213 nm pitch standards fabricated using atomic lithography

2012 ◽  
Vol 8 (4) ◽  
pp. 348
Author(s):  
Yan Ma ◽  
Weigang Gong ◽  
Wanjing Zhang ◽  
Tongbao Li
Keyword(s):  
Atomic Lithography

Atomic lithography with barium atoms

2005 ◽  
Vol 248 (1-4) ◽  
pp. 196-199 ◽  
Author(s):  
A. Fioretti ◽  
A. Camposeo ◽  
F. Tantussi ◽  
E. Arimondo ◽  
S. Gozzini ◽  
...  
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Atomic Lithography

scholarly journals Generating continuous variable quantum codewords in the near-field atomic lithography

2006 ◽  
Vol 39 (4) ◽  
pp. 997-1009 ◽  
Author(s):  
Stefano Pirandola ◽  
Stefano Mancini ◽  
David Vitali ◽  
Paolo Tombesi
Keyword(s):  
Near Field ◽  
Continuous Variable ◽  
Atomic Lithography

scholarly journals Quantum atomic lithography via cross-cavity optical Stern–Gerlach setup

2014 ◽  
Vol 31 (10) ◽  
pp. 2480 ◽  
Author(s):  
C. E. Máximo ◽  
T. B. Batalhão ◽  
R. Bachelard ◽  
G. D. de Moraes Neto ◽  
M. A. de Ponte ◽  
...  
Keyword(s):  
Atomic Lithography

Atomic lithography

1998 ◽  
Vol 41-42 ◽  
pp. 587-590 ◽  
Author(s):  
A.S. Bell ◽  
T. Pfau ◽  
U. Drodofsky ◽  
J. Stuhler ◽  
Th. Schulze ◽  
...  
Keyword(s):  
Atomic Lithography

Nanoscale atomic lithography with a cesium atomic beam

1997 ◽  
Vol 65 (3) ◽  
pp. 419-421 ◽  
Author(s):  
F. Lison ◽  
H.-J. Adams ◽  
D. Haubrich ◽  
M. Kreis ◽  
S. Nowak ◽  
...  
Keyword(s):  
Atomic Beam ◽  
Atomic Lithography

Dissipative light mask generated by a nonuniformly polarized field for atomic lithography

2007 ◽  
Vol 104 (6) ◽  
pp. 839-845 ◽  
Author(s):  
O. N. Prudnikov ◽  
A. V. Taĭchenachev ◽  
A. M. Tumaĭkin ◽  
V. I. Yudin
Keyword(s):  
Atomic Lithography
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