Permanent narrow-band reflection holograms in copper-doped lithium niobate channel waveguides for optical communications

Author(s):  
Jörg Hukriede ◽  
Detlef Kip ◽  
Eckhard Krätzig
2005 ◽  
Vol 480-481 ◽  
pp. 429-436
Author(s):  
M. Domenech ◽  
G. Lifante ◽  
F. Cussó ◽  
A. Parisi ◽  
A.C. Cino ◽  
...  

In this work, the complete fabrication process which combines Proton Exchange (PE) and Reverse Proton Exchange (RPE) in Neodymium doped LiNbO3 channel waveguides is reported. To produce the PE-RPE channel waveguides the fabrication of dielectric SiO2 masks had to be implemented. For this propose, we adopted a technique based on the Ion Plating Plasma Assisted Deposition of SiO2 followed by the standard ultraviolet photolithographic patterning. On the other hand, we determined the main optical and spectroscopic properties of Nd3+ ions in the channel waveguides including the study of the lifetime as function as the polarisation.


2009 ◽  
Vol 18 (01) ◽  
pp. 49-72 ◽  
Author(s):  
XIANFENG CHEN ◽  
KUN LIU ◽  
JIANHONG SHI

In this paper, we review current research on the applications of periodically poled lithium niobate (PPLN) by use of polarization coupling in our and other research groups. Tunable wavelength Solc-type filter, polarization controller and electro-optical switch based on PPLN are presented, which show potential applications in optical communications and optical information processing.


2000 ◽  
Author(s):  
T. Meade ◽  
Y.-S. Lee ◽  
V. Perlin ◽  
H. Winful ◽  
T. B. Norris ◽  
...  

2010 ◽  
Vol 09 (04) ◽  
pp. 311-315
Author(s):  
G. Y. SI ◽  
A. J. DANNER ◽  
J. H. TENG ◽  
S. S. ANG ◽  
A. B. CHEW ◽  
...  

Channel waveguides have been fabricated in x-cut lithium niobate (LiNbO3) by proton exchange (PE) method and optically measured. The thickness and the optical constants of the thin PE layer were characterized using a prism coupling technique. The PE area was plasma etched and a 2.775-μm total etching depth was achieved. The measured average etching rate is 92.5 nm/min. One- and two-dimensional dense arrays of LiNbO3 nanostructures have also been fabricated by using interference lithography (IL) and inductively coupled plasma reactive ion etching (ICP-RIE) techniques.


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