film microstructure on photocatalytic and biological activity was described. The films were prepared by low-pressure and high-energy magnetron sputtering processes. The structural investigations performed by X-ray diffraction revealed that the films from both the processes were nanocrystalline. It was found that TiO2prepared by low-pressure process had the anatase structure with crystallites in size of 20 nm, while the film deposited in high-energy process had the rutile form with crystallites in size of 5 nm. The analysis of surface topography with the aid of optical profiler showed that all prepared films were homogenous and their roughness was lower than 1 nm. The wettability studies revealed hydrophilic nature of both films. The values of water contact angle obtained for anatase and rutile films were equal to 40° and 49°, respectively. Both types of the thin films were photocatalitycally active, but rutile exhibited higher decomposition rate as compared to anatase. During the photocatalytic reaction in the presence of TiO2-rutile film after 12 hours of UV-Vis irradiation 30 % of phenol was decomposed, whereas in case of TiO2-anatase it was only 10 %. Moreover, the influence of as-deposited coatings on the growth of selected microbes (Staphylococcus aureus, Escherichia coli, Candida albicans) was examined. It was found that the structural properties of TiO2had an effect on biological activity of these films.

Crystals ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 495
Author(s):  
Leon Hamui ◽  
María Elena Sánchez-Vergara ◽  
Rocio Sánchez-Ruiz ◽  
Cecilio Álvarez-Toledano ◽  
Jose Luis Reyes-Rodriguez ◽  
...  

The doping and crystallization of the molecular semiconductor formed from the magnesium phthalocyanine (MgPc) and 1-(4-Methoxyphenyl)-2,2,6,6-tetramethyl-5-phenylhepta-3,4-dienedioic (MTPDA) acid was carried out in this work. The crystals obtained were characterized by using transmission electronic microscopy (TEM), Raman spectroscopy, and X-Ray diffraction (XRD), to later evaluate their optical behavior. Raman, IR, and UV–Vis results indicate that the MgPc has been doped with the MTPDA. A uniform material layer with particles is observed as a result of a two-stage process, nucleation and growth. The polycrystalline films are constituted by a mixture of α and β phases with crystalline sizes of ~7 nm, 14 nm, and 20 nm average sizes. The films exhibit a preferred orientation along the [001]. The MTPDA doping does not have an important effect on the molecule planar distances indicating that the MTPDA molecule is among the equivalent MgPc plane direction. A transparent region with a minimum at 483 nm is observed, also a B-band at 337 nm and a Q-band transition with a high-energy peak around 639 nm, and a low energy peak around 691 nm.


2012 ◽  
Vol 100 (13) ◽  
pp. 133111 ◽  
Author(s):  
M. Ghafari ◽  
S. Kohara ◽  
H. Hahn ◽  
H. Gleiter ◽  
T. Feng ◽  
...  

Lithium niobate (LiNbO3) nanostructure thin film was prepared and deposited on the substrates made of quartz by utilizing pulse laser deposition (PLD) technique. The effect of substrate temperature changing on the optical and structural properties of LiNbO3 films was investigated and studied. The chemical mixture was prepared by mixing the raw material (Li2CO3, Nb2O5) with Ethanol liquid without any further purification, at the stirrer time 3hrs without heating, then the formed material was overexposed to annealing process at 1000°C for 4hrs. LiNbO3 nanostructure thin film was characterized and analyzed by utilizing the Ultra-Violet visible (UV-vis) and X-Ray Diffraction (XRD). The UV-vis results showed that the increase in the substrate temperature to 300°C leads to decrease in the values of transmission (T%), absorption (A) and optical energy gap (Eg) and increase in the values of reflection (R%) and refractive index (n). While, the XRD results explained that the LiNbO3 structure became more pure and crystalline with increase the substrate temperature, because the intensity of the phase 2θ at the value of 34.8°, 40.06° and 48.48° correspond to (110), (113) and (024) planes disappeared at the substrate temperature 300°C. So, all presented results give a good indication to use LiNbO3 nanostructure thin film prepared at the substrate temperature 300°C for manufacturing the optical waveguide to give the best results.


2018 ◽  
Vol 763 ◽  
pp. 223-227 ◽  
Author(s):  
Zhihua Nie ◽  
Zilong Wang ◽  
Yanbin Liang ◽  
Daoyong Cong ◽  
Gaoqiang Li ◽  
...  

2012 ◽  
Vol 730-732 ◽  
pp. 245-250 ◽  
Author(s):  
Leonardo F. Hernandez ◽  
Roberto R. Lima ◽  
Edson Pecoraro ◽  
Esteban Rosim-Fachini ◽  
Maria L.P. da Silva

This work aims to obtain plasma thin film composites with hydrophobic/hydrophilic alternated regions, which are useful for the production of miniaturized mixers. These regions were acquired by two different strategies: either the codeposition of TEOS and HFE plasma thin films or the exposition of TEOS plasma films to ultraviolet radiation (UVA and UVC). These films were characterized by several chemical and physical techniques. The refractive indexes vary from 1.4 to 1.7; infrared and photoelectron spectroscopy detect Si-O-Si and CHn species. Silicone-like structures with high or low number of amorphous carbon microparticles and with fluorinated organic clusters were produced. Cluster dimensions were in the 1-5 mm range and they are made of graphite or COF (carbon/oxygen/fluorine) compounds. Scanning electron and optical microscopy showed rough surfaces. Water contact angles were 90º; however, for TEOS films that value changed after 6 hr of UVC exposure. Moreover, after UV exposure, organic polar compounds could be adsorbed in those films and water was not. The passive mixer performance was simulated using the FemLab 3.2® program and was tested with 20 nm thick films on a silicon wafer, showing the capacity of these films to be used in such devices.


Author(s):  
Sunil Rawal ◽  
Sabrina H. Buer ◽  
Wayne Hawkins ◽  
Jonathan Robby Sanders ◽  
Pedro E. Arce

Abstract The utilization of titanium dioxide (TiO2) photocatalysis for water and air purification is a frequently used method due to TiO2 having properties making it chemically inert, highly cost-effective, abundant, non-toxic, and environmentally-friendly. In an effort to increase the efficiency of the degradation process, an in-depth understanding of the effects of the structure and number of thin film coatings is needed. Transparent, anatase-form titanium dioxide thin films were prepared via the sol-gel method and deposited onto microscopic glass slides using a novel spraying technique, with coatings ranging from 1 to 10. Characterization of the TiO2 thin film coated slides was performed using X-ray diffraction (XRD) and scanning electron microscopy (SEM) techniques. The contribution shows that the coating technique is efficient in covering important areas of the surface and that it is suitable for a multiple coating layers thin film. The SEM imagines show that the surface of the slides increase coverage as the number of layers increases. This is potentially suitable for a mechanized spraying approach to upscaling the production of thin films for advanced oxidation applications.


Nanoscale ◽  
2018 ◽  
Vol 10 (7) ◽  
pp. 3356-3361 ◽  
Author(s):  
Saurav Prakash ◽  
Siddhartha Ghosh ◽  
Abhijeet Patra ◽  
Meenakshi Annamalai ◽  
Mallikarjuna Rao Motapothula ◽  
...  

Herein, we report a systematic study of water contact angle (WCA) of rare-earth oxide thin-films.


1995 ◽  
Vol 396 ◽  
Author(s):  
Setsuo Nakao ◽  
Kazuo Saitoh ◽  
Masami Ikeyama ◽  
Hiroaki Niwa ◽  
Seita Tanemura ◽  
...  

AbstractAmorphous (a-) Ge films were deposited on air-cleaved CaF2 (111) substrates at different deposition temperatures (Td). The films were irradiated with 0.9 MeV Ge or Si ions at low ion current intensity (1c) l00nA/cm2. Their structural changes were studied by Rutherford backscattering spectrometry (RBS) -channeling technique and thin film x-ray diffraction (XRD) measurement. It was found that the films were epitaxially crystallized by Ge and Si ion irradiation although they included randomly oriented grains. Ge ion irradiation was more effective for the crystallization than Si ion irradiation. However, the amount of the randomly oriented grains was slightly higher when using Ge ions. On the other hand, ion irradiation to the films prepared at high Td also exhibited higher incidence of randomly oriented grains.


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