scholarly journals High nonlinear figure of merit hydrogenated amorphous silicon optical fibers

Author(s):  
L. Shen ◽  
N. Healy ◽  
P. Mehta ◽  
T. D. Day ◽  
J. V. Badding ◽  
...  
2010 ◽  
Vol 18 (16) ◽  
pp. 16826 ◽  
Author(s):  
P. Mehta ◽  
N. Healy ◽  
N. F. Baril ◽  
P. J. A. Sazio ◽  
J. V. Badding ◽  
...  

2012 ◽  
Vol 65 (5) ◽  
pp. 480 ◽  
Author(s):  
Tim F. Schulze ◽  
Yuen Yap Cheng ◽  
Burkhard Fückel ◽  
Rowan W. MacQueen ◽  
Andrew Danos ◽  
...  

Photochemical upconversion is applied to a hydrogenated amorphous silicon solar cell in the presence of a back-scattering layer. A custom-synthesized porphyrin was utilized as the sensitizer species, with rubrene as the emitter. Under a bias of 24 suns, a peak external quantum efficiency (EQE) enhancement of ~2 % was observed at a wavelength of 720 nm. Without the scattering layer, the EQE enhancement was half this value, indicating that the effect of the back-scatterer is to double the efficacy of the upconverting device. The results represent an upconversion figure of merit of 3.5 × 10–4 mA cm–2 sun–2, which is the highest reported to date.


1981 ◽  
Vol 42 (C4) ◽  
pp. C4-773-C4-777 ◽  
Author(s):  
H. R. Shanks ◽  
F. R. Jeffrey ◽  
M. E. Lowry

2003 ◽  
Vol 762 ◽  
Author(s):  
Guofu Hou ◽  
Xinhua Geng ◽  
Xiaodan Zhang ◽  
Ying Zhao ◽  
Junming Xue ◽  
...  

AbstractHigh rate deposition of high quality and stable hydrogenated amorphous silicon (a-Si:H) films were performed near the threshold of amorphous to microcrystalline phase transition using a very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) method. The effect of hydrogen dilution on optic-electronic and structural properties of these films was investigated by Fourier-transform infrared (FTIR) spectroscopy, Raman scattering and constant photocurrent method (CPM). Experiment showed that although the phase transition was much influenced by hydrogen dilution, it also strongly depended on substrate temperature, working pressure and plasma power. With optimized condition high quality and high stable a-Si:H films, which exhibit σph/σd of 4.4×106 and deposition rate of 28.8Å/s, have been obtained.


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