STUDY OF HYPERSONIC FLOW PAST SPIKED BLUNT BODY USING DIRECT SIMULATION MONTE CARLO METHOD

2016 ◽  
Author(s):  
J. S. Jiss ◽  
E. J. Sandeep ◽  
R. V. Reji ◽  
A. Suryan ◽  
H. D. Kim
Keyword(s):  
Monte Carlo ◽  
Monte Carlo Method ◽  
Hypersonic Flow ◽  
Blunt Body ◽  
Direct Simulation Monte Carlo ◽  
Direct Simulation ◽  
Flow Past ◽  
Simulation Monte Carlo

Modelling Rarefied Hypersonic Reactive Flows Using the Direct Simulation Monte Carlo Method

2015 ◽  
Vol 18 (4) ◽  
pp. 1095-1121 ◽  
Author(s):  
Ming-Chung Lo ◽  
Cheng-Chin Su ◽  
Jong-Shinn Wu ◽  
Kun-Chang Tseng
Keyword(s):  
Monte Carlo ◽  
Hypersonic Flow ◽  
Direct Simulation Monte Carlo ◽  
Test Cases ◽  
Monte Carlo Code ◽  
Direct Simulation ◽  
Reactive Flows ◽  
Flow Past ◽  
Flow Past A Cylinder ◽  
Simulation Monte Carlo

AbstractThis paper presents the implementation, validation and application of TCE (total collision energy) model for simulating hypersonic reactive flows in a parallel direct simulation Monte Carlo code, named PDSC++, using an unstructured grid. A series of benchmarking test cases, which include reproduction of theoretical rate constants in a single cell, 2D hypersonic flow past a cylinder and 2D-axisymmetric hypersonic flow past a sphere, were performed to validate the implementation. Finally, detailed aerothermodynamics of the flown reentry Apollo 6 Command Module at 105 km is simulated to demonstrate the powerful capability of the PDSC++in treating realistic hypersonic reactive flow at high altitude.

Study on the Deposition Profile Characteristics in the Micron-Scale Trench Using Direct Simulation Monte Carlo Method

1998 ◽  
Vol 120 (2) ◽  
pp. 296-302 ◽  
Author(s):  
Masato Ikegawa ◽  
Jun’ichi Kobayashi ◽  
Morihisa Maruko
Keyword(s):  
Monte Carlo ◽  
Monte Carlo Method ◽  
Boundary Conditions ◽  
Gas Flow ◽  
Direct Simulation Monte Carlo ◽  
Low Pressure ◽  
Sputter Deposition ◽  
Direct Simulation ◽  
Simulation Monte Carlo ◽  
Profile Characteristics

As integrated circuits are advancing toward smaller device features, step-coverage in submicron trenches and holes in thin film deposition are becoming of concern. Deposition consists of gas flow in the vapor phase and film growth in the solid phase. A deposition profile simulator using the direct simulation Monte Carlo method has been developed to investigate deposition profile characteristics on small trenches which have nearly the same dimension as the mean free path of molecules. This simulator can be applied to several deposition processes such as sputter deposition, and atmospheric- or low-pressure chemical vapor deposition. In the case of low-pressure processes such as sputter deposition, upstream boundary conditions of the trenches can be calculated by means of rarefied gas flow analysis in the reactor. The effects of upstream boundary conditions, molecular collisions, sticking coefficients, and surface migration on deposition profiles in the trenches were clarified.

Sign in / Sign up

Export Citation Format

Share Document